公开(公告)号：JP2009302531A

公开(公告)日：2009-12-24

申请号：JP2009132700

申请日：2009-06-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： AARTS IGOR MATHEUS PETRONELLA ,  GEERKE JOHAN HENDRIK ,  VAN DER PASCH ENGELBERTUS ANTO ,  DE JONG FREDERIK E ,  VAN DE GRIFT MARC

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F9/7076 ,  G03F7/70516 ,  G03F7/70616 ,  G03F9/7011 ,  G03F9/7019 ,  H01L21/02271

Abstract: PROBLEM TO BE SOLVED: To provide a calibration method for calibrating a stage position of a lithography apparatus. SOLUTION: This detection method detects a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate W or on a substrate table WT and preferably extends over a length at least 50 times wider than a width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table WT in the first direction and measuring along the first direction the property of the extended pattern. The property may be a result of a physical property of the extended pattern in a second direction at a right angle to the first direction. A next step allows a calibration of a substrate table position to be derived from the measured position of the extended pattern. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供用于校准光刻设备的台位置的校准方法。 解决方案：该检测方法检测由通常沿第一方向延伸的至少一条线形成的延伸图案的特性。 延伸图案形成在衬底W上或衬底台WT上，并且优选地延伸超过线宽度的至少50倍的长度。 扩展模式是对焦点敏感。 检测方法包括沿第一方向移动衬底台WT并沿着第一方向测量延伸图案的特性。 该特性可以是延伸图案在与第一方向成直角的第二方向上的物理性质的结果。 下一个步骤允许从扩展图案的测量位置导出衬底台位置的校准。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：SG157349A1

公开(公告)日：2009-12-29

申请号：SG2009037490

申请日：2009-06-02

Applicant: ASML NETHERLANDS BV

Inventor： AARTS IGOR MATHEUS PETRONELLA ,  GEERKE JOHAN HENDRIK ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  DE JONG FREDERIK EDUARD ,  VAN DE GRIFT MARC

Abstract: ITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50x the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.