公开(公告)号：WO2023025511A1

公开(公告)日：2023-03-02

申请号：PCT/EP2022/071251

申请日：2022-07-28

Applicant: ASML NETHERLANDS B.V.

Inventor： AGRICOLA, Franciscus, Theodorus ,  FERRE LLIN, Lourdes ,  DE GRAAF, Dennis ,  ANDE, Chaitanya Krishna ,  DONMEZ NOYAN, Inci ,  SI, Fai Tong ,  VAN DER WOORD, Ties, Wouter ,  ROLLIER, Anne-Sophie ,  BIRON, Maxime ,  GIESBERS, Adrianus, Johannes, Maria

IPC: G03F1/62 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane comprises metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irregular. The reinforcing network includes windows with a maximum dimension of up to 20 microns. The reinforcing network includes windows having an average size of at least 5 microns.

公开(公告)号：WO2023011849A1

公开(公告)日：2023-02-09

申请号：PCT/EP2022/069063

申请日：2022-07-08

Applicant: ASML NETHERLANDS B.V.

Inventor： HEIJMANS, Lucas, Christiaan, Johan ,  DEHNER, Imre, Rudolf, Richard ,  LAFARRE, Raymond, Wilhelmus, Louis ,  OTTENS, Cornelis, Christiaan ,  VAN DE KERKHOF, Marcus, Adrianus ,  NIKIPELOV, Andrey ,  VANOTTERDIJK, Dennis ,  SMULDERS, Edwin, Johannes, Theodorus ,  YAKUNIN, Andrei, Mikhailovich ,  SALMASO, Guido ,  VOORDECKERS, Luc ,  ANDE, Chaitanya Krishna ,  COENEN, Martinus, Jacobus, Johannes

IPC: G03F1/82 ,  G03F7/20 ,  B08B7/00

Abstract: An apparatus for cleaning a component for use in a lithographic apparatus, the apparatus comprising at least one cleaning module or a plurality of cleaning modules, wherein the at least one cleaning module or the plurality of cleaning modules comprise a plurality of cleaning mechanisms, and wherein the plurality of cleaning mechanisms comprise: at least one preparing mechanism for reducing adhesion of the particles to the component and at least one removing mechanism for removing particles from the component, or a plurality of removing mechanisms for removing particles from the component.

公开(公告)号：WO2019091932A1

公开(公告)日：2019-05-16

申请号：PCT/EP2018/080219

申请日：2018-11-06

Applicant: ASML NETHERLANDS B.V.

Inventor： HOUWELING, Zomer, Silvester ,  ANDE, Chaitanya Krishna ,  DE GRAAF, Dennis ,  KATER, Thijs ,  KUIJKEN, Michael, Alfred, Josephus ,  VALEFI, Mahdiar

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: A pellicle comprising a metal oxysilicide layer. Also disclosed in a pellicle comprising a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. Also disclosed is a method of manufacturing a pellicle for a lithographic apparatus, said method comprising: providing a metal oxysilicide layer, a lithographic assembly (LA) comprising a pellicle (15) comprising a metal oxysilicide layer, and the use of a pellicle comprising a metal oxysilicide layer in a lithographic apparatus.

公开(公告)号：WO2018228933A3

公开(公告)日：2018-12-20

申请号：PCT/EP2018/065127

申请日：2018-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： VLES, David, Ferdinand ,  ANDE, Chaitanya Krishna ,  DE GROOT, Antonius, Franciscus, Johannes ,  GIESBERS, Adrianus, Johannes, Maria ,  JANSSEN, Johannes, Joseph ,  JANSSEN, Paul ,  KLOOTWIJK, Johan, Hendrik ,  KNAPEN, Peter, Simon, Antonius ,  KURGANOVA, Evgenia ,  MEIJER, Marcel, Peter ,  MEIJERINK, Wouter, Rogier ,  NASALEVICH, Maxim, Aleksandrovich ,  NOTENBOOM, Arnoud, Willem ,  OLSMAN, Raymond ,  PATEL, Hrishikesh ,  PÉTER, Mária ,  VAN DEN BOSCH, Gerrit ,  VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VOORTHUIJZEN, Willem-Pieter ,  WONDERGEM, Hendrikus, Jan ,  ZDRAVKOV, Alexandar, Nikolov

