公开(公告)号：WO2008133506A1

公开(公告)日：2008-11-06

申请号：PCT/NL2008/050238

申请日：2008-04-23

Applicant: ASML NETHERLANDS B.V. ,  BANINE, Vadim, Yevgenyevich ,  BLEEKER, Arno, Jan ,  IVANOV, Vladimir, Vitalevitch ,  KOSHELEV, Konstantin, Nikolaevitch ,  SCHUURMANS, Frank, Jeroen, Pieter ,  KRIVTSUN, Vladimir, Mihailovitch ,  VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus

Inventor： BANINE, Vadim, Yevgenyevich ,  BLEEKER, Arno, Jan ,  IVANOV, Vladimir, Vitalevitch ,  KOSHELEV, Konstantin, Nikolaevitch ,  SCHUURMANS, Frank, Jeroen, Pieter ,  KRIVTSUN, Vladimir, Mihailovitch ,  VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus

IPC: G21K7/00

CPC classification number: G21K7/00

Abstract: An extreme ultraviolet (EUV) microscope configured to analyze a sample (5). The microscope includes a source (2) of EUV radiation constructed and arranged to generate the EUV radiation with a wavelength at least in a range of about 2 - 6 nm, and an optical system (3) constructed and arranged to illuminate the sample with the EUV radiation and to collect a radiation emanating (6) from the sample. The optical system is arranged with at least one mirror that includes a multilayer structure for in- phase reflection of at least a portion of the radiation in the range of about 2 - 6 nm.

Abstract translation: 配置用于分析样品（5）的极紫外（EUV）显微镜。 显微镜包括EUV辐射源（2），其被构造和布置成产生波长至少在约2-6nm范围内的EUV辐射;以及光学系统（3），被构造和布置成用 EUV辐射并从样品中收集辐射（6）。 光学系统布置有至少一个反射镜，其包括多层结构，用于在约2-6nm的范围内的至少一部分辐射的同相反射。

公开(公告)号：WO2018108440A1

公开(公告)日：2018-06-21

申请号：PCT/EP2017/079481

申请日：2017-11-16

Applicant: ASML NETHERLANDS B.V.

Inventor： OEMRAWSINGH, Sumant, Sukdew, Ramanujan ,  BLEEKER, Arno, Jan ,  STRUYCKEN, Alexander, Matthijs ,  VAN DER PASCH, Engelbertus, Antonius, Fransiscus ,  VAN DRIEËNHUIZEN, Bert, Pieter

IPC: G03F7/20 ,  G02B26/08

Abstract: An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.

公开(公告)号：WO2020136044A2

公开(公告)日：2020-07-02

申请号：PCT/EP2019/085706

申请日：2019-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： BLEEKER, Arno, Jan ,  DE JAGER, Pieter, Willem, Herman ,  GOOSEN, Maikel, Robert ,  SMAKMAN, Erwin, Paul ,  MANGNUS, Albertus, Victor, Gerardus ,  REN, Yan ,  LASSISE, Adam

IPC: H01J37/147 ,  H01J37/26 ,  H01J37/04

Abstract: Apparatuses and methods for charged-particle detection may include a deflector system configured to direct charged-particle pulses, a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.

公开(公告)号：WO2016131601A1

公开(公告)日：2016-08-25

申请号：PCT/EP2016/051242

申请日：2016-01-21

Applicant: ASML NETHERLANDS B.V.

Inventor： BLEEKER, Arno, Jan ,  HOFSTRA, Ramon, Mark ,  BUURMAN, Erik, Petrus ,  MOORS, Johannes, Hubertus, Josephina ,  STRUYCKEN, Alexander, Matthijs ,  VOORMA, Harm-Jan ,  OEMRAWSINGH, Sumant, Sukdew, Ramanujan ,  EURLINGS, Markus, Franciscus, Antonius ,  MUYS, Peter, Frans, Maria

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G02B27/141 ,  G03F7/70025 ,  G03F7/70566 ,  H01S3/0064 ,  H01S3/2308 ,  H01S3/2316 ,  H05G2/005 ,  H05G2/008

Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.

