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公开(公告)号：US20200209736A1
公开(公告)日：2020-07-02
申请号：US16614815
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： David Ferdinand VLES , Chaitanya Krishna ANDE , Antonius Franciscus Johannes DE GROOT , Adrianus Johannes Maria GIESBERS , Johannes Joseph JANSSEN , Paul JANSSEN , Johan Flendrik KLOOTWIJK , Peter Simon Antonius KNAPEN , Evgenia KURGANOVA , Marcel Peter MEIJER , Wouter Rogier MEIJERINK , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Raymond OLSMAN , Hrishikesh PATEL , Maria PETER , Gerrit VAN DEN BOSCH , Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , Hendrikus Jan WONDERGEM , Aleksandar Nikolov ZDRAVKOV
Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：US20180373141A1
公开(公告)日：2018-12-27
申请号：US16060837
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Derk Servatius Gertruda BROUNS , Paul JANSSEN , Mohammad Reza KAMALI , Maria PETER , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN
Abstract: A membrane assembly for EUV lithography, the membrane assembly including: a planar membrane; a border configured to hold the membrane; and a frame assembly connected to the border and configured to attach to a patterning device for EUV lithography, wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
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