公开(公告)号：JP2009088509A

公开(公告)日：2009-04-23

申请号：JP2008240097

申请日：2008-09-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KADIJK EDWIN CORNELIS ,  AKKER JEROEN VAN DEN ,  ANSTOTZ DAVID LUCIEN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a method of cleaning such apparatus. SOLUTION: The immersion lithography apparatus reduces contamination of immersion liquid due to topcoat fragments of a substrate or an upper face of a substrate table, resists, residual particles, and the like; and accordingly, focusing defects are reduced; and as a countermeasure which prolongs life expectancy of components of the immersed lithography apparatus, an inlet is provided to supply cleaned liquid in a space between an object such as the substrate positioned on the substrate table and the substrate table. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备和清洁这种设备的方法。 解决方案：浸没式光刻设备减少了由于基板的面漆碎片或基板台的上表面，抗蚀剂，残留颗粒等引起的浸没液体的污染; 因此减少了聚焦缺陷; 并且作为延长浸入式光刻设备的部件的预期寿命的对策，提供入口以将清洁的液体供应在诸如位于基板台上的基板和基板台之间的空间中。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008300829A

公开(公告)日：2008-12-11

申请号：JP2008136199

申请日：2008-05-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG FREDERIK E ,  BEEMS MARCEL HENDRIKUS MARIA ,  VAN DEN BRINK MARINUS AART ,  JACOBS JOHANNES HENRICUS WILHE ,  ANTONIUS LEENDERS MARTINUS HEN ,  LEVASIER LEON MARTIN ,  VAN DER MEULEN FRITS ,  OTTENS JOOST JEROEN ,  ZAAL KOEN JACOBUS J M ,  JOHANNES DROSTE RICHARD BERNAR ,  DE KLERK JOHANNES W ,  WANTEN PETER FRANCISCUS ,  VAN DER HOEVEN JAN CORNELIS ,  KADIJK EDWIN CORNELIS ,  DE JONG MARTEIJN ,  ANSTOTZ DAVID LUCIEN

IPC: H01L21/027

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is set. SOLUTION: The liquid immersion lithographic apparatus has a drain formed for draining the liquid through the gap between an edge of a substrate and the substrate table on which the substrate is supported. The drain is provided with a means which feeds the liquid to the drain irrespective of a position of the substrate table and/or a means which saturates gas in the drain. These means reduce fluctuation in heat loss due to evaporation of the liquid in the drain. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其中液体可以通过例如物体的边缘和设置有物体的基板台之间的间隙排出。 解决方案：液浸式光刻设备具有用于排出液体通过衬底的边缘和其上支撑衬底的衬底台之间的间隙的排水口。 排水管设置有将液体供给到排水管的装置，而不管衬底台的位置和/或在排水管中使气体饱和的装置。 这些意味着减少由于排水管中的液体的蒸发导致的热损失的波动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2010135787A

公开(公告)日：2010-06-17

申请号：JP2009268224

申请日：2009-11-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KNAAPEN THIJS EGIDIUS JOHANNES ,  BRULS RICHARD JOSEPH ,  VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KAMPHUIS MARTIJN HENDRIK ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MAAS RUDOLF ADRIANUS JOANNES ,  STAVENGA MARCO KOERT ,  VERSPAGET COEN CORNELIS WILHELMUS ,  PELLENS RUDY JAN MARIA ,  VAN DER HOEVEN JAN CORNELIS ,  ANSTOTZ DAVID LUCIEN ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  MARCUS JOHANNES VAN DER ZANDEN ,  BADAM VIJAY KUMAR ,  DE GROOT CASPER RODERIK

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus reducing latent adverse effect of liquid drops remained on a substrate table after light-exposure of a substrate. SOLUTION: The lithographic apparatus having a table including a target and/or a sensor and a liquid displacement device displacing a liquid from the target and/or the sensor using a localized gas flow is disclosed. The liquid displacement device can be disposed at various positions. For example, the liquid displacement device can be mounted on a liquid handling device at a light-exposure station and can be disposed adjacent to a transfer passage between the light-exposure station and a measuring station or adjacent to a load/unload station or the sensor in the transfer passage. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其减少了在曝光基板之后残留在基板台上的液滴的潜在不利影响。 公开了具有包括靶和/或传感器的台的液晶显示装置以及使用局部气流从液体和/或传感器移出液体的液体排量装置。 液体置换装置可以设置在各种位置。 例如，液体移动装置可以安装在曝光站处的液体处理装置上，并且可以设置在靠近曝光站和测量站之间或与装载/卸载站相邻的传送通道或者 传感器在传输通道中。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2012134527A

