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    PATTERN SELECTION SYSTEMS AND METHODS
    1.
    发明申请
    PATTERN SELECTION SYSTEMS AND METHODS 审中-公开

    公开(公告)号：WO2023046385A1

    公开(公告)日：2023-03-30

    申请号：PCT/EP2022/073313

    申请日：2022-08-22

    Applicant: ASML NETHERLANDS B.V.

    Inventor： LIU, Meng ,  CHEN, Been-Der ,  SHAO, Debao ,  WUU, Jen-Yi ,  CHEN, Hao ,  HAMOUDA, Ayman ,  CHENG, Jianhua

    IPC: G03F1/36 ,  G03F7/20 ,  G06N3/08 ,  G06N20/00

    Abstract: Selecting an optimized, geometrically diverse subset of clips for a design layout for a semiconductor wafer is described. A complete representation of the design layout is received. A set of representative clips of the design layout is determined such that individual representative clips comprise different combinations of one or more unique patterns of the design layout. A subset of the representative clips is selected based on the one or more unique patterns. The subset of the representative clips is configured to include: (1) each geometrically unique pattern in a minimum number of representative clips; or (2) as many geometrically unique patterns of the design layout as possible in a maximum number of representative clips. The subset of representative clips is provided as training data for training an optical proximity correction or source mask optimization semiconductor process machine learning model, for example.

    METHODS FOR GENERATING CHARACTERISTIC PATTERN AND TRAINING MACHINE LEARNING MODEL
    2.
    发明申请
    METHODS FOR GENERATING CHARACTERISTIC PATTERN AND TRAINING MACHINE LEARNING MODEL 审中-公开

    公开(公告)号：WO2020078762A1

    公开(公告)日：2020-04-23

    申请号：PCT/EP2019/077146

    申请日：2019-10-08

    Applicant: ASML NETHERLANDS B.V.

    Inventor： SIMMONS, Mark, Christopher ,  LIN, Chenxi ,  WUU, Jen-Yi

    IPC: G03F7/20

    Abstract: A method of generating a characteristic pattern for a patterning process and training a machine learning model. The method for generating the characteristic pattern includes obtaining a trained generator model configured to generate a characteristic pattern (e.g., hot spot pattern), and an input pattern; and generating, via simulation of the trained generator model (e.g., CNN), the characteristic pattern based on the input pattern, wherein the input pattern is at least one of a random vector, a class of pattern.

    FEATURE EXTRACTION METHOD FOR EXTRACTING FEATURE VECTORS FOR IDENTIFYING PATTERN OBJECTS
    3.
    发明申请
    FEATURE EXTRACTION METHOD FOR EXTRACTING FEATURE VECTORS FOR IDENTIFYING PATTERN OBJECTS 审中-公开

    公开(公告)号：WO2022135819A1

    公开(公告)日：2022-06-30

    申请号：PCT/EP2021/082886

    申请日：2021-11-24

    Applicant: ASML NETHERLANDS B.V.

    Inventor： LI, Danying ,  LIU, Meng ,  WUU, Jen-Yi ,  SUN, Rencheng ,  WU, Cong ,  XU, Dean

    IPC: G03F7/20 ,  G06F30/398

    Abstract: An improved apparatus and method of feature extraction for identifying a pattern are disclosed. An improved method of feature extraction for identifying a pattern comprises obtaining data representative of a pattern instance, dividing the pattern instance into a plurality of zones, determining a representative characteristic of a zone of the plurality of zones, generating a representation of the pattern instance using a feature vector, wherein the feature vector comprises an element corresponding to the representative characteristic, wherein the representative characteristic is indicative of a spatial distribution of one or more features of the zone. The method also comprises at least one of classifying or selecting pattern instances based on the feature vector.

    SYSTEMS, PRODUCTS, AND METHODS FOR IMAGE-BASED PATTERN SELECTION
    4.
    发明申请
    SYSTEMS, PRODUCTS, AND METHODS FOR IMAGE-BASED PATTERN SELECTION 审中-公开

    公开(公告)号：WO2022037921A1

    公开(公告)日：2022-02-24

    申请号：PCT/EP2021/071359

    申请日：2021-07-29

    Applicant: ASML NETHERLANDS B.V.

    Inventor： CHEN, Hao ,  HU, Weixuan ,  JIA, Qi ,  LIU, Meng ,  SUN, Rencheng ,  WUU, Jen-Yi

    IPC: G03F7/20 ,  G03F1/36 ,  G06F30/30 ,  G06N3/04

    Abstract: Described herein is a method for selecting patterns for training a model to predict patterns to be printed on a substrate. The method includes (a) obtaining images of multiple patterns, wherein the multiple patterns correspond to target patterns to be printed on a substrate; (b) grouping the images into a group of special patterns and multiple groups of main patterns; and (c) outputting a set of patterns based on the images as training data for training the model, wherein the set of patterns includes the group of special patterns and a representative main pattern from each group of main patterns.

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