IPC: G03F1/62 ,  G03F1/64

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：WO2018228933A2

公开(公告)日：2018-12-20

申请号：PCT/EP2018/065127

申请日：2018-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： VLES, David, Ferdinand ,  ANDE, Chaitanya Krishna ,  DE GROOT, Antonius, Franciscus, Johannes ,  GIESBERS, Adrianus, Johannes, Maria ,  JANSSEN, Johannes, Joseph ,  JANSSEN, Paul ,  KLOOTWIJK, Johan, Hendrik ,  KNAPEN, Peter, Simon, Antonius ,  KURGANOVA, Evgenia ,  MEIJER, Marcel, Peter ,  MEIJERINK, Wouter, Rogier ,  NASALEVICH, Maxim, Aleksandrovich ,  NOTENBOOM, Arnoud, Willem ,  OLSMAN, Raymond ,  PATEL, Hrishikesh ,  PÉTER, Mária ,  VAN DEN BOSCH, Gerrit ,  VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VOORTHUIJZEN, Willem-Pieter ,  WONDERGEM, Hendrikus, Jan ,  ZDRAVKOV, Alexandar, Nikolov

IPC: G03F1/62 ,  G03F1/64

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：EP3707557A1

公开(公告)日：2020-09-16

申请号：EP18796950.6

申请日：2018-11-06

Applicant: ASML Netherlands B.V.

Inventor： HOUWELING, Zomer Silvester ,  ANDE, Chaitanya Krishna ,  DE GRAAF, Dennis ,  KATER, Thijs ,  KUIJKEN, Michael Alfred Josephus ,  VALEFI, Mahdiar

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

公开(公告)号：EP3639091A2

公开(公告)日：2020-04-22

申请号：EP18728409.6

申请日：2018-06-08

Applicant: ASML Netherlands B.V.

Inventor： VLES, David, Ferdinand ,  ANDE, Chaitanya Krishna ,  DE GROOT, Antonius, Franciscus, Johannes ,  GIESBERS, Adrianus, Johannes, Maria ,  JANSSEN, Johannes, Joseph ,  JANSSEN, Paul ,  KLOOTWIJK, Johan, Hendrik ,  KNAPEN, Peter, Simon, Antonius ,  KURGANOVA, Evgenia ,  MEIJER, Marcel, Peter ,  MEIJERINK, Wouter, Rogier ,  NASALEVICH, Maxim, Aleksandrovich ,  NOTENBOOM, Arnoud, Willem ,  OLSMAN, Raymond ,  PATEL, Hrishikesh ,  PETER, Maria ,  VAN DEN BOSCH, Gerrit ,  VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VOORTHUIJZEN, Willem-Pieter ,  WONDERGEM, Hendrikus, Jan ,  ZDRAVKOV, Alexandar, Nikolov

IPC: G03F1/62 ,  G03F1/64

公开(公告)号：EP4392825A1

公开(公告)日：2024-07-03

申请号：EP22758444.8

申请日：2022-07-28

Applicant: ASML Netherlands B.V.

Inventor： AGRICOLA, Franciscus, Theodorus ,  FERRE LLIN, Lourdes ,  DE GRAAF, Dennis ,  ANDE, Chaitanya Krishna ,  DONMEZ NOYAN, Inci ,  SI, Fai Tong ,  VAN DER WOORD, Ties, Wouter ,  ROLLIER, Anne-Sophie ,  BIRON, Maxime ,  GIESBERS, Adrianus, Johannes, Maria

IPC: G03F1/62 ,  G03F7/20

CPC classification number: G03F1/62 ,  G03F7/70983