公开(公告)号：WO2012019874A1

公开(公告)日：2012-02-16

申请号：PCT/EP2011/062255

申请日：2011-07-18

Applicant: ASML Netherlands B.V. ,  KOEVOETS, Adrianus ,  RENKENS, Michael ,  WUISTER, Sander

Inventor： KOEVOETS, Adrianus ,  RENKENS, Michael ,  WUISTER, Sander

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/70875 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/70783

Abstract: In an embodiment, a lithography method is disclosed that includes providing a providing a first heat load to a first area of an object, and providing a second heat load to a second area of the object, wherein the second heat load is configured to ensure a deformation of the first area of the object caused by providing both the first heat load and the second heat load is smaller than a deformation of the first area of the object caused by providing only the first heat load.

Abstract translation: 在一个实施例中，公开了一种光刻方法，其包括提供向物体的第一区域提供第一热负荷并且向物体的第二区域提供第二热负荷，其中第二热负荷被配置为确保 通过提供第一热负荷和第二热负荷而引起的物体的第一区域的变形小于由仅提供第一热负荷引起的物体的第一区域的变形。

公开(公告)号：WO2013113634A3

公开(公告)日：2013-08-08

申请号：PCT/EP2013/051480

申请日：2013-01-25

Applicant: ASML NETHERLANDS B.V.

Inventor： KOEVOETS, Adrianus ,  DONDERS, Sjoerd ,  VAN SCHOOT, Jan ,  ZAAL, Koen ,  CADEE, Theodorus, Petrus, Maria

IPC: G03F7/20

Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.

公开(公告)号：WO2014095266A2

公开(公告)日：2014-06-26

申请号：PCT/EP2013/074742

申请日：2013-11-26

Applicant: ASML NETHERLANDS B.V.

Inventor： ARLEMARK, Erik ,  KOEVOETS, Adrianus ,  LAFARRE, Raymond ,  TEN KATE, Nicolaas ,  LUIJTEN, Carlo ,  NIENHUYS, Han-Kwang

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70908

Abstract: Disclosed is a substrate support for an apparatus of the type which projects a beam of EUV radiation onto a target portion of a substrate. The substrate support comprises a substrate table constructed to hold a substrate, a support block for supporting the substrate table, and a cover plate disposed around the substrate table. The top surface of the cover plate and the top surface of a substrate mounted on the substrate table are all substantially at the same level. At least one sensor unit is located on the substrate support and its top surface is also at the same level as that of the cover plate and substrate. Also disclosed is an EUV lithographic apparatus comprising such a substrate support.

Abstract translation: 公开了一种用于将EUV辐射束投射到基板的目标部分上的装置的基板支撑件。 衬底支撑件包括构造成保持衬底的衬底台，用于支撑衬底台的支撑块和设置在衬底台周围的盖板。 盖板的顶表面和安装在基板上的基板的顶表面基本上处于相同的水平。 至少一个传感器单元位于基板支撑件上，其顶表面也处于与盖板和基板相同的高度。 还公开了包括这种基板支撑件的EUV光刻设备。

公开(公告)号：WO2010020481A1

公开(公告)日：2010-02-25

申请号：PCT/EP2009/058923

申请日：2009-07-13

Applicant: ASML NETHERLANDS B.V. ,  BUTLER, Hans ,  DE JONGH, Robertus ,  VAN DER WIJST, Marc ,  TOUSAIN, Rob ,  OUDE NIJHUIS, Marco ,  KOEVOETS, Adrianus

Inventor： BUTLER, Hans ,  DE JONGH, Robertus ,  VAN DER WIJST, Marc ,  TOUSAIN, Rob ,  OUDE NIJHUIS, Marco ,  KOEVOETS, Adrianus

IPC: G03F7/20

CPC classification number: G03F7/70833 ,  G03F7/70258 ,  G03F7/70483

Abstract: A projection system (PS) is provided that includes a sensor system (20) that measures at least one parameter that relates to the physical deformation of a frame (10) that supports the optical elements (11) within the projection system (PS), and a control system (30) that, based on the measurements from the sensor system (20.), determines an expected deviation of.the position of the beam of radiation projected by the projection system (PS) that is caused by the physical deformation of the frame (10).

Abstract translation: 提供了一种投影系统（PS），其包括测量与投影系统（PS）内的支撑光学元件（11）的框架（10）的物理变形有关的至少一个参数的传感器系统（20） 以及基于来自传感器系统（20）的测量值的控制系统（30），确定由物理变形引起的由投影系统（PS）投射的辐射束的位置的预期偏差 （10）。