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公开(公告)号：WO2020141041A1
公开(公告)日：2020-07-09
申请号：PCT/EP2019/083982
申请日：2019-12-06
Applicant: ASML NETHERLANDS B.V.
Inventor： REN, Yan , MANGNUS, Albertus, Victor, Gerardus
IPC: H01J37/28 , H01J37/147
Abstract: Embodiments consistent with the disclosure herein include methods and a multi-beam apparatus configured to emit charged-particle beams for imaging a top and side of a structure of a sample, including: a deflector array including a first deflector and configured to receive a first charged-particle beam and a second charged-particle beam; a blocking plate configured to block one of the first charged-particle beam and the second charged-particle beam; and a controller having circuitry and configured to change the configuration of the apparatus to transition between a first mode and a second mode. In the first mode, the deflector array directs the second charged-particle beam to the top of the structure, and the blocking plate blocks the first charged-particle beam. And in the second mode, the first deflector deflects the first charged-particle beam to the side of the structure, and the blocking plate blocks the second charged-particle beam.
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公开(公告)号：WO2020136044A3
公开(公告)日：2020-07-02
申请号：PCT/EP2019/085706
申请日：2019-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： BLEEKER, Arno, Jan , DE JAGER, Pieter, Willem, Herman , GOOSEN, Maikel, Robert , SMAKMAN, Erwin, Paul , MANGNUS, Albertus, Victor, Gerardus , REN, Yan , LASSISE, Adam
IPC: H01J37/147 , H01J37/26 , H01J37/04
Abstract: Apparatuses (1400) and methods for charged-particle detection may include a deflector system (1408, 1410, 1412) configured to direct charged-particle pulses (1414, 1416, 1418), a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.
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公开(公告)号：WO2021140072A1
公开(公告)日：2021-07-15
申请号：PCT/EP2021/050030
申请日：2021-01-04
Applicant: ASML NETHERLANDS B.V.
Inventor： MANGNUS, Albertus, Victor, Gerardus , GOOSEN, Maikel, Robert , SMAKMAN, Erwin, Paul , REN, Yan
IPC: H01J37/153 , H01J37/28 , H01J2237/151 , H01J2237/153 , H01J2237/1534 , H01J2237/2809
Abstract: An apparatus comprising a set of pixels configured to shape a beamlet approaching the set of pixels and a set of pixel control members respectively associated with each of the set of pixels, each pixel control member being arranged and configured to apply a signal to the associated pixel for shaping the beamlet.
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公开(公告)号：WO2020135963A1
公开(公告)日：2020-07-02
申请号：PCT/EP2019/082634
申请日：2019-11-26
Applicant: ASML NETHERLANDS B.V.
Inventor： REN, Yan
Abstract: Systems and methods of observing a sample in a multi-beam apparatus are disclosed. The multi-beam apparatus may include an electron source configured to generate a primary electron beam, a pre-current limiting aperture array comprising a plurality of apertures and configured to form a plurality of beamlets from the primary electron beam, each of the plurality of beamlets having an associated beam current, a condenser lens configured to collimate each of the plurality of beamlets, a beam-limiting unit configured to modify the associated beam current of each of the plurality of beamlets, and a sector magnet unit configured to direct each of the plurality of beamlets to form a crossover within or at least near an objective lens that is configured to focus each of the plurality of beamlets onto a surface of the sample and to form a plurality of probe spots thereon.
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公开(公告)号：WO2022117295A1
公开(公告)日：2022-06-09
申请号：PCT/EP2021/081134
申请日：2021-11-09
Applicant: ASML NETHERLANDS B.V.
Inventor： SLOT, Erwin , MANGNUS, Albertus, Victor, Gerardus , SMAKMAN, Erwin, Paul , REN, Yan , SCOTUZZI, Marijke
IPC: H01J37/304
Abstract: A charged-particle tool configured to generate a plurality of sub- beams from a beam of charged particles and direct the sub-beams downbeam toward a sample (600) position, the tool charged-particle tool comprising at least three charged-particle-optical components (201,111,235,234); a detector module (240); and a controller. The detector module is configured to generate a detection signal in response to charged particles that propagate upbeam from the direction of the sample position. The controller is configured to operate the tool in a calibration mode.. The charged-particle-optical components include: a charged-particle source 201 configured to emit a beam of charged particles and a beam generator (111) configured to generate the sub-beams. The detection signal contains information about alignment of at least two of the charged-particle-optical components. The charged-particle optical components comprise two or more charged-particle optical elements comprising an array of apertures for which the charged particles may be monitored.
