公开(公告)号：WO2013135494A2

公开(公告)日：2013-09-19

申请号：PCT/EP2013/054095

申请日：2013-02-28

Applicant: ASML NETHERLANDS B.V.

Inventor： BAL, Kursat ,  LUTTIKHUIS, Bernardus ,  OCKWELL, David ,  VAN PUTTEN, Arnold ,  NIENHUYS, Han-Kwang ,  LEENDERS, Maikel

IPC: G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/20 ,  G03F7/70066 ,  G03F7/70866 ,  G03F7/70933

Abstract: A lithographic apparatus injects gas between a reticle and reticle blades to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.

Abstract translation: 光刻设备在标线片和标线片之间注入气体以保护掩模版免受污染。 气体可以注入到分划板和最接近的一对标线片之间的空间中，或者注入在两对标线片之间限定的空间中。