公开(公告)日：2012-07-12

申请号：JP2012038121

申请日：2012-02-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KADIJK EDWIN CORNELIS ,  AKKER JEROEN VAN DEN ,  ANSTOTZ DAVID LUCIEN

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a method of cleaning such an apparatus.SOLUTION: An immersion lithography apparatus reduces contamination of immersion liquid due to topcoat fragments of a substrate W or an upper surface of a substrate table WT, resists, residual particles, and the like, and thus reduces focusing defects. As a measure to extend life expectancy of components of the immersion lithography apparatus, an inlet 122 is provided to supply cleaned liquid into a space between an object such as the substrate W positioned on the substrate table WT and the substrate table WT.

Abstract translation: 要解决的问题：提供一种光刻设备和清洁这种设备的方法。 解决方案：浸没式光刻设备减少了由于衬底W的顶涂片或衬底台WT的上表面，抗蚀剂，残留颗粒等引起的浸没液的污染，从而减少了聚焦缺陷。 作为延长浸没式光刻设备的组件的预期寿命的措施，提供入口122以将清洁的液体供应到诸如位于衬底台WT上的衬底W的对象和衬底台WT之间的空间中。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012114469A

公开(公告)日：2012-06-14

申请号：JP2012055739

申请日：2012-03-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG FREDERIK E ,  BEEMS MARCEL HENDRIKUS MARIA ,  VAN DEN BRINK MARINUS AART ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LEVACIA LEON MARTIN ,  VAN DER MEULEN FRITS ,  OTTENS JOOST JEROEN ,  ZAAL KOEN JACOBUS J M ,  JOHANNES DROSTE RICHARD BERNARDUS ,  DE KLERK JOHANNES W ,  WANTEN PETER FRANCISCUS ,  VAN DER HOEVEN JAN CORNELIS ,  KADIJK EDWIN CORNELIS ,  DE JONG MARTEIJN ,  ANSTOTZ DAVID LUCIEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is disposed.SOLUTION: A liquid immersion lithographic apparatus includes a drain configured to drain liquid through a gap between an edge of a substrate and a substrate table on which the substrate is supported. The drain comprises: means for feeding the liquid to the drain regardless of a position of the substrate table; and/or means for saturating gas in the drain. These means reduce fluctuation of heat loss due to evaporation of the liquid in the drain.

Abstract translation: 要解决的问题：提供一种光刻设备，其中液体可以通过例如物体的边缘和其上放置物体的基板台之间的间隙排出。 解决方案：液浸式光刻设备包括被配置为通过衬底的边缘和衬底台之间的间隙排出液体的漏极，衬底台被支撑在衬底台上。 排水口包括：无论基板台的位置如何，将液体供给到排水口的装置; 和/或用于在排水管中使气体饱和的装置。 这些意味着减少由于排水管中液体的蒸发导致的热损失的波动。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：SG151198A1

公开(公告)日：2009-04-30

申请号：SG2008066698

申请日：2008-09-10

Applicant: ASML NETHERLANDS BV

Inventor： BOB STREEFKERK ,  DE GRAAF ROELOF FREDERIK ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  MARCEL BECKERS ,  BERKVENS PAUL PETRUS JOANNES ,  ANSTOTZ DAVID LUCIEN

Abstract: METHODS RELATING TO IMMERSION LITHOGRAPHY AND AN IMMERSION LITHOGRAPHIC APPARATUS A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.

公开(公告)号：NL1035942A1

公开(公告)日：2009-03-30

申请号：NL1035942

申请日：2008-09-16

Applicant: ASML NETHERLANDS BV

Inventor： KADIJK EDWIN CORNELIS ,  AKKER JEROEN VAN DEN ,  ANSTOTZ DAVID LUCIEN

IPC: G03F7/20 ,  H01L21/027