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Patent Agency Ranking
公开(公告)号：WO2021122862A1
公开(公告)日：2021-06-24
申请号：PCT/EP2020/086594
申请日：2020-12-16
Applicant: ASML NETHERLANDS B.V.
Inventor： REN, Yan
IPC: H01J37/153 , H01J37/26
Abstract: A method of reducing aberration comprises separating (830) charged particles of a beam (811) based on energy (810) of the charged particles to form beamlets (812-814), each of the beamlets configured to include charged particles at a central energy level; and deflecting (950) the beamlets so that beamlets having different central energy levels are deflected differently. An aberration corrector comprises a dispersive element (830) (optionally 820) configured to cause constituent parts of a beam (811) (e.g. a charged particle beam) to spread apart based on energy (810); an aperture array (840) configured to form beamlets (812-814) from the spread apart beam; and a deflector array (950) configured to deflect the beamlets differently based on central energy levels of particles that form the beamlets.
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公开(公告)号：WO2020164951A1
公开(公告)日：2020-08-20
申请号：PCT/EP2020/052662
申请日：2020-02-04
Applicant: ASML NETHERLANDS B.V.
Inventor： HASAN, Shakeeb Bin , REN, Yan , GOOSEN, Maikel, Robert , MANGNUS, Albertus, Victor, Gerardus , SMAKMAN, Erwin, Paul
Abstract: Disclosed among other aspects is a charged particle inspection system including an absorbing component and a programmable charged-particle mirror plate arranged to modify the energy distribution of electrons in a beam and shape the beam to reduce the energy spread of the electrons and aberrations of the beam, with the absorbing component including a structure defining a cavity, the cavity having an interior surface, and a metamaterial aborber provided on the interior surface. In operation, the cavity extends along a part of the beam path. In further embodiments, the metamaterial includes a set of absorbing structures configured as absorbing structures provided on a transparent conductive layer. Further, a method using such an absorbing component and with the programmable charged-particle mirror plate including a set of pixels configured to generate a customized electric field to shape the beam and using such a programmable charged-particle mirror plate is disclosed.
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公开(公告)号：WO2020136044A2
公开(公告)日：2020-07-02
申请号：PCT/EP2019/085706
申请日：2019-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： BLEEKER, Arno, Jan , DE JAGER, Pieter, Willem, Herman , GOOSEN, Maikel, Robert , SMAKMAN, Erwin, Paul , MANGNUS, Albertus, Victor, Gerardus , REN, Yan , LASSISE, Adam
IPC: H01J37/147 , H01J37/26 , H01J37/04
Abstract: Apparatuses and methods for charged-particle detection may include a deflector system configured to direct charged-particle pulses, a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.
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公开(公告)号：EP4266347A1
公开(公告)日：2023-10-25
申请号：EP22168912.8
申请日：2022-04-19
Applicant: ASML Netherlands B.V.
Inventor： VAN WEPEREN, Ilse , REN, Yan
IPC: H01J37/244
Abstract: A method for filtering false positives in a charged particle beam detector includes utilizing spatial information of detected charged particle landing events on the detector. A spatial distribution of detected charged particle landing events on the detector is compared to an expected distribution of landing events to determine the probability that the charged particle landing events are real.
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公开(公告)号：EP4256601A1
公开(公告)日：2023-10-11
申请号：EP21810001.4
申请日：2021-11-09
Applicant: ASML Netherlands B.V.
Inventor： SLOT, Erwin , MANGNUS, Albertus, Victor, Gerardus , SMAKMAN, Erwin, Paul , REN, Yan , SCOTUZZI, Marijke
IPC: H01J37/304
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