公开(公告)号：WO2021175678A1

公开(公告)日：2021-09-10

申请号：PCT/EP2021/054583

申请日：2021-02-24

Applicant: ASML NETHERLANDS B.V.

Inventor： DE LANGEN, Johannes, Cornelis, Jacobus ,  MUDRETSOV, Dmitry ,  CAI, Dongbin

IPC: H01J37/04

Abstract: An improved electron beam manipulator for manipulating an electron beam in an electron projection system and a method for manufacturing thereof are disclosed. The electron beam manipulator comprises a body having a first surface and a second surface opposing to the first surface and an interconnecting surface extending between the first surface and the second surface and forming an aperture through the body. The body comprises an electrode forming at least part of the interconnecting surface between the first surface and the second surface.

公开(公告)号：WO2022048898A1

公开(公告)日：2022-03-10

申请号：PCT/EP2021/072716

申请日：2021-08-16

Applicant: ASML NETHERLANDS B.V.

Inventor： WALVOORT, Derk, Ferdinand ,  MUDRETSOV, Dmitry ,  HU, Xuerang ,  XI, Qingpo ,  VAN SOEST, Jurgen ,  WIELAND, Marco, Jan-Jaco

IPC: H01J37/09 ,  H01J37/16 ,  H01J37/28 ,  H01J37/317

Abstract: Disclosed herein is an electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path towards a target, the electron-optical assembly comprising: electromagnetic shielding surrounding the charged particle beam path and configured to shield the charged particle beam from an electromagnetic field external to the electromagnetic shielding; wherein the electromagnetic shielding comprises a plurality of sections extending along different positions along the beam path, each section surrounding the charged particle beam, wherein the sections are separable.

公开(公告)号：EP4211711A1

公开(公告)日：2023-07-19

申请号：EP21759097.5

申请日：2021-08-16

Applicant: ASML Netherlands B.V.

Inventor： WALVOORT, Derk, Ferdinand ,  MUDRETSOV, Dmitry ,  HU, Xuerang ,  XI, Qingpo ,  VAN SOEST, Jurgen ,  WIELAND, Marco, Jan-Jaco

IPC: H01J37/09 ,  H01J37/16 ,  H01J37/28 ,  H01J37/317

公开(公告)号：EP3876258A1

公开(公告)日：2021-09-08

申请号：EP20161464.1

申请日：2020-03-06

Applicant: ASML Netherlands B.V.

Inventor： DE LANGEN, Johannes, Cornelis, Jacobus ,  MUDRETSOV, Dmitry ,  CAI, Dongbin

IPC: H01J37/04

Abstract: An improved electron beam manipulator for manipulating an electron beam in an electron projection system and a method for manufacturing thereof are disclosed. The electron beam manipulator comprises a body having a first surface and a second surface opposing to the first surface and an interconnecting surface extending between the first surface and the second surface and forming an aperture through the body. The body comprises an electrode forming at least part of the interconnecting surface between the first surface and the second surface.

公开(公告)号：EP4383308A1

公开(公告)日：2024-06-12

申请号：EP22211495.1

申请日：2022-12-05

Applicant: ASML Netherlands B.V.

Inventor： DE LANGEN, Johannes, Cornelis, Jacobus ,  LOOMAN, Bram, Albertus ,  MUDRETSOV, Dmitry ,  DEL TIN, laura

IPC: H01J37/04 ,  H01J37/12

CPC classification number: H01J37/04 ,  H01J37/12 ,  H01J2237/045320130101 ,  H01J2237/120520130101 ,  H01J2237/153420130101

Abstract: The present disclosure relates to an electron-optical stack for manipulating one or more charged particle beams and associated apparatus and methods. In one arrangement, a plurality of electron-optical plates have major surfaces on opposite sides of the plates. The plates define a set of channels configured to be aligned along a beam path of a charged particle beam to allow the charged particle beam to pass through the plates via the channels. Each channel defines apertures in the two major surfaces of the plate that defines the channel. The apertures have different shapes from each other in the sense that one aperture has a nominal shape and the other aperture has a perturbed shape, i.e., a perturbed version of the nominal shape. The plates are oriented such that the apertures comprise one or more matching aperture pairs along the beam path. The or each matching aperture pair consists of apertures having the same shape defined in adjacent major surfaces of adjacent plates, i.e., they have both either a nominal shape or a perturbed shape.

公开(公告)号：EP3982391A1

公开(公告)日：2022-04-13

申请号：EP20200740.7

申请日：2020-10-08

Applicant: ASML Netherlands B.V.

Inventor： WALVOORT, Derk, Ferdinand ,  MUDRETSOV, Dmitry ,  HU, Xuerang ,  XI, Qingpo

IPC: H01J37/28 ,  H01J37/09

Abstract: Disclosed herein is an electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path (304) towards a target, the electron-optical assembly comprising: electromagnetic shielding (40) surrounding the charged particle beam path and configured to shield the charged particle beam from an electromagnetic field external to the electromagnetic shielding; wherein the electromagnetic shielding comprises a plurality of sections extending along different positions along the beam path, each section surrounding the charged particle beam, wherein the sections are separable.