公开(公告)号：WO2014020003A1

公开(公告)日：2014-02-06

申请号：PCT/EP2013/065947

申请日：2013-07-30

Applicant: ASML NETHERLANDS B.V.

Inventor： BANINE, Vadim ,  MINNAERT, Arthur ,  MUITJENS, Marcel ,  YAKUNIN, Andrei ,  SCACCABAROZZI, Luigi ,  MALLMANN, Hans ,  BAL, Kursat ,  LUIJTEN, Carlo ,  NIENHUYS, Han-Kwang ,  HUIJBERTS, Alexander ,  GASSELING, Paulus ,  RIZO DIAGO, Pedro ,  VAN KAMPEN, Maarten ,  VAN AERLE, Nick

IPC: G03F7/20 ,  C01B31/04 ,  G21K1/06

CPC classification number: G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/10

Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which is provided in the projection system (PSW) and adjacent the substrate table (WT). The spectral purity filter is preferably a membrane (14) formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.

Abstract translation: 公开了一种设置有光谱纯度滤光片的光刻设备，其设置在投影系统（PSW）中并且邻近衬底台（WT）。 光谱纯度滤光片优选为由多晶硅，多层材料，碳纳米管材料或石墨烯形成的膜（14）。 膜可以设置有保护性盖层和/或薄金属透明层。

公开(公告)号：WO2021148224A1

公开(公告)日：2021-07-29

申请号：PCT/EP2020/087889

申请日：2020-12-24

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： ALBRIGHT, Ronald, Peter ,  BAL, Kursat ,  BANINE, Vadim, Yevgenyevich ,  BRULS, Richard, Joseph ,  DE VRIES, Sjoerd, Frans ,  FRIJNS, Olav, Waldemar, Vladimir ,  HUANG, Yang-Shan ,  HUANG, Zhuangxiong ,  JACOBS, Johannes, Henricus, Wilhelmus ,  MOORS, Johannes, Hubertus, Josephina ,  NENCHEV, Georgi, Nenchev ,  NIKIPELOV, Andrey ,  RAASVELD, Thomas, Maarten ,  RANJAN, Manish ,  TE SLIGTE, Edwin ,  UMSTADTER, Karl, Robert ,  UZGÖREN, Eray ,  VAN DE KERKHOF, Marcus, Adrianus ,  YAGHOOBI, Parham

IPC: G03F7/20 ,  H05G2/00 ,  G03F7/70033 ,  G03F7/70058 ,  G03F7/70916 ,  H05G2/008

Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

公开(公告)号：WO2019020449A1

公开(公告)日：2019-01-31

申请号：PCT/EP2018/069474

申请日：2018-07-18

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： CHIEDA, Michael, Andrew ,  BRINKERT, Jacob ,  HUANG, Yang-Shan ,  BAL, Kursat

IPC: G03F7/20

Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage (400) comprising first and second chambers (403; 405). The object stage further comprises a first structure (402) having a first surface (415) and a second structure (404). The second structure is configured to support an object (412) in the second chamber (405), movable relative to the first structure, and comprises a second surface (417) opposing the first surface (415) of the first structure (402) thereby defining a gap (414) between the first structure and the second structure that extends between the first chamber (403) and the second chamber (405). The object stage further comprises a gas outlet for injecting a gas provided (a) in the gap or (b) in the first chamber adjacent an entrance of the gap at the first chamber.

公开(公告)号：WO2013135494A2

公开(公告)日：2013-09-19

申请号：PCT/EP2013/054095

申请日：2013-02-28

Applicant: ASML NETHERLANDS B.V.

Inventor： BAL, Kursat ,  LUTTIKHUIS, Bernardus ,  OCKWELL, David ,  VAN PUTTEN, Arnold ,  NIENHUYS, Han-Kwang ,  LEENDERS, Maikel

IPC: G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/20 ,  G03F7/70066 ,  G03F7/70866 ,  G03F7/70933

Abstract: A lithographic apparatus injects gas between a reticle and reticle blades to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.

Abstract translation: 光刻设备在标线片和标线片之间注入气体以保护掩模版免受污染。 气体可以注入到分划板和最接近的一对标线片之间的空间中，或者注入在两对标线片之间限定的空间中。

公开(公告)号：EP4094125A1

公开(公告)日：2022-11-30

申请号：EP20838574.0

申请日：2020-12-24

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： ALBRIGHT, Ronald, Peter ,  BAL, Kursat ,  BANINE, Vadim, Yevgenyevich ,  BRULS, Richard, Joseph ,  DE VRIES, Sjoerd, Frans ,  FRIJNS, Olav, Waldemar, Vladimir ,  HUANG, Yang-Shan ,  HUANG, Zhuangxiong ,  JACOBS, Johannes, Henricus, Wilhelmus ,  MOORS, Johannes, Hubertus, Josephina ,  NENCHEV, Georgi, Nenchev ,  NIKIPELOV, Andrey ,  RAASVELD, Thomas, Maarten ,  RANJAN, Manish ,  TE SLIGTE, Edwin ,  UMSTADTER, Karl, Robert ,  UZGÖREN, Eray ,  VAN DE KERKHOF, Marcus, Adrianus ,  YAGHOOBI, Parham

IPC: G03F7/20 ,  H05G2/00