公开(公告)号：WO2020086478A1

公开(公告)日：2020-04-30

申请号：PCT/US2019/057256

申请日：2019-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： LABETSKI, Dzmitry ,  LAFORGE, Andrew, David ,  MA, Yue

IPC: H05G2/00 ,  G03F7/20

Abstract: Disclosed is a source for and method of generating extreme ultraviolet radiation in which spitting of molten target material is hindered through depletion of the number of hydrogen radicals available to enter deposits of molten target material and create hydrogen bubbles therein by introducing an active gas that reacts with the hydrogen radicals.

公开(公告)号：WO2014082811A1

公开(公告)日：2014-06-05

申请号：PCT/EP2013/072689

申请日：2013-10-30

Applicant: ASML NETHERLANDS B.V.

Inventor： DIJKSMAN, Johan ,  BADIE, Ramin ,  HULTERMANS, Ronald ,  LABETSKI, Dzmitry

IPC: H05G2/00

CPC classification number: G03F7/70033 ,  B05B17/06 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A droplet generator, for an EUV radiation source, comprises: a capillary in which, in use, molten material flows; an actuator configured to modulate a pressure inside the capillary; and a controller configured to drive the actuator at a driving frequency; wherein the droplet generator is arranged such that, in use, the driving frequency is equal or about equal to a main resonance frequency of the molten material in the capillary.

Abstract translation: 用于EUV辐射源的液滴发生器包括：毛细管，其中在使用中熔融材料流动; 构造成调节毛细管内的压力的致动器; 以及控制器，其构造成以驱动频率驱动所述致动器; 其中所述液滴发生器被布置为使得在使用中，所述驱动频率等于或大致等于所述毛细管中的熔融材料的主共振频率。

公开(公告)号：WO2009061188A3

公开(公告)日：2009-05-14

申请号：PCT/NL2008/050700

申请日：2008-11-06

Applicant: ASML Netherlands B.V. ,  SCHIMMEL, Hendrikus Gijsbertus ,  VAN EMPEL, Tjarko Adriaan Rudolf ,  SWINKELS, Gerardus Hubertus Petrus Maria ,  HAAST, Marc Antonius Maria ,  LABETSKI, Dzmitry ,  FRERIKS, Johannes Maria ,  VAN DE VIJVER, Yuri Johannes Gabriël ,  VERSTEEG, Wendelin Johanna Maria ,  JONKERS, Peter Gerardus

Inventor： SCHIMMEL, Hendrikus Gijsbertus ,  VAN EMPEL, Tjarko Adriaan Rudolf ,  SWINKELS, Gerardus Hubertus Petrus Maria ,  HAAST, Marc Antonius Maria ,  LABETSKI, Dzmitry ,  FRERIKS, Johannes Maria ,  VAN DE VIJVER, Yuri Johannes Gabriël ,  VERSTEEG, Wendelin Johanna Maria ,  JONKERS, Peter Gerardus

IPC: G03F7/20

Abstract: The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.

公开(公告)号：WO2013189827A3

公开(公告)日：2013-12-27

申请号：PCT/EP2013/062259

申请日：2013-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： RIEPEN, Michel ,  LABETSKI, Dzmitry ,  MESTROM, Wilbert ,  KAMPINGA, Wim, Ronald ,  NIEUWENKAMP, Jan, Okke ,  BRINKERT, Jacob ,  CASTELIJNS, Henricus ,  TEN KATE, Nicolaas ,  SCHIMMEL, Hendrikus ,  JANSEN, Hans ,  PAULUSSEN, Dennis ,  VIRGO, Brian ,  JILISEN, Reinier ,  BADIE, Ramin ,  RIJPMA, Albert ,  FRANKEN, Johannes ,  VAN PUTTEN, Peter ,  VAN DER STRAATEN, Gerrit

IPC: G03F7/20 ,  H05G2/00

Abstract: A radiation source (SO) comprising a fuel source configured to deliver fuel to a location (12) from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface (24c, d) provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

公开(公告)号：WO2011131431A1

公开(公告)日：2011-10-27

申请号：PCT/EP2011/054098

申请日：2011-03-18

Applicant: ASML Netherlands B.V. ,  LABETSKI, Dzmitry ,  LOOPSTRA, Erik ,  KEMPEN, Antonius

Inventor： LABETSKI, Dzmitry ,  LOOPSTRA, Erik ,  KEMPEN, Antonius

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G02B5/08 ,  G03F7/20 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  G21K5/04

Abstract: A collector mirror assembly (302) includes a collector mirror (co') that includes a reflective surface (304) and a hole (306) having an edge (308). The hole extends through the reflective surface. The assembly also includes a tubular body (310) having an inner surface (312) and an outer surface (314). The tubular body is constructed and arranged to guide a gas flow (GF) in a direction substantially transverse to the reflective surface. The outer surface of the tubular body and the edge of the hole form an opening (316) arranged to guide a further gas flow (GF' ) that diverges with respect the gas flow substantially transverse to the reflective surface.

