公开(公告)号：WO2018114299A1

公开(公告)日：2018-06-28

申请号：PCT/EP2017/081334

申请日：2017-12-04

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： KUAN, Chiyan

IPC: G01N23/225

Abstract: Disclosed herein is a method comprising : starting pre-charging a region of a sample with a first beam of charged particles; at a time later than starting pre-charging the region, starting imaging the region with a second beam of charged particles; wherein the region is electrically ungrounded. From the image of the region, defects may be identified.

公开(公告)号：WO2021083773A1

公开(公告)日：2021-05-06

申请号：PCT/EP2020/079674

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： CHEN, Tianming ,  KUAN, Chiyan ,  WANG, Yixiang ,  WANG, Zhi Po

IPC: H01J37/20 ,  H01J37/02

Abstract: A system for grounding a mask (50) using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong (52) configured to contact a conductive layer (56) of the mask. Some embodiments of the system include a plurality of conductive prongs configured to contact multiple positions of a conductive layer of the mask. Some other embodiments of the system include an extension comprising various shapes.

公开(公告)号：EP4052277A1

公开(公告)日：2022-09-07

申请号：EP20797426.2

申请日：2020-10-21

Applicant: ASML Netherlands B.V.

Inventor： CHEN, Tianming ,  KUAN, Chiyan ,  WANG, Yixiang ,  WANG, Zhi Po

IPC: H01J37/20 ,  H01J37/02