公开(公告)号：WO2013098053A1

公开(公告)日：2013-07-04

申请号：PCT/EP2012/074507

申请日：2012-12-05

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  BLEEKER, Arno ,  HENNUS, Pieter ,  HOEKS, Martinus ,  HOL, Sven, Antoin, Johan ,  VAN DER SCHOOT, Harmen ,  SLAGHEKKE, Bernardus ,  TINNEMANS, Patricius ,  VAN DER WIJST, Marc ,  ZAAL, Koen ,  CADEE, Theodorus, Petrus, Maria ,  BEERENS, Ruud ,  FISCHER, Olof ,  AANGENENT, Wouter ,  BOSCH, Niels, Johannes, Maria

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70275 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70558 ,  G03F7/70816 ,  G03F7/709

Abstract: An exposure apparatus (1) including a projection system (12, 14) configured to project a plurality of radiation beams onto a target; a movable frame (8) that is at least rotatable around an axis (10); and an actuator system (11) configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Abstract translation: 一种曝光装置（1），包括被配置为将多个辐射束投影到目标上的投影系统（12,14） 至少可绕轴线（10）旋转的可移动框架（8）; 以及致动器系统（11），其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。

公开(公告)号：WO2013113634A3

公开(公告)日：2013-08-08

申请号：PCT/EP2013/051480

申请日：2013-01-25

Applicant: ASML NETHERLANDS B.V.

Inventor： KOEVOETS, Adrianus ,  DONDERS, Sjoerd ,  VAN SCHOOT, Jan ,  ZAAL, Koen ,  CADEE, Theodorus, Petrus, Maria

IPC: G03F7/20

Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.

公开(公告)号：WO2013107684A2

公开(公告)日：2013-07-25

申请号：PCT/EP2013/050402

申请日：2013-01-10

Applicant: ASML NETHERLANDS B.V.

Inventor： LOOPSTRA, Erik ,  DONDERS, Sjoerd ,  ZAAL, Koen ,  CADEE, Theodorus Petrus Maria

IPC: G03F7/20

CPC classification number: G03F7/70791 ,  G03F7/707 ,  H01L21/67778

Abstract: A method of loading a flexible substrate, a device manufacturing method, an apparatus for loading a flexible substrate, and a lithography apparatus. According to an embodiment, there is provided a method of loading a flexible substrate onto a support for use in an exposure apparatus, including transferring the substrate progressively from a substrate carrier to the support in a way that a boundary line separating a region of the substrate that is loaded onto the support and a region of the substrate that is not yet loaded onto the support remains substantially straight during the loading process.

Abstract translation: 装载柔性基板的方法，装置制造方法，装载柔性基板的装置和光刻装置。 根据实施例，提供了一种将柔性基板装载到用于曝光设备的支撑件上的方法，包括将基板从基板载体逐渐地以基板载体分离到基板的边界线的方式 其被加载到支撑件上，并且未装载到支撑件上的基板的区域在加载过程中保持基本上直线。

公开(公告)号：WO2014114405A2

公开(公告)日：2014-07-31

申请号：PCT/EP2013/076310

申请日：2013-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE KERKHOF, Marcus ,  VAN OOSTEN, Anton ,  BUTLER, Hans ,  LOOPSTRA, Erik ,  VAN DER WIJST, Marc ,  ZAAL, Koen

IPC: G03F7/20

CPC classification number: G03F7/702 ,  G02B7/182 ,  G02B7/1827 ,  G02B26/0825 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/70266 ,  G03F7/70575 ,  G03F7/709

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

Abstract translation: 公开了一种被配置为将光束投影到光刻设备内的基板的目标部分上的系统。 该系统包括具有用于定位反射镜的致动器和/或配置反射镜的形状的致动器的反射镜，致动器还向反射镜提供主动阻尼，以及用于产生用于控制所述致动器的致动器控制信号的控制器。 当定位所述反射镜和/或构造所述反射镜的形状时，第一坐标系用于控制所述致动器，并且当向所述反射镜提供主动阻尼时，使用第二坐标系统来控制所述致动器。

公开(公告)号：WO2013152877A1

公开(公告)日：2013-10-17

申请号：PCT/EP2013/051800

申请日：2013-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： BLEEKER, Arno ,  CASTENMILLER, Thomas ,  DE JAGER, Pieter ,  MULDER, Heine ,  ZAAL, Koen ,  CADEE, Theodorus Petrus Maria ,  PHILIPS, Danny ,  BEERENS, Ruud ,  TIMMERMANS, Roger

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/20 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70366 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70425 ,  G03F7/70475

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.

Abstract translation: 被配置为将辐射束投影到目标上的投影系统包括可旋转的框架（8），其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在 只有切向或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。 作出规定以防止由可旋转框架保持的镜片施加力矩。