公开(公告)号：WO2019233991A1

公开(公告)日：2019-12-12

申请号：PCT/EP2019/064445

申请日：2019-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Yongxin ,  DONG, Zhonghua ,  LAI, Rui-Ling ,  KANAI, Kenichi

IPC: H01J37/244

Abstract: A detector may be provided with an array of sensing elements. The detector may include a semiconductor substrate including the array, and a circuit configured to count a number of charged particles incident on the detector. The circuit of the detector may be configured to process outputs from the plurality of sensing elements and increment a counter in response to a charged particle arrival event on a sensing element of the array. Various counting modes may be used. Counting may be based on energy ranges. Numbers of charged particles may be counted at a certain energy range and an overflow flag may be set when overflow is encountered in a sensing element. The circuit may be configured to determine a time stamp of respective charged particle arrival events occurring at each sensing element. Size of the sensing element may be determined based on criteria for enabling charged particle counting.

公开(公告)号：WO2019053174A1

公开(公告)日：2019-03-21

申请号：PCT/EP2018/074834

申请日：2018-09-14

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Yongxin ,  DONG, Zhonghua ,  LAI, Rui-Ling

IPC: H01J37/244 ,  H01L27/146

Abstract: Systems and methods for implementing a detector array (600) are disclosed. According to certain embodiments, a substrate (600) comprises a plurality of sensing elements (611-613) including a first element (611) and a second element (612). The detector comprises a switching element (619) configured to connect the first element and the second element. The switching region may be controlled based on signals generated in response to the sensing elements receiving electrons with a predetermined amount of energy.

公开(公告)号：WO2021180743A1

公开(公告)日：2021-09-16

申请号：PCT/EP2021/055954

申请日：2021-03-09

Applicant: ASML NETHERLANDS B.V.

Inventor： MA, Long ,  DONG, Zhonghua ,  CHEN, Te-Yu

IPC: H01J37/26 ,  H01J37/28

Abstract: Apparatuses, systems, and methods for generating a beam for inspecting a wafer positioned on a stage in a charged particle beam system are disclosed. In some embodiments, a controller may include circuitry configured to classify a plurality of regions along a stripe of the wafer by type of region, the stripe being larger than a field of view of the beam, wherein the classification of the plurality of regions includes a first type of region and a second type of region; and scan the wafer by controlling a speed of the stage based on the type of region, wherein the first type of region is scanned at a first speed and the second type of region is scanned at a second speed.

公开(公告)号：WO2020136094A2

公开(公告)日：2020-07-02

申请号：PCT/EP2019/086459

申请日：2019-12-19

Applicant: ASML NETHERLANDS B.V.

Inventor： LUO, Ying ,  DONG, Zhonghua ,  YIN, Xuehui ,  DI, Long ,  DENG, Nianpei ,  FANG, Wei ,  PU, Lingling ,  FEI, Ruochong ,  ZHU, Bohang ,  LIU, Yu

IPC: H01J37/147 ,  H01J37/20 ,  H01J37/21 ,  H01J37/28

Abstract: Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a stage configured to hold a sample and is movable in at least one of X-Y-Z axes. The charged-particle beam system may further comprise a position sensing system to determine a lateral and vertical displacement of the stage, and a beam deflection controller configured to apply a first signal to deflect a primary charged-particle beam incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 k Hz to 50 k Hz, and 50 k Hz to 200 k Hz, respectively.

公开(公告)号：WO2019201544A1

公开(公告)日：2019-10-24

申请号：PCT/EP2019/057126

申请日：2019-03-21

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Yongxin ,  DONG, Zhonghua

IPC: H01J37/244 ,  H01L27/146

Abstract: Detectors and detection systems are disclosed. According to certain embodiments, a detector comprises a substrate comprising a plurality of sensing elements including a first sensing element (402) and a second sensing element (403), wherein at least the first sensing element is formed in a triangular shape. The detector may include a switching region (4009A) configured to connect the first sensing element and the second sensing element. There may also be provided a plurality of sections including a first section connecting a first plurality of sensing elements to a first output and a second section connecting a second plurality of sensing elements to a second output. The section may be provided in a hexagonal shape.

