公开(公告)号：WO2018233947A1

公开(公告)日：2018-12-27

申请号：PCT/EP2018/062778

申请日：2018-05-16

Applicant: ASML NETHERLANDS B.V.

Inventor： JAK, Martin Jacobus Johan ,  QUINTANILHA, Richard ,  DEN BOEF, Arie Jeffrey ,  KUBIS, Michael

IPC: G03F7/20

Abstract: A method of determining an edge roughness parameter has the steps: (1010) controlling a radiation system to provide a spot of radiation at a measurement position for receiving a substrate; (1020) receiving a measurement signal from a sensor for measuring intensity of a forbidden diffraction order (such as a second order) being diffracted by a metrology target at the measurement position when the metrology target is illuminated by the spot of radiation, the metrology target comprising a repetitive pattern being configured by configuration of a linewidth / pitch ratio (of about 0.5) to control an amount of destructive interference that leads to forbidding of the diffraction order, the sensor being configured to provide the measurement signal based on the measured intensity; and (1040) determining an edge roughness parameter based on the measured intensity of the forbidden diffraction order.

公开(公告)号：EP3467589A1

公开(公告)日：2019-04-10

申请号：EP17195151.0

申请日：2017-10-06

Applicant: ASML Netherlands B.V.

Inventor： JAK, Martin Jacobus Johan ,  QUINTANILHA, Richard ,  DEN BOEF, Arie Jeffrey ,  KUBIS, Michael

IPC: G03F7/20

Abstract: A method of determining an edge roughness parameter has the steps: (1010) controlling a radiation system to provide a spot of radiation at a measurement position for receiving a substrate; (1020) receiving a measurement signal from a sensor for measuring intensity of a forbidden diffraction order (such as a second order) being diffracted by a metrology target at the measurement position when the metrology target is illuminated by the spot of radiation, the metrology target comprising a repetitive pattern being configured by configuration of a linewidth / pitch ratio (of about 0.5) to control an amount of destructive interference that leads to forbidding of the diffraction order, the sensor being configured to provide the measurement signal based on the measured intensity; and (1040) determining an edge roughness parameter based on the measured intensity of the forbidden diffraction order.

公开(公告)号：EP3462239A1

公开(公告)日：2019-04-03

申请号：EP17193415.1

申请日：2017-09-27

Applicant: ASML Netherlands B.V.

Inventor： MATHIJSSEN, Simon Gijsbert Josephus ,  JAK, Martin Jacobus Johan ,  BHATTACHARYYA, Kaustuve

IPC: G03F7/20

Abstract: An apparatus and method for estimating a parameter of a lithographic process and an apparatus and method for determining a relationship between a measure of quality of an estimate of a parameter of a lithographic process are provided. In the apparatus for estimating the parameter a processor is configured to determine a quality of the estimate of the parameter relating to the tested substrate based on a measure of feature asymmetry in the at least first features of the tested substrate and further based on a relationship determined for a plurality of corresponding at least first features of at least one further substrate representative of the tested substrate, the relationship being between a measure of quality of an estimate of the parameter relating to the at least one further substrate and a measure of feature asymmetry in the corresponding first features.

公开(公告)号：EP3460574A1

公开(公告)日：2019-03-27

申请号：EP17192525.8

申请日：2017-09-22

Applicant: ASML Netherlands B.V.

Inventor： JAK, Martin Jacobus Johan ,  MATHIJSSEN, Simon Gijsbert Josephus ,  BHATTACHARYYA, Kaustuve

IPC: G03F7/20

Abstract: A method to determine a patterning process parameter, the method comprising: for a target, calculating a first value for an intermediate parameter from data obtained by illuminating the target with radiation comprising a central wavelength; for the target, calculating a second value for the intermediate parameter from data obtained by illuminating the target with radiation comprising two different central wavelengths; and calculating a combined measurement for the patterning process parameter based on the first and second values for the intermediate parameter.

公开(公告)号：EP3454123A1

公开(公告)日：2019-03-13

申请号：EP17189662.4

申请日：2017-09-06

Applicant: ASML Netherlands B.V.

Inventor： JAK, Martin Jacobus Johan ,  EBERT, Martin ,  DEN BOEF, Arie Jeffrey ,  PANDEY, Nitesh

IPC: G03F7/20

Abstract: A method comprising: evaluating a plurality of polarization characteristics associated with measurement of a metrology target of a substrate processed using a patterning process, against one or more measurement quality parameters; and selecting one or more polarization characteristics from the plurality of polarization characteristics based on one or more of the measurement quality parameters.