公开(公告)号：NL2011276A

公开(公告)日：2014-03-10

申请号：NL2011276

申请日：2013-08-07

Applicant: ASML NETHERLANDS BV

Inventor： MOS EVERHARDUS ,  SIMONS HUBERTUS ,  BERGE PETER TEN ,  SCHOUMANS NICOLE ,  KUBIS MICHAEL ,  ABEN PAUL

IPC: G01N21/47 ,  G03F7/20

Abstract: A method of calculating process corrections for a lithographic tool, and associated apparatuses. The method comprises measuring process defect data on a substrate that has been previously exposed using the lithographic tool; fitting a process signature model to the measured process defect data, so as to obtain a model of the process signature for the lithographic tool; and using the process signature model to calculate the process corrections for the lithographic tool.