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公开(公告)号：WO2017186486A1
公开(公告)日：2017-11-02
申请号：PCT/EP2017/058721
申请日：2017-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , LENDERINK, Egbert , MAXIM, Nicolae , NIKIPELOV, Andrey , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , PÉTER, Mária , RISPENS, Gijsbert , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , ZDRAVKOV, Alexandar, Nikolov
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
Abstract translation: 公开了用于EUV光刻的膜。 在一种布置中，膜包括具有以下顺序的层的堆叠体：包含第一金属的氧化物的第一封盖层; 基层，其包含含有第二金属和选自Si，B，C和N的附加元素的化合物; 以及包含第三金属的氧化物的第二覆盖层，其中第一金属不同于第二金属，第三金属与第一金属相同或不同。
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Patent Agency Ranking
公开(公告)号：WO2020212196A1
公开(公告)日：2020-10-22
申请号：PCT/EP2020/059859
申请日：2020-04-07
Applicant: ASML NETHERLANDS B.V.
Inventor： BANERJEE, Nirupam , WRICKE, Sandro , BECKERS, Johan, Franciscus, Maria , DONKERBROEK, Arend, Johannes , GRIMM, Daniel , BRAKHAGE, Peter , RATHJE, Tim , TILKE, Martin
IPC: G03F7/20
Abstract: An image sensor (17) for immersion lithography, the image sensor comprising: a grating (310, 320 and 330); an absorber layer (350) on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating (400) at an upper surface of the image sensor; wherein a protective layer (500) is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.
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公开(公告)号：WO2018192710A1
公开(公告)日：2018-10-25
申请号：PCT/EP2018/055872
申请日：2018-03-09
Applicant: ASML NETHERLANDS B.V.
Inventor： GATTOBIGIO, Giovanni, Luca , BANERJEE, Nirupam , BECKERS, Johan, Franciscus, Maria , EUMMELEN, Erik, Henricus, Egidius, Catharina , KOX, Ronald, Frank , POLET, Theodorus, Wilhelmus , ROPS, Cornelius, Maria , VAN GILS, Mike, Paulus, Johannes , VAN SLUISVELD, Wouterus, Jozephus, Johannes
IPC: G03F7/20
Abstract: A method of performance testing working parameters of a fluid handing structure (12) in an immersion lithographic apparatus, the method comprising: placing a test substrate (TW) comprising an upper surface with a first portion (300) with a resist defining the upper surface and a second portion (310) with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion; detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.
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公开(公告)号：EP3449312A1
公开(公告)日：2019-03-06
申请号：EP17717149.3
申请日：2017-04-12
Applicant: ASML Netherlands B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , LENDERINK, Egbert , MAXIM, Nicolae , NIKIPELOV, Andrey , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , PÉTER, Mária , RISPENS, Gijsbert , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , ZDRAVKOV, Alexandar, Nikolov
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公开(公告)号：EP4202545A1
公开(公告)日：2023-06-28
申请号：EP23157200.9
申请日：2017-04-12
Applicant: ASML Netherlands B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , NIKIPELOV, Andrey, , PÉTER, Mária , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , LENDERINK, Egbert , MAXIM, Nicolae , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , RISPENS, Gijsbert , ZDRAVKOV, Alexandar, Nikolov
Abstract: The invention concerns a membrane for EUV lithography. The membrane comprises a base layer. The base layer comprises one or more of the following: a stable stoichiometry of Mo and Si, a stable stoichiometry of Ru and Si, a stable stoichiometry of Zr and Si, a stable stoichiometry of La and Si, a stable stoichiometry of Y and Si, and a stable stoichiometry of Nb and Si. The membrane further comprises a capping layer providing an outer surface of the membrane. The invention further concerns a pellicle assembly comprising the membrane of the invention, a patterning device assembly comprising the pellicle assembly of the invention, and a dynamic gas lock assembly comprising the membrane of the invention.
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公开(公告)号：EP3956728A1
公开(公告)日：2022-02-23
申请号：EP20716802.2
申请日：2020-04-07
Applicant: ASML Netherlands B.V.
Inventor： BANERJEE, Nirupam , WRICKE, Sandro , BECKERS, Johan, Franciscus, Maria , DONKERBROEK, Arend, Johannes , GRIMM, Daniel , BRAKHAGE, Peter , RATHJE, Tim , TILKE, Martin
IPC: G03F7/20
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