公开(公告)号：JP2007281462A

公开(公告)日：2007-10-25

申请号：JP2007090110

申请日：2007-03-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MA ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTO ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JO ,  ANTONIUS LEENDERS MARTINUS HEN ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To vary fluid pressure by accelerating a substrate table and accelerating regulating fluid in a supplying device, in a removing device and/or in the substrate table. SOLUTION: A lithography apparatus comprises the substrate table WT which is formed for holding a substrate W and retains the regulating fluid and a regulation system 100 for regulating the substrate table. The regulation system 100 comprises a pressure damper 104 which is communicated with the regulation system 100 through fluid and controls pressure change of the system 100. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：通过加速衬底台和加速供给装置中的调节流体，在去除装置和/或衬底台中来改变流体压力。 解决方案：光刻设备包括形成用于保持基板W并保持调节流体的基板台WT和用于调节基板台的调节系统100。 调节系统100包括压力调节器104，其通过流体与调节系统100连通并控制系统100的压力变化。版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2014027308A

公开(公告)日：2014-02-06

申请号：JP2013228111

申请日：2013-11-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  NICOLAAS TEN KATE ,  LOOPSTRA ERIK ROELOF ,  ASHWIN RODEVICK HENDRICKS JOHANNES VAN MEHL ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  CHRISTIANUS GERARDUS MARIA DE MOL ,  MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABETH ,  MARCO COELHO STAUFEN ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MARIA ,  VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  STOYAN NIHTIANOV ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PETER ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces lithography errors caused by immersion liquid.SOLUTION: A lithographic apparatus comprises: an illumination system configured to adjust a radiation beam; a support body configured to support a pattern forming device capable of imparting a pattern to the radiation beam in a cross section of the radiation beam to form a pattern formed radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the pattern formed radiation beam onto a target portion of the substrate; a liquid supply system configured to fill at least a part of space between a final element of the projection system and the substrate with liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of the immersion liquid from the substrate.

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。解决方案：光刻设备包括：照明系统，被配置为调节辐射束; 支撑体，被配置为支撑图案形成装置，其能够在所述辐射束的横截面中赋予所述辐射束的图案以形成图案形成的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案形成的辐射束投影到所述基板的目标部分上; 液体供应系统，其配置成用液体填充所述投影系统的最终元件和所述基板之间的至少一部分空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自衬底的浸没液体的蒸发的元件。

公开(公告)号：JP2012064982A

公开(公告)日：2012-03-29

申请号：JP2011285516

申请日：2011-12-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  ASHWIN RODEVICK HENDRICKS JOHANNES VAN MEHL ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  CHRISTIANUS GERARDUS MARIA DE MOL ,  MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABETH ,  MARCO COELHO STAUFEN ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MARIA ,  VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  STOYAN NIHTIANOV ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PETER ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces lithography errors arising from an immersion liquid.SOLUTION: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device capable of imparting a pattern to the radiation beam in its cross section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with a liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of the immersion liquid from the substrate.

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。 光刻设备包括：被配置为调节辐射束的照明系统; 支撑构造以支撑能够在其横截面中将辐射束赋予图案以形成图案化辐射束的图案形成装置; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 液体供应系统，被配置为至少部分地用液体填充所述投影系统的最终元件和所述基板之间的空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自衬底的浸没液体的蒸发的元件。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2009105443A

公开(公告)日：2009-05-14

申请号：JP2009024156

申请日：2009-02-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system reducing lithography errors arising from the immersion liquid. SOLUTION: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern to its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of immersion liquid from the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。 光刻设备包括：被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够将辐射束赋予其横截面图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 液体供应系统，被配置为至少部分地用液体填充所述投影系统的最终元件和所述基板之间的空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自基底的浸没液体的蒸发的元件。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2010147506A

公开(公告)日：2010-07-01

申请号：JP2010059515

申请日：2010-03-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MATHEUS ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN

IPC: H01L21/027 ,  G02B21/00 ,  G02B21/26 ,  G02B21/30

CPC classification number: G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus to which countermeasures are applied for suppressing influence of pressure variation of a conditioning fluid on a substrate table. SOLUTION: This lithographic apparatus is disclosed that projects a pattern from a patterning device onto a substrate. The lithographic apparatus includes a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and suppresses a pressure variation in the conditioning system. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其中应用了对策来抑制调理流体对基片台的压力变化的影响。 解决方案：公开了将图案形成装置的图案投影到基板上的该光刻设备。 光刻设备包括被配置为保持基板的基板台。 衬底台包括配置成保持调理流体并调节衬底台的调节系统。 调节系统包括与调节系统流体连通并抑制调节系统中的压力变化的压力调节器。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2006128682A

