公开(公告)号：WO2010142497A1

公开(公告)日：2010-12-16

申请号：PCT/EP2010/056006

申请日：2010-05-04

Applicant: ASML NETHERLANDS B.V. ,  DIERICHS, Marcel ,  EURLINGS, Markus ,  VAN GREEVENBROEK, Hendrikus ,  VERWEIJ, Antonie

Inventor： DIERICHS, Marcel ,  EURLINGS, Markus ,  VAN GREEVENBROEK, Hendrikus ,  VERWEIJ, Antonie

IPC: G03F7/20

CPC classification number: G03F7/70941 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70283

Abstract: There is provided a lithographic apparatus comprising an illumination system IL for providing a beam B of extreme ultra-violet radiation, a masking device MB for controlling the illumination of a patterning device MA by the beam of radiation, a support MT for supporting the patterning device, the patterning device configured to impart a pattern to the beam of radiation, a substrate table WT for holding a substrate W, and a projection system PL for projecting the patterned beam of radiation onto a target portion of the substrate, wherein the masking device MD comprises a masking blade MB configured to reflect extreme ultra-violet radiation incident on the masking blade such that at least a portion of the reflected radiation is not captured by the projection system.

Abstract translation: 提供了一种光刻设备，其包括用于提供极紫外辐射的光束B的照明系统IL，用于通过辐射束控制图案形成装置MA的照明的掩蔽装置MB，用于支撑图案形成装置 配置成将图案赋予辐射束的图案形成装置，用于保持基板W的基板台WT和用于将图案化的辐射束投射到基板的目标部分的投影系统PL，其中，掩模装置MD 包括被配置为反射入射在掩蔽刀片上的极紫外辐射的掩模刀片MB，使得反射辐射的至少一部分不被投影系统捕获。

公开(公告)号：WO2014001071A3

公开(公告)日：2014-01-03

申请号：PCT/EP2013/061941

申请日：2013-06-11

Applicant: ASML NETHERLANDS B.V.

Inventor： KLEEMANS, Niek ,  VAN ASTEN, Nicolaas ,  KOLESNYCHENKO, Aleksey ,  VAN AERLE, Nick ,  BAAS, Gerardus ,  EURLINGS, Markus ,  BEIJSENS, Rolf

IPC: G03F7/20 ,  G01J1/02 ,  G01J1/42 ,  G01J5/10 ,  G02B5/18 ,  G02B27/44

Abstract: A collector module (SO) is disclosed comprising: a collector (14) for collecting radiation generated by a radiation generating plasma (10), and for directing at least a portion of the generated radiation to a focal point (16); a structure (30) upstream of the focal point and extending at least partially around an expected position of a beam comprising the at least a portion of the collected radiation (B); a diffractive element being arranged to diffract infrared radiation that is reflected from the plasma formation location. When the plasma formation location is at an intended location, m = +1 diffracted infrared radiation (32) is directed towards a first region of the structure. At m = -1 diffracted infrared radiation is directed towards a second region of the structure. Also disclosed is an infra-red detector with increased dynamic range obtained by providing a screen for forming an image of a hotspot and a camera directed on to the screen. The dynamic range of the detector is improved either by heating the screen such that a low intensity hotspot is raised above a camera threshold, or by dividing the image into multiple images of differing intensities.

公开(公告)号：WO2012048974A1

公开(公告)日：2012-04-19

申请号：PCT/EP2011/065811

申请日：2011-09-13

Applicant: ASML Netherlands B.V. ,  NEERHOF, Hendrik ,  EURLINGS, Markus

Inventor： NEERHOF, Hendrik ,  EURLINGS, Markus

IPC: G03F7/20

CPC classification number: G03F7/70133 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70525 ,  G03F7/70575 ,  G03F7/7085 ,  G03F7/70983

Abstract: A lithographic apparatus comprising a source of EUV radiation, an illumination system configured to condition a radiation beam, and a projection system configured to project the radiation beam onto a substrate, wherein the apparatus further comprises a filter configured to prevent or reduce the transmission of unwanted radiation and an apparatus configured to detect damage of the filter, wherein the damage detection apparatus comprises an antenna configured to receive radio waves and an analysis apparatus configured to determine the presence of filter damage based upon the received radio waves.

Abstract translation: 包括EUV辐射源的光刻设备，被配置为调节辐射束的照明系统以及被配置为将辐射束投影到衬底上的投影系统，其中所述设备还包括被配置为防止或减少不想要的辐射的传输的过滤器 辐射和被配置为检测过滤器的损坏的装置，其中所述损坏检测装置包括被配置为接收无线电波的天线和被配置为基于所接收的无线电波来确定过滤器损坏的存在的分析装置。

公开(公告)号：WO2015028211A1

公开(公告)日：2015-03-05

申请号：PCT/EP2014/065905

申请日：2014-07-24

Applicant: ASML NETHERLANDS B.V.

Inventor： NOORDMAN, Oscar ,  EURLINGS, Markus

IPC: G03F7/20 ,  H01S3/23 ,  H05G2/00 ,  G02B27/09 ,  G02B26/06

CPC classification number: G03F7/70133 ,  G02B27/44 ,  G02B27/50 ,  G03F7/70041 ,  H01S3/005 ,  H01S3/1307 ,  H01S3/2391 ,  H05G2/006 ,  H05G2/008

Abstract: A radiation source includes a nozzle configured to direct a stream of fuel droplets along a droplet path towards a plasma formation location, and is configured to receive a gaussian radiation beam having gaussian intensity distribution, having a predetermined wavelength and propagating along a predetermined trajectory, and further configured to focus the radiation beam on a fuel droplet at the plasma formation location. The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. A difference between the optical path lengths is an odd number of times half the predetermined wavelength.

Abstract translation: 辐射源包括喷嘴，其被配置为沿着液滴路径朝向等离子体形成位置引导燃料液滴流，并且被配置为接收具有高斯强度分布的高斯辐射束，其具有预定波长并沿预定轨迹传播;以及 进一步配置成将辐射束聚焦在等离子体形成位置处的燃料液滴上。 辐射源包括包括一个或多个相位板的相位板结构。 相位板结构具有第一区和第二区。 这些区域布置成使得具有通过第一区域的预定波长的辐射和通过第二区域的具有预定波长的辐射沿着具有不同光程长度的各个光路传播。 光路长度之差是奇数倍的预定波长的一半。

公开(公告)号：WO2014095261A1

公开(公告)日：2014-06-26

申请号：PCT/EP2013/074710

申请日：2013-11-26

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN SCHOOT, Jan ,  EURLINGS, Markus ,  KREUWEL, Hermanus

IPC: G03F7/20 ,  H05G2/00

CPC classification number: H05G2/006 ,  G02B19/0023 ,  G02B19/0047 ,  G02B27/0983 ,  G03F7/70033 ,  G03F7/70041 ,  H05G2/008

Abstract: A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.

Abstract translation: 光束输送装置与激光产生的等离子体源一起使用。 光束传送装置包括可变焦距光学器件（550），其可操作以调节辐射束，以便输出具有可配置光束直径（b）的调节光束和多个反射镜（530a，530b），可操作以将经调节的光束 辐射到等离子体生成部位。 光束传送装置能够控制光束相对于光束的聚焦位置（570）具有特定直径的光束的轴向位置。 此外，使用一种方法来控制等离子体产生位置处的位置的轴向位置，其中光束相对于光束的聚焦位置具有特定的直径。