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    DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS
    1.
    发明申请
    DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS 审中-公开

    公开(公告)号：WO2022144156A1

    公开(公告)日：2022-07-07

    申请号：PCT/EP2021/085051

    申请日：2021-12-09

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BOSCH, Niels, Johannes, Maria ,  WANG, Xu ,  HEMPENIUS, Peter, Paul ,  WANG, Yongqiang ,  BUTLER, Hans ,  WANG, Youjin ,  GRASMAN, Jasper, Hendrik ,  SUI, Jianzi ,  CHEN, Tianming ,  WU, Aimin

    IPC: H01J37/21 ,  H01J37/28

    Abstract: There is provided a charged particle apparatus comprising: a particle beam generator, optics, a first and a second positioning device, both configured for positioning the substrate relative to the particle beam generator along its optical axis, and a controller configured for switching between a first operational mode and a second operational mode. The apparatus is configured, when operating in the first operational mode, for irradiating the substrate by the particle beam at a first landing energy of the particle beam and, when operating in the second operational mode, for irradiating the substrate at a second, different landing energy. When operating in the first operational mode, the second positioning device is configured to position the substrate relative to the particle beam generator at a first focus position of the particle beam and in the second operational mode, to position the substrate at a second, different focus position.

    SYSTEM FOR INSPECTING AND GROUNDING A MASK IN A CHARGED PARTICLE SYSTEM
    2.
    发明申请
    SYSTEM FOR INSPECTING AND GROUNDING A MASK IN A CHARGED PARTICLE SYSTEM 审中-公开

    公开(公告)号：WO2021083773A1

    公开(公告)日：2021-05-06

    申请号：PCT/EP2020/079674

    申请日：2020-10-21

    Applicant: ASML NETHERLANDS B.V.

    Inventor： CHEN, Tianming ,  KUAN, Chiyan ,  WANG, Yixiang ,  WANG, Zhi Po

    IPC: H01J37/20 ,  H01J37/02

    Abstract: A system for grounding a mask (50) using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong (52) configured to contact a conductive layer (56) of the mask. Some embodiments of the system include a plurality of conductive prongs configured to contact multiple positions of a conductive layer of the mask. Some other embodiments of the system include an extension comprising various shapes.

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