公开(公告)号：US20190179232A1

公开(公告)日：2019-06-13

申请号：US16276861

申请日：2019-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel BECKERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Nicolaas Rudolf KEMPER ,  Ferdy MIGCHELBRINK ,  Elmar EVERS

IPC: G03F7/20

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

公开(公告)号：US20180081285A1

公开(公告)日：2018-03-22

申请号：US15824686

申请日：2017-11-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel BECKERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Nicolaas Rudolf KEMPER ,  Ferdy MIGCHELBRINK ,  Elmar EVERS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.