公开(公告)日：2006-05-18

申请号：JP2005310028

申请日：2005-10-25

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  VAN GOMPEL EDWIN AUGUSTINUS MA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/67109 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment and a device manufacturing method.
SOLUTION: Lithography equipment has a substrate support formed such that it supports a substrate, and a projection system formed such that it projects a patterned radiation beam to a target part of the substrate. The substrate support is operated such that the substrate is moved along a specified path of the target part as the next target of the substrate. The substrate support has a duct fabric for thermally stabilizing the substrate. This duct fabric supplies a thermal stabilization medium to the substrate through the duct, and removes the thermal stabilization medium virtually using the duct from a portion of the substrate support that supports the target part via the substrate support part that supports the target part preceding the substrate, thereby maintaining the target part as a next target thermally stably.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供光刻设备和设备制造方法。 解决方案：平版印刷设备具有形成为支撑基板的基板支撑件和形成为使得其将图案化的辐射束投影到基板的目标部分的投影系统。 操作基板支撑件，使得基板沿着目标部件的指定路径移动，作为基板的下一个目标。 衬底支撑件具有用于热稳定衬底的管道织物。 这种管道织物通过管道向基底提供热稳定介质，并且通过经由基板支撑部分支撑目标部分的衬底支撑部分，基本上使用来自支撑目标部分的基板支撑件的管道的热稳定介质， 从而热稳定地将目标部分保持为下一个目标。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006054468A

公开(公告)日：2006-02-23

申请号：JP2005233909

申请日：2005-08-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system for reducing lithographic errors caused by immersion liquid. SOLUTION: A lithography apparatus comprises an illumination system so constituted as to control a radiation beam, a support so constituted as to support a pattern forming device which imparts patterns on a crosssection of the radiation beam to form a patternized radiation beam, a substrate table so constituted as to hold a substrate, a projection system so constituted as to project the patternized radiation beam on the target of the substrate, a liquid supply system so constituted as to fill at least part of a space between a final element of the projection system and the substrate with the liquid, a sealing member so disposed as to substantially enclose the liquid inside the space between the final element of the projection system and the substrate, and an element for controlling and/or compensate evaporation of the immersion liquid from the substrate. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种减少浸没液引起的平版印刷误差的系统。 解决方案：光刻设备包括照明系统，其被构造成控制辐射束，支撑件被构造成支撑图案形成装置，其在辐射束的横截面上施加图案以形成图案化的辐射束， 衬底台，其被构造成保持衬底;投影系统，其被构造成将图案化的辐射束投射到衬底的靶上;液体供应系统，其被构造成填充所述衬底的最终元件之间的至少一部分空间; 投影系统和具有液体的基板，密封构件，其被设置为基本上将液体包围在投影系统的最终元件和基板之间的空间内，以及用于控制和/或补偿浸没液体的蒸发的元件 底物。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：SG131880A1

公开(公告)日：2007-05-28

申请号：SG2006071203

申请日：2006-10-12

Applicant: ASML NETHERLANDS BV

Inventor： MENCHTCHIKOV BORIS ,  DE JONG FREDERIK EDUARD

Abstract: The invention provides a method for correcting thermally-induced field deformations of a lithographically exposed substrate. First, a model is provided to predict thermally- induced field deformation information of a plurality of fields of the substrate. The pre-specified exposure information used to configure an exposure of the fields is then modified based on the thermally-induced deformation information as predicted by the model. Finally a pattern is exposed onto the fields in accordance with the pre- specified exposure information as modified. The predicting of thermally-induced field deformation information by the model includes predicting of deformation effects of selected points on the substrate. It is based on a time-decaying characteristic as energy is transported across substrate; and a distance between the selected points and an edge of the substrate.

公开(公告)号：SG131040A1

公开(公告)日：2007-04-26

申请号：SG2006060875

申请日：2006-09-05

Applicant: ASML NETHERLANDS BV

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  DE KORT ANTONIUS JOHANNES ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  PEN HERMEN FOLKEN

Abstract: In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using normal and reversed meanders. The two data sets can then be used to eliminate effects due to wafer cooling.

公开(公告)号：SG120255A1

公开(公告)日：2006-03-28

申请号：SG200505017

申请日：2005-08-08

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS PETRUS MARIA C ,  JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS JOHANNUS ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: G03F7/20

Abstract: A lithographic apparatus comprising: an illumination system (IL) configured to condition a radiation beam (PB); a support (MT) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table (WT) constructed to hold a substrate (W); a projection system (PL) configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system (130) configured to at least partly fill a space (25) between a final element of said projection system and said substrate with liquid; a seal member (12) arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements (30,50,60,120,140) to control and/or compensate for evaporation of immersion liquid from said substrate.