公开(公告)号：WO2023011849A1

公开(公告)日：2023-02-09

申请号：PCT/EP2022/069063

申请日：2022-07-08

Applicant: ASML NETHERLANDS B.V.

Inventor： HEIJMANS, Lucas, Christiaan, Johan ,  DEHNER, Imre, Rudolf, Richard ,  LAFARRE, Raymond, Wilhelmus, Louis ,  OTTENS, Cornelis, Christiaan ,  VAN DE KERKHOF, Marcus, Adrianus ,  NIKIPELOV, Andrey ,  VANOTTERDIJK, Dennis ,  SMULDERS, Edwin, Johannes, Theodorus ,  YAKUNIN, Andrei, Mikhailovich ,  SALMASO, Guido ,  VOORDECKERS, Luc ,  ANDE, Chaitanya Krishna ,  COENEN, Martinus, Jacobus, Johannes

IPC: G03F1/82 ,  G03F7/20 ,  B08B7/00

Abstract: An apparatus for cleaning a component for use in a lithographic apparatus, the apparatus comprising at least one cleaning module or a plurality of cleaning modules, wherein the at least one cleaning module or the plurality of cleaning modules comprise a plurality of cleaning mechanisms, and wherein the plurality of cleaning mechanisms comprise: at least one preparing mechanism for reducing adhesion of the particles to the component and at least one removing mechanism for removing particles from the component, or a plurality of removing mechanisms for removing particles from the component.