公开(公告)号：JP2010034516A

公开(公告)日：2010-02-12

申请号：JP2009132706

申请日：2009-06-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SLOTBOOM DAAN MAURTIS ,  GEERKE JOHAN HENDRIK ,  AARTS IGOR MATHEUS PETRONELLA

IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F9/7076 ,  G03F7/70516 ,  G03F7/70616 ,  G03F9/7011 ,  G03F9/7019 ,  H01L21/02271

Abstract: PROBLEM TO BE SOLVED: To rapidly test physical characteristics about the performance of a substrate and a lithographic equipment. SOLUTION: The characteristic is tested about the extending pattern formed at least by a single line approximately extending in a first direction. The extending pattern is formed on the substrate or a substrate table and preferably extends 50 times as long as the width of the line. The testing method includes a procedure to move the substrate table in the first direction x, and one to measure the characteristic of the extending pattern in the first direction. The characteristic is the result of the physical characteristic of the extending pattern in the second direction y normal to the first direction. In the next step, the position of the substrate table is corrected from the measured position of the extending pattern. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：快速测试关于基板和光刻设备的性能的物理特性。 解决方案：测试关于至少由大致沿第一方向延伸的单个线形成的延伸图案的特性。 延伸图案形成在基板或基板台上，优选地延伸线的宽度的50倍。 测试方法包括在第一方向x上移动衬底台的步骤，以及用于测量第一方向上的延伸图案的特性的步骤。 该特征是与第一方向垂直的第二方向y上的延伸图案的物理特性的结果。 在下一步骤中，从扩展图案的测量位置校正衬底台的位置。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010258448A

公开(公告)日：2010-11-11

申请号：JP2010094525

申请日：2010-04-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  EUSSEN EMIEL JOZEF MELANIE ,  AARTS IGOR MATHEUS PETRONELLA ,  BIJVOET DIRK-JAN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a structure of a substrate support that has low heat sensitivity while the structure is light and stiff. SOLUTION: A lithographic apparatus includes: an illumination system configured to adjust a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate support constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The substrate support includes parts made of an open cell plastic foam material. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供在结构轻且刚硬的情况下具有低热敏性的衬底支撑体的结构。 光刻设备包括：被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持衬底的衬底支撑件; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上。 衬底支撑件包括由开孔塑料泡沫材料制成的部件。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009302531A

公开(公告)日：2009-12-24

申请号：JP2009132700

申请日：2009-06-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： AARTS IGOR MATHEUS PETRONELLA ,  GEERKE JOHAN HENDRIK ,  VAN DER PASCH ENGELBERTUS ANTO ,  DE JONG FREDERIK E ,  VAN DE GRIFT MARC

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F9/7076 ,  G03F7/70516 ,  G03F7/70616 ,  G03F9/7011 ,  G03F9/7019 ,  H01L21/02271

Abstract: PROBLEM TO BE SOLVED: To provide a calibration method for calibrating a stage position of a lithography apparatus. SOLUTION: This detection method detects a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate W or on a substrate table WT and preferably extends over a length at least 50 times wider than a width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table WT in the first direction and measuring along the first direction the property of the extended pattern. The property may be a result of a physical property of the extended pattern in a second direction at a right angle to the first direction. A next step allows a calibration of a substrate table position to be derived from the measured position of the extended pattern. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供用于校准光刻设备的台位置的校准方法。 解决方案：该检测方法检测由通常沿第一方向延伸的至少一条线形成的延伸图案的特性。 延伸图案形成在衬底W上或衬底台WT上，并且优选地延伸超过线宽度的至少50倍的长度。 扩展模式是对焦点敏感。 检测方法包括沿第一方向移动衬底台WT并沿着第一方向测量延伸图案的特性。 该特性可以是延伸图案在与第一方向成直角的第二方向上的物理性质的结果。 下一个步骤允许从扩展图案的测量位置导出衬底台位置的校准。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：SG157349A1

公开(公告)日：2009-12-29

申请号：SG2009037490

申请日：2009-06-02

Applicant: ASML NETHERLANDS BV

Inventor： AARTS IGOR MATHEUS PETRONELLA ,  GEERKE JOHAN HENDRIK ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  DE JONG FREDERIK EDUARD ,  VAN DE GRIFT MARC

Abstract: ITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50x the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.

公开(公告)号：SG157348A1

公开(公告)日：2009-12-29

申请号：SG2009037482

申请日：2009-06-02

Applicant: ASML NETHERLANDS BV

Inventor： SLOTBOOM DAAN MAURTIS ,  GEERKE JOHAN HENDRIK ,  AARTS IGOR MATHEUS PETRONELLA

Abstract: A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50x the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.