Abstract translation: 一种用于光刻工具的激光辐射源，包括用于发射具有第一波长的第一激光束的激光模块和具有第二波长的第二激光束;用于分离第一和第二激光束的光路的光束分离装置， 重新组合光路，射束传送系统将第一和第二激光束引导到燃料靶和光学隔离装置，以便：调整第一激光束的偏振状态，调节第二激光束的偏振状态并阻挡 具有经调整的偏振态的辐射使得第一激光束的反射和第二激光束的反射基本上被阻挡以朝向激光模块传播。

公开(公告)号：WO2009018933A1

公开(公告)日：2009-02-12

申请号：PCT/EP2008/006188

申请日：2008-07-28

Applicant: ASML NETHERLANDS B.V. ,  IVANOV, Vladimir Vitalevich ,  BANINE, Vadim, Yevgenyevich ,  BLEEKER, Arno, Jan ,  KOSHELEV, Konstantin Nikolaevich ,  ANTSIFEROV, Pavel Stanislavovich ,  KRIVTSUN, Vladimir Mihailovitch ,  LOPAEV, Dmitriy Victorovich

Inventor： IVANOV, Vladimir Vitalevich ,  BANINE, Vadim, Yevgenyevich ,  BLEEKER, Arno, Jan ,  KOSHELEV, Konstantin Nikolaevich ,  ANTSIFEROV, Pavel Stanislavovich ,  KRIVTSUN, Vladimir Mihailovitch ,  LOPAEV, Dmitriy Victorovich

IPC: H05G2/00

CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/005

Abstract: A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.

Abstract translation: 公开了一种被配置为产生用于光刻设备的辐射的源。 源包括阳极和阴极。 阴极和阳极被配置为在阳极和阴极之间的放电空间中的燃料中产生放电，以便产生等离子体，阴极和阳极相对于彼此定位，使得在使用中，电流线延伸 在阳极和阴极之间基本上是弯曲的，从而产生基本上径向压缩等离子体的力，仅在接近阴极或阳极的上表面的区域中。

公开(公告)号：WO2009015838A1

公开(公告)日：2009-02-05

申请号：PCT/EP2008/006145

申请日：2008-07-25

Applicant: ASML NETHERLANDS B.V. ,  BLEEKER, Arno, Jan ,  VAN MEER, Aschwin, Lodewijk, Hendricus, Johannes

Inventor： BLEEKER, Arno, Jan ,  VAN MEER, Aschwin, Lodewijk, Hendricus, Johannes

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70866 ,  G03F7/70916

Abstract: A lithographic apparatus includes an illumination system configured to condition a beam of radiation; a pattern support configured to hold a patterning device, the patterning device configured to pattern the beam of radiation to form a patterned beam of radiation; a substrate holder configured to hold a substrate, the substrate holder including a support surface in contact with the substrate; a projection system configured to project the patterned beam of radiation onto the substrate; and a cleaning system including a cleaning unit, the cleaning unit constructed and arranged to generate radicals on the support surface of the substrate holder to remove contamination therefrom.

Abstract translation: 光刻设备包括被配置为调节辐射束的照明系统; 配置为保持图案形成装置的图案支撑件，所述图案形成装置被配置成对辐射束进行图案化以形成图案化的辐射束; 衬底保持器，其构造成保持衬底，所述衬底保持器包括与所述衬底接触的支撑表面; 投影系统，被配置为将所述图案化的辐射束投射到所述基板上; 以及包括清洁单元的清洁系统，所述清洁单元构造和布置成在所述基板保持器的所述支撑表面上产生自由基以从其中除去污染物。

公开(公告)号：WO2003046662A1

公开(公告)日：2003-06-05

申请号：PCT/EP2002/013399

申请日：2002-11-27

Applicant: ASML NETHERLANDS B.V. ,  VAN DER MAST, Karel, Diederick ,  BLEEKER, Arno, Jan

Inventor： VAN DER MAST, Karel, Diederick ,  BLEEKER, Arno, Jan

IPC: G03F7/20

CPC classification number: G03F7/70516 ,  G03F7/70291 ,  G03F7/70425

Abstract: An imaging apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting programmable patterning means, the programmable patterning means serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the substrate, wherein the apparatus further comprises: beam splitting means (BS), provided between the programmable patterning means (PM) and the substrate table, serving to divert aside a portion (PB') of the patterned beam (PB); image detection means (ID), for analyzing said portion of the patterned beam.

