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Patent Agency Ranking
公开(公告)号：WO2019211083A1
公开(公告)日：2019-11-07
申请号：PCT/EP2019/059477
申请日：2019-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： DE GRAAF, Dennis , BEAUDRY, Richard , BIRON, Maxime , JANSSEN, Paul , KATER, Thijs , KORNELSEN, Kevin , KUIJKEN, Michael, Alfred, Josephus , KUNTZEL, Jan, Hendrik, Willem , MARTEL, Stephane , NASALEVICH, Maxim, Aleksandrovich , SALMASO, Guido , VAN ZWOL, Pieter-Jan
Abstract: A wafer comprising a mask on one face and at least one layer on the opposite face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle comprising the steps of: providing a wafer comprising a mask on one face and at least one layer on the opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle comprising the steps of: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may comprise a metal nitride layer.
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公开(公告)号：WO2022042993A1
公开(公告)日：2022-03-03
申请号：PCT/EP2021/071266
申请日：2021-07-29
Applicant: ASML NETHERLANDS B.V.
Inventor： BANINE, Vadim, Yevgenyevich , VERMEULEN, Paul, Alexander , DE MEIJERE, Cornelis, Adrianus , MOORS, Johannes, Hubertus, Josephina , NIKIPELOV, Andrey , SALMASO, Guido , VAN DE KERKHOF, Marcus, Adrianus , YAGHOOBI, Parham
Abstract: An apparatus for reducing a partially oxidized reticle and pellicle assembly comprises: a support; a hydrogen supply; and an electron source. The support is for supporting a reticle and pellicle assembly. The hydrogen supply is operable to supply hydrogen in the vicinity of to a pellicle of a reticle and pellicle assembly when supported by the support. The electron source is operable to direct electrons so as to be incident on a pellicle of a reticle and pellicle assembly when supported by the support.
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公开(公告)号：WO2023011849A1
公开(公告)日：2023-02-09
申请号：PCT/EP2022/069063
申请日：2022-07-08
Applicant: ASML NETHERLANDS B.V.
Inventor： HEIJMANS, Lucas, Christiaan, Johan , DEHNER, Imre, Rudolf, Richard , LAFARRE, Raymond, Wilhelmus, Louis , OTTENS, Cornelis, Christiaan , VAN DE KERKHOF, Marcus, Adrianus , NIKIPELOV, Andrey , VANOTTERDIJK, Dennis , SMULDERS, Edwin, Johannes, Theodorus , YAKUNIN, Andrei, Mikhailovich , SALMASO, Guido , VOORDECKERS, Luc , ANDE, Chaitanya Krishna , COENEN, Martinus, Jacobus, Johannes
Abstract: An apparatus for cleaning a component for use in a lithographic apparatus, the apparatus comprising at least one cleaning module or a plurality of cleaning modules, wherein the at least one cleaning module or the plurality of cleaning modules comprise a plurality of cleaning mechanisms, and wherein the plurality of cleaning mechanisms comprise: at least one preparing mechanism for reducing adhesion of the particles to the component and at least one removing mechanism for removing particles from the component, or a plurality of removing mechanisms for removing particles from the component.
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公开(公告)号：EP4200670A1
公开(公告)日：2023-06-28
申请号：EP21749855.9
申请日：2021-07-29
Applicant: ASML Netherlands B.V.
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公开(公告)号：EP3788442A1
公开(公告)日：2021-03-10
申请号：EP19716199.5
申请日：2019-04-12
Applicant: ASML Netherlands B.V.
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