公开(公告)号：WO2019120826A1

公开(公告)日：2019-06-27

申请号：PCT/EP2018/081872

申请日：2018-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： RIJPSTRA, Manouk ,  LAMBREGTS, Cornelis, Johannes, Henricus ,  TEL, Wim, Tjibbo ,  ROY, Sarathi ,  GROUWSTRA, Cédric, Désiré ,  NIEN, Chi-Fei ,  KOU, Weitian ,  CHEN, Chang-Wei ,  SMORENBERG, Pieter, Gerardus, Jacobus

IPC: G03F7/20

Abstract: Described herein is a method for determining correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.

公开(公告)号：WO2020108862A1

公开(公告)日：2020-06-04

申请号：PCT/EP2019/078570

申请日：2019-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： CHEN, Chang-Wei ,  ZENG, Si-Han

IPC: G05B19/409 ,  G05B19/418

Abstract: Described is a user interface for designing, configuring and/or editing a control flow representing a control strategy associated with a semiconductor manufacturing process, the user interface comprising: a library of control elements comprising at least a control element representing a task of simulation and each control element being selectable by a user; a control flow editor configured to organize said control elements into a control flow representing the control strategy; and a communication interface for communicating the control flow to a calculation engine configured to evaluate the control flow.

公开(公告)号：EP3705959A1

公开(公告)日：2020-09-09

申请号：EP19160513.8

申请日：2019-03-04

Applicant: ASML Netherlands B.V.

Inventor： CHEN, Chang-Wei ,  ZENG, Si-Han

IPC: G05B19/409 ,  G05B19/418

Abstract: Described is a user interface for designing, configuring and/or editing a control flow representing a control strategy associated with a semiconductor manufacturing process. The user interface comprises a library of control elements, each control element being selectable by a user, a control flow editor configured to organize said control elements into a control flow representing the control strategy; and a communication interface for communicating the control flow to a calculation engine configured to evaluate the control flow.

公开(公告)号：EP3729197A1

公开(公告)日：2020-10-28

申请号：EP18807597.2

申请日：2018-11-20

Applicant: ASML Netherlands B.V.

Inventor： RIJPSTRA, Manouk ,  LAMBREGTS, Cornelis, Johannes, Henricus ,  TEL, Wim, Tjibbo ,  ROY, Sarathi ,  GROUWSTRA, Cédric, Désiré ,  NIEN, Chi-Fei ,  KOU, Weitian ,  CHEN, Chang-Wei ,  SMORENBERG, Pieter, Gerardus, Jacobus

IPC: G03F7/20

公开(公告)号：EP3657281A1

公开(公告)日：2020-05-27

申请号：EP19204347.9

申请日：2019-10-21

Applicant: ASML Netherlands B.V.

Inventor： CHEN, Chang-Wei ,  ZENG, Si-Han

IPC: G05B19/409 ,  G05B19/418

Abstract: Described is a user interface for designing, configuring and/or editing a control flow representing a control strategy associated with a semiconductor manufacturing process, the user interface comprising: a library of control elements comprising at least a control element representing a task of simulation and each control element being selectable by a user; a control flow editor configured to organize said control elements into a control flow representing the control strategy; and a communication interface for communicating the control flow to a calculation engine configured to evaluate the control flow.