Abstract translation: 收集器反射镜组件（302）包括收集器反射镜（co'），其包括反射表面（304）和具有边缘（308）的孔（306）。 孔延伸穿过反射表面。 组件还包括具有内表面（312）和外表面（314）的管状体（310）。 管状体被构造和布置成沿着基本上横向于反射表面的方向引导气流（GF）。 管状体的外表面和孔的边缘形成开口（316），该开口布置成引导相对于基本上横向于反射表面的气流而发散的另外的气流（GF'）。

公开(公告)号：WO2009038460A1

公开(公告)日：2009-03-26

申请号：PCT/NL2008/050611

申请日：2008-09-17

Applicant: ASML Netherlands B.V. ,  VAN DE VIJVER, Yuri Johannes Gabriël ,  VAN EMPEL, Tjarko Adriaan Rudolf ,  VAN SCHOOT, Jan Bernard Plechelmus ,  SWINKELS, Gerardus Hubertus Petrus Maria ,  SCHIMMEL, Hendrikus Gijsbertus ,  LABETSKI, Dzmitry

Inventor： VAN DE VIJVER, Yuri Johannes Gabriël ,  VAN EMPEL, Tjarko Adriaan Rudolf ,  VAN SCHOOT, Jan Bernard Plechelmus ,  SWINKELS, Gerardus Hubertus Petrus Maria ,  SCHIMMEL, Hendrikus Gijsbertus ,  LABETSKI, Dzmitry

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/00

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/003 ,  H05G2/008

Abstract: A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system (IL) and an outlet connected to a pumping system (78) to pump away gas from between an inner wall (64) and outer wall (62) of the illumination system (IL) or, if a radiation source (SO) is present, between the inner wall (64) of the illumination system (IL) and an inner wall (62) of the radiation source (SO).

Abstract translation: 公开了一种布置成将图案从图案形成装置突出到基板上的光刻设备。 光刻设备包括照明系统（IL）和连接到泵送系统（78）的出口，用于泵送从照明系统（IL）的内壁（64）和外壁（62）之间的气体，或者如果 在照明系统（IL）的内壁（64）和辐射源（SO）的内壁（62）之间存在辐射源（SO）。

公开(公告)号：WO2018127565A3

公开(公告)日：2018-07-12

申请号：PCT/EP2018/050278

申请日：2018-01-05

Applicant: ASML NETHERLANDS B.V.

Inventor： LABETSKI, Dzmitry ,  BERENDSEN, Christianus, Wilhelmus, Johannes ,  DUARTE RODRIGES NUNES, Rui, Miguel ,  ERSHOV, Alexander, Igorevich ,  FEENSTRA, Kornelis, Frits ,  FOMENKOV, Igor, Vladimirovich ,  HUMMLER, Klaus, Martin ,  JOHNKADAKSHAM, Arun ,  KRAUSHAAR, Matthias ,  LAFORGE, Andrew, David ,  LANGLOIS, Marc, Guy ,  LOGINOV, Maksim ,  MA, Yue ,  MOJAB, Seyedmohammad ,  NADIR, Kerim ,  SHATALOV, Alexander ,  STEWART, John, Tom, ,  TEGENBOSCH, Henricus, Gerardus ,  XIA, Chunguang

IPC: H05G2/00 ,  G03F7/20

Abstract: A radiation source including a chamber including a plasma formation region, a radiation collector arranged in the chamber, the radiation collector configured to collect radiation emitted at the plasma formation region and to direct the collected radiation to an intermediate focus region, a debris mitigation system configured to direct a first gas flow from the intermediate focus region towards the plasma formation region, and a guiding device arranged in the chamber such that the first gas flow is directed around the guiding device. A system and apparatus for reducing contamination of an inner vessel wall of an EUV vessel is provided. The system and apparatus include inner vessel wall supplies of gas that introduce gas via a plurality of nozzles away from the inner vessel wall. The system and apparatus also optionally include an asymmetric exhaust to exhaust gas from the EUV vessel while providing flow geometries that promote a direction of gas away from the inner vessel wall and an EUV collector within the EUV vessel.

