公开(公告)号：WO2013037607A1

公开(公告)日：2013-03-21

申请号：PCT/EP2012/066223

申请日：2012-08-21

Applicant: ASML NETHERLANDS B.V. ,  SCACCABAROZZI, Luigi ,  BANINE, Vadim ,  LUTTIKHUIS, Bernardus ,  KOOLE, Roelof ,  WONDERGEM, Hendrikus ,  GRAAT, Petrus

Inventor： SCACCABAROZZI, Luigi ,  BANINE, Vadim ,  LUTTIKHUIS, Bernardus ,  KOOLE, Roelof ,  WONDERGEM, Hendrikus ,  GRAAT, Petrus

IPC: G01B11/30 ,  G03F1/84 ,  G03F7/20

CPC classification number: G03F7/70783 ,  G01B11/16 ,  G03F1/84 ,  G03F7/70141 ,  G03F7/7085 ,  G03F7/70916

Abstract: A lithographic patterning device deformation monitoring apparatus (38) comprising a radiation source (40), an imaging device (42), and a processor (50). The radiation source being configured to direct a plurality of beams of radiation (41) with a predetermined diameter towards a lithographic patterning device (MA) such that they are reflected by the patterning device. The imaging detector configured to detect spatial positions of the radiation beams (41') after they have been reflected by the patterning device. The processor configured to monitor the spatial positions of the radiation beams and thereby determine the presence of a patterning device deformation. The imaging detector has an collection angle which is smaller than a minimum angle of diffraction of the radiation beams.

Abstract translation: 一种包括辐射源（40），成像装置（42）和处理器（50）的平版印刷图案形成装置变形监测装置（38）。 辐射源被配置为将多个具有预定直径的辐射光束引向平版印刷图案形成装置（MA），使得它们被图案形成装置反射。 该成像检测器被配置为在被图案形成装置反射之后检测辐射束（41'）的空间位置。 处理器被配置为监视辐射束的空间位置，从而确定图案形成装置变形的存在。 成像检测器的收集角度小于辐射束的最小衍射角。

公开(公告)号：WO2013135494A2

公开(公告)日：2013-09-19

申请号：PCT/EP2013/054095

申请日：2013-02-28

Applicant: ASML NETHERLANDS B.V.

Inventor： BAL, Kursat ,  LUTTIKHUIS, Bernardus ,  OCKWELL, David ,  VAN PUTTEN, Arnold ,  NIENHUYS, Han-Kwang ,  LEENDERS, Maikel

IPC: G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/20 ,  G03F7/70066 ,  G03F7/70866 ,  G03F7/70933

Abstract: A lithographic apparatus injects gas between a reticle and reticle blades to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.

Abstract translation: 光刻设备在标线片和标线片之间注入气体以保护掩模版免受污染。 气体可以注入到分划板和最接近的一对标线片之间的空间中，或者注入在两对标线片之间限定的空间中。