公开(公告)号：US20190391500A1

公开(公告)日：2019-12-26

申请号：US16486169

申请日：2018-02-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Antoine Gaston Marie KIERS ,  Scott Anderson MIDDLEBROOKS ,  Jan-Willem GEMMINK

IPC: G03F7/20 ,  G01N21/956 ,  G01N21/95 ,  G03F7/00

Abstract: Methods of measuring variation across multiple instances of a pattern on a substrate or substrates after a step in a device manufacturing process are disclosed. In one arrangement, data representing a set of images is received. Each image represents a different instance of the pattern, wherein the pattern includes a plurality of pattern elements. The set of images are registered relative to each other to superimpose the instances of the pattern. The registration includes applying different weightings to two or more of the plurality of pattern elements, wherein the weightings control the extent to which each pattern element contributes to the registration of the set of images and each weighting is based on an expected variation of the pattern element to which the weighting is applied. Variation in the pattern is measured using the registered set of images.

公开(公告)号：US20190214318A1

公开(公告)日：2019-07-11

申请号：US16328319

申请日：2017-08-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Mark John MASLOW ,  Johannes Catharinus Hubertus MULKENS ,  Peter TEN BERGE ,  Franciscus VAN DE MAST ,  Jan-Willem GEMMINK ,  Liesbeth REIJNEN

IPC: H01L21/66 ,  G03F7/36 ,  G03F7/20 ,  H01L21/311 ,  H01L21/67

CPC classification number: H01L22/20 ,  G03F7/36 ,  G03F7/70616 ,  G03F7/70683 ,  H01L21/31105 ,  H01L21/31144 ,  H01L21/67253

Abstract: A substrate, including a substrate layer; and an etchable layer on the substrate layer, the etchable layer including a patterned region thereon or therein and including a blank region of sufficient size to enable a bulk etch rate of an etch tool for etching the blank region to be determined.

公开(公告)号：US20220075276A1

公开(公告)日：2022-03-10

申请号：US17419648

申请日：2019-12-24

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus MATHIJSSEN ,  Marc Johannes NOOT ,  Kaustuve BHATTACHARYYA ,  Arie Jeffrey DEN BOEF ,  Grzegorz GRZELA ,  Timothy Dugan DAVIS ,  Olger Victor ZWIER ,  Ralph Timtheus HUIJGEN ,  Peter David ENGBLOM ,  Jan-Willem GEMMINK

IPC: G03F7/20 ,  G06T7/00 ,  G01N21/47

Abstract: A method provides the steps of receiving an image from a metrology tool, determining individual units of said image and discriminating the units which provide accurate metrology values. The images are obtained by measuring the metrology target at multiple wavelengths. The discrimination between the units, when these units are pixels in said image, is based on calculating a degree of similarity between said units.