Abstract translation: 一种成像装置，包括：辐射系统，用于提供投影射束; 用于支持可编程图案形成装置的支撑结构，所述可编程图案形成装置用于根据期望图案对投影光束进行图案化; 用于保持衬底的衬底台; 用于将所述图案化的光束投影到所述基板的目标部分上的投影系统，其中所述装置还包括：分束装置（BS），设置在所述可编程图案形成装置（PM）和所述基板台之间，用于将一部分（ PB'）; 图像检测装置（ID），用于分析图案化束的所述部分。

公开(公告)号：WO2020136044A3

公开(公告)日：2020-07-02

申请号：PCT/EP2019/085706

申请日：2019-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： BLEEKER, Arno, Jan ,  DE JAGER, Pieter, Willem, Herman ,  GOOSEN, Maikel, Robert ,  SMAKMAN, Erwin, Paul ,  MANGNUS, Albertus, Victor, Gerardus ,  REN, Yan ,  LASSISE, Adam

IPC: H01J37/147 ,  H01J37/26 ,  H01J37/04

Abstract: Apparatuses (1400) and methods for charged-particle detection may include a deflector system (1408, 1410, 1412) configured to direct charged-particle pulses (1414, 1416, 1418), a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.

公开(公告)号：WO2008151848A1

公开(公告)日：2008-12-18

申请号：PCT/EP2008/005086

申请日：2008-06-13

Applicant: ASML NETHERLANDS B.V. ,  BASELMANS, Johannes, Jacobus, Matheus ,  BLEEKER, Arno, Jan

Inventor： BASELMANS, Johannes, Jacobus, Matheus ,  BLEEKER, Arno, Jan

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/706

Abstract: Systems and methods are provided for measuring aberration in a lithographic apparatus. A radiation beam is modulated using an array of individually controllable elements (PD), and the modulated beam is projected using a projection system (PS). A pattern is provided on the array of individually controllable elements (PD) to modulate the radiation beam, and the pattern comprises a repeating structure that is formed from a plurality of features that are dimensioned such that first order diffraction of the radiation beam substantially fills the pupil of the projection system. A sensor (S) detects the projected radiation and measures interference in the radiation projected by the projection system (PS). Aberration in the detected radiation beam is then measured.

Abstract translation: 提供了用于测量光刻设备中的像差的系统和方法。 使用独立可控元件（PD）的阵列来调制辐射束，并且使用投影系统（PS）投影调制的光束。 在单独可控元件（PD）的阵列上提供图案以调制辐射束，并且图案包括由多个特征形成的重复结构，其尺寸使得辐射束的一阶衍射基本上填满 投影系统的瞳孔。 传感器（S）检测投射的辐射并测量由投影系统（PS）投影的辐射的干扰。 然后测量检测到的辐射束中的畸变。

公开(公告)号：WO2008078995A1

公开(公告)日：2008-07-03

申请号：PCT/NL2007/050663

申请日：2007-12-18

Applicant: ASML NETHERLANDS B.V. ,  BLEEKER, Arno, Jan ,  FRANKEN, Dominicus, Jacobus, Petrus, Adrianus ,  FRANSSEN, Johannes, Hendrikus, Gertrudis ,  VAN DE VEN, Johannes, Theodorus, Guillielmus, Maria ,  PUYT, Michiel ,  DE WIT, Teun, Peterus, Adrianus

Inventor： BLEEKER, Arno, Jan ,  FRANKEN, Dominicus, Jacobus, Petrus, Adrianus ,  FRANSSEN, Johannes, Hendrikus, Gertrudis ,  VAN DE VEN, Johannes, Theodorus, Guillielmus, Maria ,  PUYT, Michiel ,  DE WIT, Teun, Peterus, Adrianus

IPC: G03F7/20

CPC classification number: G03F7/707 ,  H01L21/683

Abstract: A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a plurality of projections constructed and arranged to support corresponding parts of a bottom section of the substrate, and an actuator constructed and arranged to excite a Shockwave in the substrate.

Abstract translation: 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括多个突起，其被构造和布置成支撑衬底的底部的对应部分，以及构造和布置成激发衬底中的冲击波的致动器。