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    METROLOGY METHOD, TARGET AND SUBSTRATE
    4.
    发明申请
    METROLOGY METHOD, TARGET AND SUBSTRATE 审中-公开
    计量方法，目标和底物

    公开(公告)号：WO2017055106A1

    公开(公告)日：2017-04-06

    申请号：PCT/EP2016/071986

    申请日：2016-09-16

    Applicant: ASML NETHERLANDS B.V.

    Inventor： SLOTBOOM, Daan, Maurits ,  DEN BOEF, Arie, Jeffrey ,  EBERT, Martin

    IPC: G03F7/20

    CPC classification number: G03F7/70625 ,  G03F7/706 ,  G03F7/70633 ,  G03F7/70641 ,  G03F7/70683

    Abstract: A method of measuring a parameter of a lithographic process, the method including: illuminating a diffraction measurement target on a substrate with radiation, the measurement target including at least a first sub-target, at least a second sub-target and at least third sub-target, wherein the first, second and third sub-targets each include a periodic structure and wherein the first sub-target, second sub-target and third sub-target each have a different design and wherein at least two of the sub-targets are respectively designed for determination of a different lithographic process parameter; and detecting radiation scattered by the at least two sub-targets to obtain for that target a measurement representing the different parameters of the lithographic process.

    Abstract translation: 一种测量光刻工艺参数的方法，所述方法包括：用辐射照射基板上的衍射测量目标，所述测量目标至少包括第一子目标，至少第二子目标和至少第三子 目标，其中第一，第二和第三子目标各自包括周期性结构，并且其中第一子目标，第二子目标和第三子目标各自具有不同的设计，并且其中至少两个子目标 分别设计用于确定不同的光刻工艺参数; 以及检测由所述至少两个子目标散射的辐射，以为该目标获得代表光刻处理的不同参数的测量值。

    POLARIZATION TUNING IN SCATTEROMETRY
    6.
    发明申请
    POLARIZATION TUNING IN SCATTEROMETRY 审中-公开
    极坐标测量中的极化调整

    公开(公告)号：WO2017102327A1

    公开(公告)日：2017-06-22

    申请号：PCT/EP2016/079219

    申请日：2016-11-30

    Applicant: ASML NETHERLANDS B.V.

    Inventor： VAN DER SCHAAR, Maurits ,  WARNAAR, Patrick ,  ZHANG, Youping ,  DEN BOEF, Arie, Jeffrey ,  XIAO, Feng ,  EBERT, Martin

    IPC: G03F7/20 ,  G01N21/956

    CPC classification number: G03F7/70633 ,  G01N21/956

    Abstract: A method includes projecting an illumination beam of radiation onto a metrology target on a substrate, detecting radiation reflected from the metrology target on the substrate, and determining a characteristic of a feature on the substrate based on the detected radiation, wherein a polarization state of the detected radiation is controllably selected to optimize a quality of the detected radiation.

    Abstract translation: 一种方法包括将照射的照射束投射到衬底上的度量目标上，检测从衬底上的度量目标反射的辐射，并且基于检测到的确定衬底上的特征的特征 辐射，其中检测到的辐射的偏振状态被可控地选择以优化检测到的辐射的质量。

    ILLUMINATION SYSTEM, INSPECTION APPARATUS INCLUDING SUCH AN ILLUMINATION SYSTEM, INSPECTION METHOD AND MANUFACTURING METHOD
    8.
    发明申请
    ILLUMINATION SYSTEM, INSPECTION APPARATUS INCLUDING SUCH AN ILLUMINATION SYSTEM, INSPECTION METHOD AND MANUFACTURING METHOD 审中-公开
    照明系统，包括这种照明系统的检查装置，检查方法和制造方法

    公开(公告)号：WO2016015987A1

    公开(公告)日：2016-02-04

    申请号：PCT/EP2015/065984

    申请日：2015-07-13

    Applicant: ASML NETHERLANDS B.V.

    Inventor： VAN DER ZOUW, Gerbrand ,  JAK, Martin, Jacobus, Johan ,  EBERT, Martin

    IPC: G03F7/20 ,  G01N21/47

    CPC classification number: G02B27/283 ,  G01J1/08 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8848 ,  G01N2201/0675 ,  G02F1/01 ,  G03F7/70633

    Abstract: In an illumination system (12, 13) for a scatterometer, first and second spatial light modulators lie in a common plane and are formed by different portions of a single liquid crystal cell (260). Pre-polarizers (250) apply polarization to first and second radiation prior to the spatial light modulators. A first spatial light modulator (236-S) varies a polarization state of the first radiation in accordance with a first programmable pattern. Second spatial light modulator (236-P) varies a polarization state of the second radiation accordance with a second programmable pattern. A polarizing beam splitter (234) selectively transmits each of the spatially modulated first and second radiation to a common output path, depending on the polarization state of the radiation. In an embodiment, functions of pre-polarizers are performed by the polarizing beam splitter.

    Abstract translation: 在用于散射仪的照明系统（12,13）中，第一和第二空间光调制器位于公共平面中，并且由单个液晶单元（260）的不同部分形成。 预偏光器（250）在空间光调制器之前将偏振应用于第一和第二辐射。 第一空间光调制器（236-S）根据第一可编程模式改变第一辐射的偏振状态。 第二空间光调制器（236-P）根据第二可编程图案改变第二辐射的偏振状态。 偏振分束器（234）根据辐射的偏振状态选择性地将空间调制的第一和第二辐射中的每一个传输到公共输出路径。 在一个实施例中，预偏振器的功能由偏振分束器执行。

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