公开(公告)号：WO2020108862A1

公开(公告)日：2020-06-04

申请号：PCT/EP2019/078570

申请日：2019-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： CHEN, Chang-Wei ,  ZENG, Si-Han

IPC: G05B19/409 ,  G05B19/418

Abstract: Described is a user interface for designing, configuring and/or editing a control flow representing a control strategy associated with a semiconductor manufacturing process, the user interface comprising: a library of control elements comprising at least a control element representing a task of simulation and each control element being selectable by a user; a control flow editor configured to organize said control elements into a control flow representing the control strategy; and a communication interface for communicating the control flow to a calculation engine configured to evaluate the control flow.

公开(公告)号：WO2018108527A1

公开(公告)日：2018-06-21

申请号：PCT/EP2017/080770

申请日：2017-11-29

Applicant: ASML NETHERLANDS B.V.

Inventor： WARNAAR, Patrick ,  VAN DER SCHAAR, Maurits ,  GRZELA, Grzegorz ,  KOOP, Erik, Johan ,  CALADO, Victor, Emanuel ,  ZENG, Si-Han

IPC: G03F7/20

Abstract: A method of measuring a property of a substrate, the substrate having a plurality of targets formed thereon, the method comprising: measuring N targets of the plurality of targets using an optical measurement system, where N is an integer greater than 2 and each of said N targets is measured W t times, where W t is an integer greater than 2 so as to obtain N*W t measurement values; and determining R property values using Q equations and the N*W t measurement values, where R t ; wherein the optical measurement system has at least one changeable setting and, for each of the N targets, measurement values are obtained using different setting values of at least one changeable setting.

公开(公告)号：WO2016169901A1

公开(公告)日：2016-10-27

申请号：PCT/EP2016/058582

申请日：2016-04-18

Applicant: ASML NETHERLANDS B.V.

Inventor： ZENG, Si-Han ,  PENG, Yue-Lin ,  FANG, Jen-Yu ,  DEN BOEF, Arie, Jeffrey ,  STRAAIJER, Alexander ,  HUNG, Ching-Yi ,  WARNAAR, Patrick

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G01B11/24 ,  G01B11/272

Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process. The method comprising the steps of: obtaining first measurements comprising measurements of structural asymmetry relating to a plurality of first structures, each of said plurality of measurements of structural asymmetry corresponding to a different measurement combination of measurement radiation and a value for at least a first parameter; obtaining a plurality of second measurements of target asymmetry relating to a plurality of targets, each of said plurality of measurements of target asymmetry corresponding to one of said different measurement combinations, determining a relationship function describing the relationship between said first measurements and said second measurements, for each of said measurement combinations; determining, from said relationship function, a corrected overlay value, said corrected overlay value being corrected for structural contribution due to structural asymmetry in at least said first structure.

Abstract translation: 公开了用于测量光刻工艺的参数的方法，计算机程序和相关联的装置。 该方法包括以下步骤：获得包括与多个第一结构相关的结构不对称性的测量的第一测量，所述多个测量结构不对称中的每一个对应于测量辐射的不同测量组合和至少第一参数的值 ; 获得与多个目标相关的目标不对称性的多个第二测量值，所述多个测量目标不对称中的每一个对应于所述不同测量组合之一，确定描述所述第一测量和所述第二测量之间的关系的关系函数， 对于每个所述测量组合; 根据所述关系函数确定校正的重叠值，所述校正重叠值由于至少所述第一结构中的结构不对称而被校正为结构贡献。

公开(公告)号：EP4497038A1

公开(公告)日：2025-01-29

申请号：EP23705591.8

申请日：2023-02-22

Applicant: ASML Netherlands B.V.

Inventor： HAUPTMANN, Marc ,  MEIJERINK, Rick, Jeroen ,  ZENG, Si-Han ,  BAO, Jiazi

IPC: G03F7/20

公开(公告)号：EP3657281A1

公开(公告)日：2020-05-27

申请号：EP19204347.9

申请日：2019-10-21

Applicant: ASML Netherlands B.V.

