公开(公告)号：US20200096882A1

公开(公告)日：2020-03-26

申请号：US16687535

申请日：2019-11-18

Applicant: ASML Netherlands B.V.

Inventor： Frits VAN DER MEULEN ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Ronald Harm Gunther KRAMER ,  Matthias KRUIZINGA ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Erik Roelof LOOPSTRA ,  Gerrit VAN DEN BOSCH ,  Jérôme François Sylvain Virgile VAN LOO ,  Beatrijs Louise Marie-Joseph Katrien VERBRUGGE ,  Angelo Cesar Peter DE KLERK ,  Jacobus Maria DINGS ,  Maurice Leonardus Johannes JANSSEN ,  Roland Jacobus Johannes KERSTENS ,  Martinus Jozef Maria KESTERS ,  Michel LOOS ,  Geert MIDDEL ,  Silvester Matheus REIJNDERS ,  Frank Johannes Christiaan THEUERZEIT ,  Anne Johannes Wilhelmus VAN LIEVENOOGEN

IPC: G03F7/20 ,  G03F1/22 ,  G03F1/64

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US20200057394A1

公开(公告)日：2020-02-20

申请号：US16587483

申请日：2019-09-30

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Matthias KRUIZINGA ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Erik Willem BOGAART ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Richard Joseph BRULS ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Mohammad Reza KAMALI ,  Ronald Harm Gunther KRAMER ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Matthew LIPSON ,  Erik Roelof LOOPSTRA ,  Joseph H. LYONS ,  Stephen ROUX ,  Gerrit VAN DEN BOSCH ,  Sander VAN DEN HEIJKANT ,  Sandra VAN DER GRAAF ,  Frits VAN DER MEULEN ,  Jérôme François SylvainVirgile VAN LOO ,  Beatrijs Louis Marie-Joseph Katrien VERBRUGGE

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/22

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US20190025717A1

公开(公告)日：2019-01-24

申请号：US15526639

申请日：2015-11-16

Applicant: ASML Netherlands B.V.

Inventor： Frits VAN DER MEULEN ,  Maaeten JANSEN ,  Jorge AZEREDO LIMA ,  Derk BROUNS ,  Marc BRUIJN

IPC: G03F7/20

Abstract: A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.

公开(公告)号：US20180329314A1

公开(公告)日：2018-11-15

申请号：US15526654

申请日：2015-11-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Matthias KRUIZINGA ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Erik Willem BOGAART ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Richard Joseph BRULS ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Mohammad Reza KAMALI ,  Ronald Harm Gunther KRAMER ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Matthew LIPSON ,  Erik Roelof LOOPSTRA ,  Joseph H. LYONS ,  Stephen ROUX ,  Gerrit VAN DEN BOSCH ,  Sander VAN DEN HEIJKANT ,  Sandra VAN DER GRAAF ,  Frits VAN DER MEULEN ,  Jérôme François Sylvain Virgile VAN LOO ,  Beatrijs Louise Marie-Joseph Katrien VERBRUGGE

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/22

CPC classification number: G03F7/70983 ,  G03F1/22 ,  G03F1/64 ,  G03F7/70825

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.