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    CHARGED PARTICLE BEAM APPARATUS WITH MULTIPLE DETECTORS AND METHODS FOR IMAGING
    1.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS WITH MULTIPLE DETECTORS AND METHODS FOR IMAGING 审中-公开

    公开(公告)号：WO2021204740A1

    公开(公告)日：2021-10-14

    申请号：PCT/EP2021/058832

    申请日：2021-04-06

    Applicant: ASML NETHERLANDS B.V.

    Inventor： LIU, Xuedong ,  ZHOU, Weimin ,  CHEN, Xiaoxue ,  JI, Xiaoyu ,  LI, Heng ,  HOQUE, Shahedul ,  LI, Zongyao ,  LIU, Shuhao ,  REN, Weiming

    IPC: H01J37/244 ,  H01J37/145

    Abstract: Systems and methods of imaging a sample using a charged- particle beam apparatus are disclosed. The charged-particle beam apparatus may include a compound objective lens (307) comprising a magnetic lens (307M) and an electrostatic lens (307ES), the magnetic lens comprising a cavity, and an electron detector (312) located immediately upstream from a polepiece of the magnetic lens and inside the cavity of the magnetic lens. In some embodiments, deflectors may be located between the electron detector and the opening of the polepiece adjacent to the sample to achieve a large field of view. Electron distributions among the detectors can be manipulated without changing the landing energy by changing the potential of the control electrode(s) in the electrostatic objective lens. The electron source can be operated with several discrete potentials to cover different landing energies, while the potential difference between electron source and the extractor is fixed.

    MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS OF OPERATING THE SAME
    2.
    发明申请
    MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS OF OPERATING THE SAME 审中-公开

    公开(公告)号：WO2023078620A2

    公开(公告)日：2023-05-11

    申请号：PCT/EP2022/077559

    申请日：2022-10-04

    Applicant: ASML NETHERLANDS B.V.

    Inventor： JI, Xiaoyu ,  REN, Weiming

    IPC: H01J37/24 ,  H01J37/28

    Abstract: Systems and methods of inspecting a sample using a multi charged-particle beam apparatus with enhanced probe current of beamlets are disclosed. The apparatus may include a charged-particle source, a first condenser lens configured to focus the plurality of charged-particle beams to form a beam crossover at a crossover point and a second condenser lens configured to collimate the focused plurality of charged-particle beams, wherein the crossover point is formed between the first and the second condenser lens along the primary optical axis, and wherein an adjustment of a position of the crossover point causes an adjustment of a beam sizes of the plurality of charged-particle beams. The position of the crossover point may be adjusted by varying the excitation of one or more condenser lenses, or by electrically moving the principal plane positions of one or more condenser lenses.

    WAFER EDGE INSPECTION OF CHARGED PARTICLE INSPECTION SYSTEM
    3.
    发明申请
    WAFER EDGE INSPECTION OF CHARGED PARTICLE INSPECTION SYSTEM 审中-公开

    公开(公告)号：WO2023078628A1

    公开(公告)日：2023-05-11

    申请号：PCT/EP2022/077738

    申请日：2022-10-05

    Applicant: ASML NETHERLANDS B.V.

    Inventor： JI, Xiaoyu ,  GONG, Zizhou ,  REN, Weiming

    IPC: H01J37/32 ,  H01J37/02 ,  H01J37/20 ,  H01L21/687 ,  H01J37/26 ,  H01J37/30

    Abstract: An improved method of wafer inspection is disclosed. The improved method includes a non- transitory computer-readable medium storing a set of instructions that are executable by at least one processor of a device to cause the device to perform a method comprising: placing the wafer at a location on a stage; moving one or more movable segments of a conductive ring inward in a radial direction to enable the conductive ring to be within a predetermined distance from an edge of the wafer; and adjusting a voltage applied to the conductive ring or to a voltage applied to the wafer so that to enable the voltage applied to the conductive ring to be substantially equal to the voltage applied to the wafer to provide a substantially consistent electric field across an inner portion of the conductive ring and an outer portion of the wafer.

    SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION
    4.
    发明申请
    SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION 审中-公开

    公开(公告)号：WO2021073868A1

    公开(公告)日：2021-04-22

    申请号：PCT/EP2020/077276

    申请日：2020-09-30

    Applicant: ASML NETHERLANDS B.V.

    Inventor： REN, Weiming ,  LIU, Xuedong ,  CHEN, Zhong-wei ,  JI, Xiaoyu ,  CHEN, Xiaoxue ,  ZHOU, Weimin ,  ZHANG, Frank, Nan

    IPC: H01J37/02 ,  H01J37/26

    Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged- particle beam used to inspect the sample surface.

    CHARGED-PARTICLE BEAM APPARATUS WITH BEAM-TILT AND METHODS THEREOF
    5.
    发明申请
    CHARGED-PARTICLE BEAM APPARATUS WITH BEAM-TILT AND METHODS THEREOF 审中-公开

    公开(公告)号：WO2022122320A1

    公开(公告)日：2022-06-16

    申请号：PCT/EP2021/081924

    申请日：2021-11-17

    Applicant: ASML NETHERLANDS B.V. [NL]/[NL]

    Inventor： REN, Weiming ,  LIU, Xuedong ,  HOQUE, Shahedul ,  JI, Xiaoyu ,  DILLEN, Hermanus, Adrianus

    IPC: H01J37/147 ,  H01J37/28

    Abstract: A charged particle apparatus comprising a charged particle source (401) and a first deflector (421) configured to deflect the charged- particle beam to land on a surface of a sample at a beam-tilt angle, wherein the first deflector is located substantially at a principal plane of an objective lens (411). In further embodiments, the apparatus may comprise a first deflector located between the charged-particle source and an objective lens and configured to deflect the charged- particle beam away from the primary optical axis; a second deflector located substantially at a focal plane of the objective lens and configured to deflect the charged-particle beam back towards the primary optical axis; and a third deflector located substantially at a principal plane of the objective lens, wherein the third deflector is configured to shift a wobbling center of the objective lens to an off-axis wobbling location, and wherein the first and the second deflectors are configured to deflect the charged-particle beam to pass through the off-axis wobbling location to land on a surface of a sample at a first landing location and having a beam-tilt angle.

    AN APPARATUS USING ENHANCED DEFLECTORS TO MANIPULATE CHARGED PARTICLE BEAMS
    6.
    发明申请
    AN APPARATUS USING ENHANCED DEFLECTORS TO MANIPULATE CHARGED PARTICLE BEAMS 审中-公开

    公开(公告)号：WO2021185938A1

    公开(公告)日：2021-09-23

    申请号：PCT/EP2021/056889

    申请日：2021-03-18

    Applicant: ASML NETHERLANDS B.V.

    Inventor： WANG, Yongxin ,  DONG, Zhonghua ,  JI, Xiaoyu ,  HOQUE, Shahedul ,  REN, Weiming ,  LIU, Xuedong ,  YE, Guofan ,  CHIEN, Kuo-Chin

    IPC: H01J37/147 ,  H01J37/28

    Abstract: An apparatus includes a first charged particle beam manipulator positioned in a first layer configured to influence a charged particle beam and a second charged particle beam manipulator positioned in a second layer configured to influence the charged particle beam. The first and second charged particle beam manipulators may each include a plurality of electrodes having a first set of opposing electrodes and a second set of opposing electrodes. A first driver system electrically connected to the first set may be configured to provide a plurality of discrete output states to the first set. A second driver system electrically connected to the second set may be configured to provide a plurality of discrete output states to the second set. The first and second charged-particle beam manipulators may each comprise a plurality of segments; and a controller having circuitry configured to individually control operation of each of the plurality of segments.

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