Abstract:
A radiation system for generating a radiation emitting plasma comprises a fuel emitter (3) configured to provide fuel (70) to a plasma formation region (4), a laser (1) arranged to provide a laser beam (2) at the plasma formation region incident on the fuel to generate a radiation emitting plasma (7), and an imaging device (10) arranged to obtain at least one image of an imaging region, the image indicating at least one property of the fuel and/or the radiation emitting plasma and/or debris. The imaging region is located between the fuel emitter and the plasma formation region, or the imaging region is located between the plasma formation region and a further component of the radiation system. The system further comprises a controller (11) configured to process the at least one image and to provide an instruction in dependence on said at least one property of the fuel and/or the radiation emitting plasma and/or debris.
Abstract:
Capacitive measurements for monitoring vapor or deposits from a vapor in a radiation source for a lithography apparatus. The measurements may be used to control operation of the radiation source. In one particular arrangement measurements from a plurality of capacitors are used to distinguish between changes in capacitance caused by the vapor and changes in capacitance caused by deposits from the vapor.
Abstract:
A radiation source (SO), which is operable to produce pulses of radiation, comprises: a wall (9,21) with an aperture (8,22); a radiation collector; a rotatable shield (200); and a drive mechanism (230) arranged to rotate the shield about a rotation axis (222). The radiation source may be a laser produced plasma source. The radiation collector is arranged to direct pulses of radiation along an optical axis of the radiation collector and focus the pulses of radiation at an intermediate focus, said optical axis passing through the aperture and said intermediate focus being in the vicinity of the aperture. The shield comprises a body (210) with one or more openings, said one or more openings forming a passageway extending through the body. The drive mechanism is arranged to rotate the shield such that the passageway is intermittently aligned with the aperture as each pulse of radiation reaches the shield to allow the pulses of radiation to pass through the aperture in the wall, and the body at least partially covers the aperture in between consecutive pulses of radiation. The rotation axis of the shield is generally perpendicular to the optical axis of the radiation collector.
Abstract:
A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can comprise a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.