公开(公告)号：WO2022144156A1

公开(公告)日：2022-07-07

申请号：PCT/EP2021/085051

申请日：2021-12-09

Applicant: ASML NETHERLANDS B.V.

Inventor： BOSCH, Niels, Johannes, Maria ,  WANG, Xu ,  HEMPENIUS, Peter, Paul ,  WANG, Yongqiang ,  BUTLER, Hans ,  WANG, Youjin ,  GRASMAN, Jasper, Hendrik ,  SUI, Jianzi ,  CHEN, Tianming ,  WU, Aimin

IPC: H01J37/21 ,  H01J37/28

Abstract: There is provided a charged particle apparatus comprising: a particle beam generator, optics, a first and a second positioning device, both configured for positioning the substrate relative to the particle beam generator along its optical axis, and a controller configured for switching between a first operational mode and a second operational mode. The apparatus is configured, when operating in the first operational mode, for irradiating the substrate by the particle beam at a first landing energy of the particle beam and, when operating in the second operational mode, for irradiating the substrate at a second, different landing energy. When operating in the first operational mode, the second positioning device is configured to position the substrate relative to the particle beam generator at a first focus position of the particle beam and in the second operational mode, to position the substrate at a second, different focus position.

公开(公告)号：WO2018073192A1

公开(公告)日：2018-04-26

申请号：PCT/EP2017/076384

申请日：2017-10-16

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： LI, Fangfu ,  WANG, Youjin

IPC: H01J37/18

CPC classification number: H01J37/18 ,  H01J2237/186

Abstract: Systems and methods for venting gas into a chamber 304 at an accelerated speed are disclosed. The system comprises a first gas flow and a second gas flow. The first gas flow is formed by a first vent valve 312 and optionally a third vent valve 316. The second gas flow is formed by a second vent valve 314. The vent valve vacuum system is configured to connect a gas source reservoir 301 and a chamber 304 for gas to be vented into, and coupled to a controller 302. The vent valve vacuum system turns on the second vent valve to form a second gas flow at a point of time later than the first gas flow is formed.

Abstract translation: 公开了用于以加速的速度将气体排入室304的系统和方法。 该系统包括第一气流和第二气流。 第一气流由第一通气阀312和可选的第三通气阀316形成。第二气流由第二通气阀314形成。通气阀真空系统构造成连接气源储存器301和腔室 304用于将气体排入并连接到控制器302.排气阀真空系统开启第二排气阀以在晚于第一气流形成的时间点形成第二气流。

公开(公告)号：WO2018153856A1

公开(公告)日：2018-08-30

申请号：PCT/EP2018/054144

申请日：2018-02-20

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： HUANG, Hsuan-Bin ,  LU, Chun-Liang ,  TU, Chin-Fa ,  LIN, Wen-Sheng ,  WANG, Youjin

IPC: H01J37/18 ,  H01L21/67 ,  H01L21/677

Abstract: A load lock system for charged particle beam imaging with a particle shielding plate (204), a bottom seal plate (202) and a plurality of sensor units (301-303) is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. In the invention, the system is designed to improve the contamination particles from components in the load lock system of charged particle beam inspection tool and also to simplify its assembly.

公开(公告)号：WO2018077873A1

公开(公告)日：2018-05-03

申请号：PCT/EP2017/077155

申请日：2017-10-24

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： WANG, Youjin ,  LI, Fangfu

IPC: H01J37/20 ,  G03F7/20

Abstract: System and method for dynamically determining a position of stage (200) holding a sample and automatically compensating position errors comprising a plurality of interferometer units (31, 32) configured to generate signals based on a position of a stage and further comprising a computing device which can be configured to determine the position of the sample based on the signals, and in response to the determined position, provide instructions associated with the determined position by a control module for controlling of a motor of a stage, or for controlling of a motor to adjust interferometer units emitting charged particle beams, or combination thereof, to compensate position errors of a sample automatically.

Abstract translation: 用于动态确定保持样本并自动补偿位置误差的平台（200）的位置的系统和方法，包括：多个干涉仪单元（31,32），被配置为基于 并且还包括计算装置，该计算装置可以被配置为基于所述信号确定所述样本的位置，并且响应于所确定的位置，通过控制模块提供与所确定的位置相关联的指令，以控制阶段的电动机 ，或者用于控制电动机以调整发射带电粒子束的干涉仪单元或其组合，以自动补偿样品的位置误差。