Inventor： CHEN, Chang-Wei ,  ZENG, Si-Han

IPC: G05B19/409 ,  G05B19/418

Abstract: Described is a user interface for designing, configuring and/or editing a control flow representing a control strategy associated with a semiconductor manufacturing process, the user interface comprising: a library of control elements comprising at least a control element representing a task of simulation and each control element being selectable by a user; a control flow editor configured to organize said control elements into a control flow representing the control strategy; and a communication interface for communicating the control flow to a calculation engine configured to evaluate the control flow.

公开(公告)号：EP4250009A1

公开(公告)日：2023-09-27

申请号：EP22163435.5

申请日：2022-03-22

Applicant: ASML Netherlands B.V.

Inventor： HAUPTMANN, Marc ,  MEIJERINK, Rick, Jeroen ,  ZENG, Si-Han ,  BAO, Jiazi

IPC: G03F7/20

Abstract: Disclosed is a method for performing a lithographic apparatus setup calibration and/or drift correction for a specific lithographic apparatus of a population of lithographic apparatuses to be used in a manufacturing process for manufacturing an integrated circuit extending across a plurality of layers on a substrate. The method comprises determining a spatial error distribution of an apparatus parameter across spatial coordinates on the substrate for each lithographic apparatus of the population of lithographic apparatuses and/or each layer of the plurality of layers; determining a reference distribution by aggregating each of the spatial error distributions to optimize the reference distribution such that a spatial distribution of a parameter of interest of the manufacturing process is co-optimized across the population of lithographic apparatuses and/or plurality of layers; and using the reference distribution as a target distribution for the apparatus parameter for each lithographic apparatus and/or layer.

公开(公告)号：EP3705959A1

公开(公告)日：2020-09-09

申请号：EP19160513.8

申请日：2019-03-04

Applicant: ASML Netherlands B.V.

Inventor： CHEN, Chang-Wei ,  ZENG, Si-Han

IPC: G05B19/409 ,  G05B19/418

Abstract: Described is a user interface for designing, configuring and/or editing a control flow representing a control strategy associated with a semiconductor manufacturing process. The user interface comprises a library of control elements, each control element being selectable by a user, a control flow editor configured to organize said control elements into a control flow representing the control strategy; and a communication interface for communicating the control flow to a calculation engine configured to evaluate the control flow.

公开(公告)号：EP4555383A1

公开(公告)日：2025-05-21

申请号：EP23731550.2

申请日：2023-05-31

Applicant: ASML Netherlands B.V.

Inventor： MEIJERINK, Rick, Jeroen ,  VAN DEN HEUVEL, Marco, Adrianus, Peter ,  VAN DER MAADEN, Martijn ,  ZENG, Si-Han ,  PÉREZ MUÑOZ, Juan Camilo

IPC: G03F7/00 ,  H01L21/673 ,  H01L21/687

公开(公告)号：EP3336607A1

公开(公告)日：2018-06-20

申请号：EP16204764.1

申请日：2016-12-16

Applicant: ASML Netherlands B.V.

Inventor： WARNAAR, Patrick ,  VAN DER SCHAAR, Maurits ,  GRZELA, Grzegorz ,  KOOP, Erik Johan ,  CALADO, Victor Emanuel ,  ZENG, Si-Han

IPC: G03F7/20

CPC classification number: G03F7/7065 ,  G01N21/47 ,  G03F7/70633

Abstract: A method of measuring a property of a substrate, the substrate having a plurality of targets formed thereon, the method comprising:
measuring N targets of the plurality of targets using an optical measurement system, where N is an integer greater than 2 and each of said N targets is measured W t times, where W t is an integer greater than 2 so as to obtain N*W t measurement values; and
determining R property values using Q equations and the N*W t measurement values, where R t ;
wherein the optical measurement system has at least one changeable setting and, for each of the N targets, measurement values are obtained using different setting values of at least one changeable setting.