公开(公告)号：WO2017102327A1

公开(公告)日：2017-06-22

申请号：PCT/EP2016/079219

申请日：2016-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER SCHAAR, Maurits ,  WARNAAR, Patrick ,  ZHANG, Youping ,  DEN BOEF, Arie, Jeffrey ,  XIAO, Feng ,  EBERT, Martin

IPC: G03F7/20 ,  G01N21/956

CPC classification number: G03F7/70633 ,  G01N21/956

Abstract: A method includes projecting an illumination beam of radiation onto a metrology target on a substrate, detecting radiation reflected from the metrology target on the substrate, and determining a characteristic of a feature on the substrate based on the detected radiation, wherein a polarization state of the detected radiation is controllably selected to optimize a quality of the detected radiation.

Abstract translation: 一种方法包括将照射的照射束投射到衬底上的度量目标上，检测从衬底上的度量目标反射的辐射，并且基于检测到的确定衬底上的特征的特征 辐射，其中检测到的辐射的偏振状态被可控地选择以优化检测到的辐射的质量。