公开(公告)号：WO2019192821A1

公开(公告)日：2019-10-10

申请号：PCT/EP2019/056504

申请日：2019-03-14

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Yongxin ,  DONG, Zhonghua ,  LAI, Rui-Ling

IPC: H01J37/244 ,  H01L27/146

Abstract: Detectors and detection systems are disclosed. A substrate comprises a plurality of sensing elements (311-313) including a first plurality of the sensing elements and a second plurality of the sensing elements, and a plurality of sections (321-324) configured to connect the first plurality to an output, and connect the second plurality to an output. Switching regions may be provided between the sensing elements that are configured to connect two or more sensing elements. The switching region may be controlled based on signals generated in response to the sensing elements receiving electrons with a predetermined amount of energy and/or beam intensity.

公开(公告)号：WO2021028366A1

公开(公告)日：2021-02-18

申请号：PCT/EP2020/072332

申请日：2020-08-08

Applicant: ASML NETHERLANDS B.V.

Inventor： FANG, Wei ,  PU, Lingling ,  WANG, Bo ,  DONG, Zhonghua ,  WANG, Yongxin

IPC: H01J37/22

Abstract: An improved apparatus and method for enhancing an image, and more particularly an apparatus and method for enhancing an image through cross-talk cancellation in a multiple charged- particle beam inspection are disclosed. An improved method for enhancing an image includes acquiring a first image signal of a plurality of image signals from a detector of a multi-beam inspection system. The first image signal corresponds to a detected signal from a first region of the detector on which electrons of a first secondary electron beam and of a second secondary electron beam are incident. The method includes reducing, from the first image signal, cross-talk contamination originating from the second secondary electron beam using a relationship between the first image signal and beam intensities associated with the first secondary electron beam and the second secondary electron beam. The method further includes generating a first image corresponding to first secondary electron beam after reduction.

公开(公告)号：WO2020058142A1

公开(公告)日：2020-03-26

申请号：PCT/EP2019/074585

申请日：2019-09-13

Applicant: ASML NETHERLANDS B.V.

Inventor： MA, Long ,  JEN, Chih-Yu ,  DONG, Zhonghua ,  ZHANG, Peilei ,  FANG, Wei ,  LI, Chuan

IPC: H01J37/28

Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam apparatus for inspecting a wafer including an improved scanning mechanism for detecting fast- charging defects is disclosed. An improved charged particle beam inspection apparatus may include a charged particle beam source that delivers charged particles to an area of the wafer and scans the area. The improved charged particle beam apparatus may further include a controller including a circuitry to produce multiple images of the area over a time sequence, which are compared to detect fast- charging defects.

公开(公告)号：WO2019053173A1

公开(公告)日：2019-03-21

申请号：PCT/EP2018/074833

申请日：2018-09-14

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Yongxin ,  LAI, Rui-Ling ,  DONG, Zhonghua

IPC: H01J37/244 ,  H01L27/146

Abstract: Systems and methods for implementing a detector array are disclosed. According to certain embodiments, a substrate comprises a plurality of sensing elements (501-503) including a first element (502) and a second element (503), and a switching region (3009) therebetween configured to connect the first element and the second element. The switching region may be controlled based on signals generated in response to the sensing elements receiving electrons with a predetermined amount of energy.

公开(公告)号：WO2021185938A1

公开(公告)日：2021-09-23

申请号：PCT/EP2021/056889

申请日：2021-03-18

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Yongxin ,  DONG, Zhonghua ,  JI, Xiaoyu ,  HOQUE, Shahedul ,  REN, Weiming ,  LIU, Xuedong ,  YE, Guofan ,  CHIEN, Kuo-Chin

IPC: H01J37/147 ,  H01J37/28

Abstract: An apparatus includes a first charged particle beam manipulator positioned in a first layer configured to influence a charged particle beam and a second charged particle beam manipulator positioned in a second layer configured to influence the charged particle beam. The first and second charged particle beam manipulators may each include a plurality of electrodes having a first set of opposing electrodes and a second set of opposing electrodes. A first driver system electrically connected to the first set may be configured to provide a plurality of discrete output states to the first set. A second driver system electrically connected to the second set may be configured to provide a plurality of discrete output states to the second set. The first and second charged-particle beam manipulators may each comprise a plurality of segments; and a controller having circuitry configured to individually control operation of each of the plurality of segments.