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公开(公告)号：US11764027B2
公开(公告)日：2023-09-19
申请号：US16698677
申请日：2019-11-27
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Gerard Gosen , Sven Antoin Johan Hol , Martijn Petrus Christianus Van Heumen , Dennis Herman Caspar Van Banning , Naseh Hosseini
IPC: H01J37/141
CPC classification number: H01J37/141 , H01J2237/002
Abstract: Systems and methods for cooling an objective lens of a charged-particle beam system are disclosed. According to certain embodiments, the method for cooling an objective lens of a charged-particle beam system comprises receiving a fluid via a fluid input port of a bobbin, circulating the fluid that absorbs heat generated by a plurality of electromagnetic coils of the objective lens, via a plurality of channels distributed in the bobbin, and dispensing the fluid circulated by the plurality of channels via a fluid output port of the bobbin. The bobbin may further comprise a bottom flange proximal to a wafer and a top flange distal from the wafer. The bobbin having the plurality of channels may comprise an additively manufactured monolithic structure.
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2.发明授权公开(公告)号：US11804358B2
公开(公告)日：2023-10-31
申请号：US17493837
申请日：2021-10-04
Applicant: ASML Netherlands B.V.
CPC classification number: H01J37/20 , H01L21/67288 , H01J2237/2001 , H01J2237/2814
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.
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3.发明授权公开(公告)号：US11139141B2
公开(公告)日：2021-10-05
申请号：US16675192
申请日：2019-11-05
Applicant: ASML Netherlands B.V.
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.
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公开(公告)号：US11385556B2
公开(公告)日：2022-07-12
申请号：US17054194
申请日：2019-05-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Dennis Herman Caspar Van Banning , Jeroen Gerard Gosen
IPC: G03F7/20 , H01J37/20 , H01J37/317
Abstract: An apparatus having: a vacuum chamber for enclosing an article support, the article support configured to support an article such that a volume is defined between the article support and the article, the article support including a plurality of supporting protrusions configured to provide a plane of support for the article; a conduit for providing a fluid to the volume such that the fluid provides heat transfer between the article and the article support; and a controller for controlling the fluid supply to the volume, wherein the controller is configured to control a fluid supply unit to start removing the fluid substantially at a time the article reaches a stable temperature.
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公开(公告)号：US12287570B2
公开(公告)日：2025-04-29
申请号：US17524816
申请日：2021-11-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Stef Marten Johan Janssens , Koen Cuypers , Rogier Hendrikus Magdalena Cortie , Sudhir Srivastava , Theodorus Johannes Antonius Renckens , Jeroen Gerard Gosen , Erik Henricus Egidius Catharina Eummelen , Hendrikus Johannes Schellens , Adrianus Marinus Wouter Heeren , Bo Lenssen
Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.
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Patent Agency Ranking
6.发明授权公开(公告)号：US12217930B2
公开(公告)日：2025-02-04
申请号：US18467642
申请日：2023-09-14
Applicant: ASML Netherlands B.V.
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.
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公开(公告)号：US11199771B2
公开(公告)日：2021-12-14
申请号：US16339402
申请日：2017-09-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Stef Marten Johan Janssens , Koen Cuypers , Rogier Hendrikus Magdalena Cortie , Sudhir Srivastava , Theodorus Johannes Antonius Renckens , Jeroen Gerard Gosen , Erik Henricus Egidius Catharina Eummelen , Hendrikus Johannes Schellens , Adrianus Marinus Wouter Heeren , Bo Lenssen
Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.
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公开(公告)号：US11942340B2
公开(公告)日：2024-03-26
申请号：US17811047
申请日：2022-07-06
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Gerard Gosen , Te-Yu Chen , Dennis Herman Caspar Van Banning , Edwin Cornelis Kadijk , Martijn Petrus Christianus Van Heumen , Erheng Wang , Johannes Andreas Henricus Maria Jacobs
CPC classification number: H01L21/67201 , G03F7/70841 , G03F7/70858 , H01L21/67098
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.
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公开(公告)号：US11430678B2
公开(公告)日：2022-08-30
申请号：US16514843
申请日：2019-07-17
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Gerard Gosen , Te-Yu Chen , Dennis Herman Caspar Van Banning , Edwin Cornelis Kadijk , Martijn Petrus Christianus Van Heumen , Erheng Wang , Johannes Andreas Henricus Maria Jacobs
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.
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公开(公告)号：US11158484B2
公开(公告)日：2021-10-26
申请号：US16805633
申请日：2020-02-28
Applicant: ASML Netherlands B.V.
Inventor： Dennis Herman Caspar Van Banning , Jeroen Gerard Gosen , Maarten Lambertus Henricus Ter Heerdt , Edwin Cornelis Kadijk
IPC: H01J37/20
Abstract: An e-beam inspection tool is disclosed, the tool comprising, an electron optics system configured to generate an electron beam, an object table configured to hold a specimen, a positioning device configured to position the object table, the positioning device comprising an actuator, wherein the positioning device further comprises a heating device configured to generate a heat load and a heat load controller to control the generated heat load at least partly based on an actuator heat load generated in the actuator.
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