公开(公告)号：WO2015055374A1

公开(公告)日：2015-04-23

申请号：PCT/EP2014/069935

申请日：2014-09-18

Applicant: ASML NETHERLANDS B.V.

Inventor： BRULS, Richard ,  ZHAO, Chuangxin ,  BALTUSSEN, Sander ,  BROMAN, Par ,  CRAUS, Cristian ,  GROENEWOLD, Jan ,  LABETSKI, Dzmitry ,  NADIR, Kerim ,  SCHIMMEL, Hendrikus ,  WÄHLISCH, Christian

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70058 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/005

Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can comprise a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.

Abstract translation: 用于光刻设备，特别是激光产生的等离子体源的辐射源包括风扇单元，其围绕但不阻碍收集的辐射束，其被操作以产生远离光轴的缓冲气体中的流。 风扇单元可以包括大致平行于光轴并被驱动绕光轴旋转的多个平面或弯曲的叶片。

公开(公告)号：WO2016192785A1

公开(公告)日：2016-12-08

申请号：PCT/EP2015/062351

申请日：2015-06-03

Applicant: ASML NETHERLANDS B.V.

Inventor： JANSSEN, Paul ,  BRULS, Richard ,  VAN GILS, Petrus

IPC: G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70866 ,  G03F7/70708 ,  G03F7/70783 ,  H01L21/6831

Abstract: A lithographic apparatus comprises a first object holder (WT) and a second object holder. The first object holder is arranged for holding an object (W) at a holder-facing surface. The object has the holder-facing surface. The second object holder is arranged for holding the object at the holder-facing surface. The lithographic apparatus is arranged to deform a contaminating particle (50) at the holder-facing surface more when the object is held at the second object holder than when the object is held at the first object holder.

Abstract translation: 光刻设备包括第一物体保持器（WT）和第二物体保持器。 第一物体保持器布置成用于将物体（W）保持在面向保持器的表面上。 该物体具有支架朝向的表面。 第二物体保持器布置成用于将物体保持在面向保持器的表面上。 光刻设备被布置成当物体保持在第二物体保持器时比在物体被保持在第一物体保持器处时更多地使保持器朝向的表面上的污染颗粒（50）变形。

公开(公告)号：WO2011098169A1

公开(公告)日：2011-08-18

申请号：PCT/EP2010/069192

申请日：2010-12-08

Applicant: ASML NETHERLANDS B.V. ,  KEMPEN, Antonius ,  BRULS, Richard ,  LOOPSTRA, Erik ,  MOORS, Roel ,  SWINKELS, Gerardus ,  MESTROM, Wilbert

Inventor： KEMPEN, Antonius ,  BRULS, Richard ,  LOOPSTRA, Erik ,  MOORS, Roel ,  SWINKELS, Gerardus ,  MESTROM, Wilbert

IPC: G03F7/20

CPC classification number: G03F7/70908 ,  B08B3/08 ,  G03F7/70033 ,  G03F7/708 ,  G03F7/70916 ,  G03F7/70925

Abstract: A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H 2 O, H 2 O 2 , O 2 , NH 3 or NO x , is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.

Abstract translation: 辐射源为光刻设备产生极紫外辐射，作为设置有低压氢环境的室。 向腔室提供痕量的保护性化合物，例如H 2 O，H 2 O 2，O 2，NH 3或NO x，以有助于在室中的金属（例如钛）组分上维持保护性氧化膜。