公开(公告)号：WO2020064542A1

公开(公告)日：2020-04-02

申请号：PCT/EP2019/075321

申请日：2019-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： VELLANKI, Venugopal ,  SIMMONS, Mark, Christopher

IPC: G03F7/20 ,  G06F17/50

Abstract: Described herein is a method of determining candidate patterns from a set of patterns of a patterning process. The method includes obtaining (i) a set of patterns of a patterning process, (ii) a search pattern having a first feature and a second feature, and (iii) a first search condition comprising a relative position between the first feature and the second feature of the search pattern; and determining a first set of candidate patterns from the set of patterns that satisfies the first search condition associated with the first feature and the second feature of the search pattern.

公开(公告)号：WO2018010940A1

公开(公告)日：2018-01-18

申请号：PCT/EP2017/065593

申请日：2017-06-23

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  SIMMONS, Mark, Christopher

IPC: G03F1/36 ,  G03F7/20 ,  G06F17/50

Abstract: Provided is a process, including: obtaining data specifying a layout of a lithographic pattern; obtaining performance metrics of a computational analysis of the layout, the performance metrics indicating performance of one or more computer processes performing respective portions of the computational analysis; correlating the performance metrics to portions of the layout being processed during measurement of the respective performance metrics; and generating a three or higher dimensional visualization based on a result of correlating the performance metrics to portions of the layout being processed during measurement, wherein at least some of the visualization dimensions indicate relative positions of portions of the layout and at least some of the visualization dimensions indicate a performance metric correlated to the respective portions.

Abstract translation: 提供一种处理，包括：获得指定光刻图案的布局的数据; 获得布局的计算分析的性能度量，所述性能度量指示执行计算分析的各个部分的一个或多个计算机进程的性能; 将性能度量与在测量各个性能度量期间正在处理的布局的各部分相关联; 以及基于将所述性能度量与在测量期间正在处理的所述布局的各部分相关的结果来生成三维或更高维度的可视化，其中至少一些所述可视化维度指示所述布局的部分的相对位置以及所述可视化中的至少一些 维度指示与相应部分相关的性能度量。

公开(公告)号：WO2020078762A1

公开(公告)日：2020-04-23

申请号：PCT/EP2019/077146

申请日：2019-10-08

Applicant: ASML NETHERLANDS B.V.

Inventor： SIMMONS, Mark, Christopher ,  LIN, Chenxi ,  WUU, Jen-Yi

IPC: G03F7/20

Abstract: A method of generating a characteristic pattern for a patterning process and training a machine learning model. The method for generating the characteristic pattern includes obtaining a trained generator model configured to generate a characteristic pattern (e.g., hot spot pattern), and an input pattern; and generating, via simulation of the trained generator model (e.g., CNN), the characteristic pattern based on the input pattern, wherein the input pattern is at least one of a random vector, a class of pattern.