公开(公告)号：WO2020136012A1

公开(公告)日：2020-07-02

申请号：PCT/EP2019/084827

申请日：2019-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： FANG, Jie ,  WANG, Yixiang ,  ZHANG, Qirong ,  ZHANG, Haojie ,  YANG, Jinmei ,  ZHU, Fenghui

IPC: H01J37/09

Abstract: A method of manufacturing an aperture device includes forming a first layer (510) on a first side of a base layer (500). The base layer may be part of a substrate including a plurality of layers. The method also includes forming a second layer (515) on the first layer. A material of the second layer includes metal. The method also includes forming an opening (516) in the second layer, forming an opening (511) in the first layer by etching, removing the second layer, and forming an opening (505) in the base layer by electrochemical etching. The method may include dry etching of the first layer.

公开(公告)号：WO2021078819A1

公开(公告)日：2021-04-29

申请号：PCT/EP2020/079672

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Jian ,  YE, Ning ,  WANG, Yixiang ,  FANG, Jie

IPC: H01J37/22 ,  H01J37/28 ,  G01N23/2251

Abstract: An apparatus for and a method of inspecting a substrate in which a charged particle beam is arranged to impinge on a portion of the substrate and a first light beam having a first wavelength and a second light beam having a second wavelength different from the first wavelength are also arranged to impinge on the portion of the substrate.