公开(公告)号：WO2017084872A1

公开(公告)日：2017-05-26

申请号：PCT/EP2016/076287

申请日：2016-11-01

Applicant: ASML NETHERLANDS B.V.

Inventor： YAKUNIN, Andrei, Mikhailovich ,  ASTAKHOV, Dmitry, Igorevich ,  BERENDSEN, Christianus, Wilhelmus, Johannes ,  CLOIN, Christian, Gerardus, Norbertus, Hendricus, Marie ,  GLUSHKOV, Denis, Alexandrovich ,  LABETSKI, Dzmitry ,  MULDER, Heine, Melle ,  TYCHKOV, Andrey, Sergeevich ,  VAN SCHAIK, Willem

IPC: G03F7/20

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  G03F7/70933 ,  G03F7/70983

Abstract: Disclosed is a radiation source module, and associated method of transporting fuel debris out of a source chamber. The radiation source module generates a radiation producing plasma (2) at a plasma formation site by excitation of a fuel. The radiation source (SO) comprises: a source chamber (435); a radiation collector (400) within the source chamber for collecting and focusing said radiation; a primary buffer gas inlet (410) for admitting a primary buffer gas (415) into the source chamber; and a buffer gas outlet (420) in the vicinity of said radiation collector, for exhausting said primary buffer gas from the source chamber. Also disclosed is a multi-layer mirror, and in particular a radiation collector, comprising a substrate coated with at least one reflective layer and a plurality of perforations within the reflective layer.

Abstract translation: 公开了一种辐射源模块以及将燃料碎屑从源腔室输送出去的相关方法。 辐射源模块通过激励燃料在等离子体形成位置处产生辐射产生等离子体（2）。 辐射源（SO）包括：源室（435）; 在源室内的辐射收集器（400），用于收集和聚焦所述辐射; 主缓冲气体入口（410），用于允许主缓冲气体（415）进入源腔室; 和在所述辐射收集器附近的缓冲气体出口（420），用于从所述源室排出所述主缓冲气体。 还公开了多层反射镜，特别是辐射收集器，其包括在反射层内涂覆有至少一个反射层和多个穿孔的基底。

公开(公告)号：WO2014090480A1

公开(公告)日：2014-06-19

申请号：PCT/EP2013/072927

申请日：2013-11-04

Applicant: ASML NETHERLANDS B.V.

Inventor： MESTROM, Wilbert ,  LABETSKI, Dzmitry ,  SWINKELS, Gerardus

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: Disclosed is a radiation source configured to generate a beam of EUV radiation by excitation of a fuel. The radiation source comprises a gas stream generation module which preconditions a droplet of the fuel by application of a high velocity gas stream to the droplet. Also disclosed is a lithographic apparatus comprising such a radiation source.

Abstract translation: 公开了一种被配置为通过激发燃料而产生EUV辐射束的辐射源。 辐射源包括气流发生模块，其通过向液滴施加高速气流来预处理燃料液滴。 还公开了包括这种辐射源的光刻设备。

公开(公告)号：WO2011110383A1

公开(公告)日：2011-09-15

申请号：PCT/EP2011/051334

申请日：2011-01-31

Applicant: ASML NETHERLANDS B.V. ,  LABETSKI, Dzmitry ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  YAKUNIN, Andrei

Inventor： LABETSKI, Dzmitry ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  YAKUNIN, Andrei

IPC: G03F7/20 ,  G02B5/00 ,  G21K1/08

CPC classification number: H05G2/008 ,  G02B5/00 ,  G02B19/00 ,  G02B19/0023 ,  G02B19/0028 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/003

Abstract: A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (330) towards the radiation source or collector optic in order to deflect particulate debris (43) emitted by the radiation source.

Abstract translation: 用于产生用于光刻设备的极紫外辐射的辐射源具有碎片减轻装置，其包括布置在辐射束的中间焦点（IF）处或其附近的喷嘴。 喷嘴用于引导气体（330）流向辐射源或收集器光学元件，以便偏转由辐射源发射的颗粒物（43）。