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    LITHOGRAPHIC APPARATUS COMPONENT AND LITHOGRAPHIC APPARATUS
    1.
    发明申请
    LITHOGRAPHIC APPARATUS COMPONENT AND LITHOGRAPHIC APPARATUS 审中-公开

    公开(公告)号：WO2013113634A3

    公开(公告)日：2013-08-08

    申请号：PCT/EP2013/051480

    申请日：2013-01-25

    Applicant: ASML NETHERLANDS B.V.

    Inventor： KOEVOETS, Adrianus ,  DONDERS, Sjoerd ,  VAN SCHOOT, Jan ,  ZAAL, Koen ,  CADEE, Theodorus, Petrus, Maria

    IPC: G03F7/20

    Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.

    A METHOD OF LOADING A FLEXIBLE SUBSTRATE, A DEVICE MANUFACTURING METHOD, AN APPARATUS FOR LOADING A FLEXIBLE SUBSTRATE, AND A LITHOGRAPHY APPARATUS
    2.
    发明申请
    A METHOD OF LOADING A FLEXIBLE SUBSTRATE, A DEVICE MANUFACTURING METHOD, AN APPARATUS FOR LOADING A FLEXIBLE SUBSTRATE, AND A LITHOGRAPHY APPARATUS 审中-公开
    装载柔性基板的方法，装置制造方法，用于装载柔性基板的装置和平面图装置

    公开(公告)号：WO2013107684A2

    公开(公告)日：2013-07-25

    申请号：PCT/EP2013/050402

    申请日：2013-01-10

    Applicant: ASML NETHERLANDS B.V.

    Inventor： LOOPSTRA, Erik ,  DONDERS, Sjoerd ,  ZAAL, Koen ,  CADEE, Theodorus Petrus Maria

    IPC: G03F7/20

    CPC classification number: G03F7/70791 ,  G03F7/707 ,  H01L21/67778

    Abstract: A method of loading a flexible substrate, a device manufacturing method, an apparatus for loading a flexible substrate, and a lithography apparatus. According to an embodiment, there is provided a method of loading a flexible substrate onto a support for use in an exposure apparatus, including transferring the substrate progressively from a substrate carrier to the support in a way that a boundary line separating a region of the substrate that is loaded onto the support and a region of the substrate that is not yet loaded onto the support remains substantially straight during the loading process.

    Abstract translation: 装载柔性基板的方法，装置制造方法，装载柔性基板的装置和光刻装置。 根据实施例，提供了一种将柔性基板装载到用于曝光设备的支撑件上的方法，包括将基板从基板载体逐渐地以基板载体分离到基板的边界线的方式 其被加载到支撑件上，并且未装载到支撑件上的基板的区域在加载过程中保持基本上直线。

    SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
    7.
    发明公开
    SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER 审中-公开
    VERFAHREN ZUR HERSTELLUNG EINES SUBSTRATHALTERS的SUBSTRATHALTER

    公开(公告)号：EP2810127A1

    公开(公告)日：2014-12-10

    申请号：EP13700401.6

    申请日：2013-01-17

    Applicant: ASML Netherlands B.V.

    Inventor： LAFARRE, Raymond ,  DONDERS, Sjoerd ,  TEN KATE, Nicolaas ,  DZIOMKINA, Nina ,  KARADE, Yogesh ,  RODENBURG, Elisabeth

    IPC: G03F7/20

    Abstract: A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body (400) and a plurality of burls provided on the main body and having end surfaces to support a substrate. The burls each comprise a lower portion (406a) protruding from the main body and an upper portion (406b) above the lower portion. The lower portions are a different material than the upper portions, the upper portions comprise diamond-like carbon, and the upper portions are separated from each other.

    Abstract translation: 用于光刻设备的物体保持器具有具有表面的主体。 在薄膜叠层的表面或孔中形成有用于支撑物体的多个毛刺。 通过激光烧结形成至少一个毛刺。 通过激光烧结形成的毛刺中的至少一个可以是先前通过激光烧结形成的损坏的隆起的另一种方法的修复。

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