公开(公告)号：US20190179232A1

公开(公告)日：2019-06-13

申请号：US16276861

申请日：2019-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel BECKERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Nicolaas Rudolf KEMPER ,  Ferdy MIGCHELBRINK ,  Elmar EVERS

IPC: G03F7/20

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

公开(公告)号：US20230314964A1

公开(公告)日：2023-10-05

申请号：US18001256

申请日：2021-05-10

Applicant: ASML Netherlands B.V.

Inventor： José Nilton FONSECA JUNIOR ,  Zhuangxiong HUANG ,  Franciscus Johannes Leonardus HEUTZ ,  Ferdy MIGCHELBRINK ,  Henricus Anita Jozef Wilhelmus VAN DE VEN ,  Ramo OMEROVIC ,  Emericus Antoon Theodorus VAN DEN AKKER

IPC: G03F7/20 ,  G03F1/48 ,  G03F1/46

CPC classification number: G03F7/70933 ,  G03F7/70958 ,  G03F7/70808 ,  G03F1/48 ,  G03F1/46

Abstract: The present invention provides a fluid purging system (100) for an optical element (120), comprising a fluid guiding unit arranged to guide a fluid, provided by a fluid supply system, over at least a curved portion of an optical surface (122) of the optical element. The fluid guiding unit comprises a fluid inlet and a first nozzle unit (110) for providing a fluid to the optical surface. The fluid guiding unit being formed by at least a first wall portion (102) and at least a second wall portion (104), wherein the second wall portion being configured to face the optical surface and to follow a contour of the optical surface. The second wall portion comprises a second nozzle unit (112).

公开(公告)号：US20180081285A1

公开(公告)日：2018-03-22

申请号：US15824686

申请日：2017-11-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel BECKERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Nicolaas Rudolf KEMPER ,  Ferdy MIGCHELBRINK ,  Elmar EVERS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

公开(公告)号：US20230205102A1

公开(公告)日：2023-06-29

申请号：US18008409

申请日：2021-04-30

Applicant: ASML Netherlands B.V.

Inventor： José Nilton FONSECA JUNIOR ,  Franciscus Johannes Leonardus HEUTZ ,  Zhuangxiong HUANG ,  Ferdy MIGCHELBRINK

IPC: G03F7/20 ,  G02B27/00

CPC classification number: G03F7/70933 ,  G02B27/0006 ,  G03F7/70833

Abstract: The present invention provides a fluid purging system (100) for an optical element (30), comprising a ring and a fluid supply system (40). The ring being formed of a body entirely surrounding the optical element, the ring defining a space (5) radially inwards thereof and adjacent to the optical element. The ring is formed by at least one first wall portion (10) and at least one second wall portion (20A;20B), wherein an average height of the first wall portion is greater than an average height of the second wall portion. The fluid supply system is positioned radially outwards of the ring and configured to supply fluid to pass over the at least one second wall portion to the space.

公开(公告)号：US20210116824A1

公开(公告)日：2021-04-22

申请号：US16981813

申请日：2019-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Miao YU ,  Petrus, Martinus, Gerardus, Jothannes ARTS ,  Erik, Henricus, Egidius, Catharina EUMMELEN ,  Giovanni Luca GATTOBIGIO ,  Maarten HOLTRUST ,  Han, Henricus, Aldegonda LEMPENS ,  Ferdy MIGCHELBRINK ,  Theodorus Wilhelmus POLET ,  Gheorghe TANASA

IPC: G03F7/20

Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.

公开(公告)号：US20180181004A1

公开(公告)日：2018-06-28

申请号：US15738701

申请日：2016-06-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan SAEED ,  Petrus Martinus Gerardus Johannes ARTS ,  Harold Sebastiaan BUDDENBERG ,  Erik Henricus Egidius Catharina EUMMELEN ,  Giovanni Luca GATTOBIGIO ,  Floor Lodewijk KEUKENS ,  Ferdy MIGCHELBRINK ,  Jeroen Arnoldus Leonardus Johanne RAAYMAKERS ,  Arnoldus Johannes Martinus Jozeph RAS ,  Gheorghe TANASA ,  Jimmy Matheus Wilhelmus VAN DE WINKEL ,  Daan Daniel Johannes Antonius VAN SOMMEREN ,  Marijn WOUTERS ,  Miao YU

IPC: G03F7/20 ,  G01N21/95

CPC classification number: G03F7/7085 ,  G01N21/9515 ,  G03F7/70341 ,  G03F7/7065 ,  G03F7/70916 ,  H01L22/12 ,  H01L27/14627 ,  H01L27/14678 ,  H01L27/14862

Abstract: An inspection substrate for inspecting a component, e.g. a liquid confinement system, of an apparatus for processing production substrates, e.g. a lithographic apparatus, the inspection substrate comprising: a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus; an illumination device, e.g. light emitting diodes, embedded in the body; a sensor, e.g. an imaging device or a pressure sensor, for generating inspection information relating to a parameter of a component of the apparatus proximate to the inspection substrate, the sensor embedded in the body; and a storage device embedded in the body, the storage device configured to store the inspection information, e.g. image data.

公开(公告)号：US20170038695A1

公开(公告)日：2017-02-09

申请号：US15299240

申请日：2016-10-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Marcel BECKERS ,  Stefan Philip Christiaan BELFROID ,  Ferdy MIGCHELBRINK ,  Sergei SHULEPOV

IPC: G03F7/20

Abstract: A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.

Abstract translation: 提供多个提取管道以将浸入液体移入室中。 提取管道布置在与基板的目标部分不同的距离处。 提供了一个通道，吸入力被施加到该通道上。 当所有导管充满浸没液体时，提取能力将大于当一个或多个导管包含气体时的提取能力。