公开(公告)号：KR20100098479A

公开(公告)日：2010-09-07

申请号：KR20100067520

申请日：2010-07-13

Applicant: ASML NETHERLANDS BV

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LEIBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  VAN LIEROP MATHIEUS ANNA KAREL ,  DE METSENAERE CHRISTOPHE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE MARIE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  H01L21/0274 ,  H01L21/0275

Abstract: PURPOSE: A lithography apparatus and a method for manufacturing a device are provided to control the flow of fluid through a fluid inlet by varying the flux of the fluid. CONSTITUTION: An illuminator(IL) receives a radiation beam(B) from a radiation source(SO). The illuminator includes an adjusting unit(AD) which adjusts the angular intensity distribution of the radiation beam. The radiation beam passes through a projection system(PS) and is focused on the target parts(C) on a substrate(W). A first location setting unit(PM) accurately locates a pattern device(MA). A substrate table(WT) moves to locate the target parts in the path of the radiation beam.

Abstract translation: 目的：提供一种光刻设备和用于制造器件的方法，以通过改变流体的通量来控制通过流体入口的流体流动。 构成：照射器（IL）从辐射源（SO）接收辐射束（B）。 照明器包括调节单元（AD），该调节单元调节辐射束的角度强度分布。 辐射束通过投影系统（PS）并聚焦在基底（W）上的目标部分（C）上。 第一位置设置单元（PM）精确地定位图案设备（MA）。 衬底台（WT）移动以将目标部件定位在辐射束的路径中。

公开(公告)号：JP2009111349A

公开(公告)日：2009-05-21

申请号：JP2008227986

申请日：2008-09-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LIEBREGTS PAULUS MARTINUS MARI ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JO ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JO ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHAN ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES ,  VERSTRAETE JORIS JOHAN ANNE-MA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus in which a barrier member is combined with a shutter member so as to keep a final element of the projection system wet during substrate swap. SOLUTION: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种装置，其中阻挡构件与挡板构件组合，以便在衬底互换期间使投影系统的最终元件保持湿润。 解决方案：公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2011171760A

公开(公告)日：2011-09-01

申请号：JP2011101629

申请日：2011-04-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus that combines a barrier member with a shutter member to keep the final element of a projection system wet during the replacement of a substrate.
SOLUTION: A liquid immersion lithographic apparatus includes a fluid confinement system for confining a fluid in a space between the projection system and a substrate. The liquid confinement system includes an inlet port to supply liquid, and a fluid entrance connected to an outlet port. The liquid immersion lithographic apparatus further includes a fluid supply system to control the fluid flow passing through the fluid entrance by changing a flow rate of fluid supplied to the entrance port and a flow rate of fluid removed from the outlet port.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种将阻挡构件与闸板构件组合的装置，以在更换基板期间使投影系统的最终元件保持湿润。 解决方案：液浸式光刻设备包括用于将流体限制在投影系统和基底之间的空间中的流体限制系统。 液体限制系统包括用于供应液体的入口端口和连接到出口端口的流体入口。 液浸光刻设备还包括流体供应系统，用于通过改变供应到入口的流体的流量和从出口移除的流体的流量来控制流过流体入口的流体流。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010141325A

公开(公告)日：2010-06-24

申请号：JP2009277243

申请日：2009-12-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  RIEPEN MICHEL ,  VAN DEN HEUVEL MARTINUS WILHELMUS ,  BERKVENS PAUL PETRUS JOANNES ,  METSENAERE CHRISTOPHE DE ,  VAN DE WINKEL JIMMY MATHEUS WILHELMUS ,  ROPS CORNELIUS MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  F01N1/023 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling system in which a vibration produced by two phase extraction is reduced or eliminated. SOLUTION: A liquid-immersion lithography usually is equipped with a fluid handling system. The handling system generally has a two phase fluid extraction system which removes a mixture of a gas and a liquid from a predetermined place. Since the extract fluid contains two phases, the pressure in the extract system varies sometimes. It is likely that the pressure variation passes through the liquid-immersion liquid to cause an incorrect exposing light. A buffer chamber can be used to reduce the pressure variation in the extract system. The buffer chamber may be connected to the fluid extract system in order to provide a fixed volume of gas to reduce the pressure variation. Substitutively or additionally, a flexible wall portion may be provided to somewhere in the fluid extract system. The flexible wall portion may respond to the pressure variation in the fluid extract system to change its shape. The change of the shape may be a help when the flexible wall portion reduces or eliminates the pressure variation. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种流体处理系统，其中减少或消除由两相萃取产生的振动。

解决方案：液浸光刻通常配备有流体处理系统。 处理系统通常具有从预定位置去除气体和液体的混合物的两相流体萃取系统。 由于萃取液含有两相，萃取系统中的压力有时会变化。 压力变化很可能通过液浸液体导致不正确的曝光。 可以使用缓冲室来减少提取系统中的压力变化。 缓冲室可以连接到流体提取系统，以提供固定体积的气体以减小压力变化。 替代地或另外地，柔性壁部分可以设置在流体提取系统的某处。 柔性壁部分可以响应于流体提取系统中的压力变化以改变其形状。 当柔性壁部分减小或消除压力变化时，形状的变化可能是有帮助的。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009272640A

公开(公告)日：2009-11-19

申请号：JP2009113348

申请日：2009-05-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIREKS DANIEL JOSEPH MARIA ,  DANNY MARIA HUBERTUS PHILIPS ,  CLEMENS JOHANNES GERARDUS VAN ,  STEFFENS KOEN ,  VAN PUTTEN ARNOLD JAN ,  MAIKEL ADRIANUS CORNELIS SCHEP ,  BERKVENS PAUL PETRUS JOANNES

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To disclose a fluid handling structure where the size and structure of a fluid extraction opening are designated to reduce vibration transmitted to the fluid handling structure as a result of two-phase extraction. SOLUTION: The area of respective fluid extraction openings, the total area of all of the fluid extraction openings, and/or the space between adjacent fluid extraction openings can be controlled. When vibration decreases, precision in exposure is improved. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开流体处理结构，其中指定流体提取开口的尺寸和结构以减少作为两相抽出的结果传递到流体处理结构的振动。 解决方案：可以控制各个流体提取开口的面积，所有流体提取开口的总面积和/或相邻流体提取开口之间的空间。 当振动降低时，曝光精度提高。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009088508A

公开(公告)日：2009-04-23

申请号：JP2008239006

申请日：2008-09-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  DE GRAAF ROELOF FREDERIK ,  HUBERTUS MULKENS JOHANNES C ,  BECKERS MARCEL ,  BERKVENS PAUL PETRUS JOANNES

IPC: H01L21/027

CPC classification number: G03F7/70916 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a method of detecting contamination of a liquid containment system and/or a method of determining the time, at which the liquid containment system of an immersion lithography apparatus needs cleaning. SOLUTION: A method of operating the liquid containment system of the immersion lithography apparatus is disclosed. Performances of the liquid containment system are measured by several different methods. On the basis of a result of the performance measurement, for example, a signal showing that it is required to take aid measure is generated. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种检测液体容纳系统的污染物的方法和/或确定浸没式光刻设备的液体容纳系统需要清洁的时间的方法。 公开了一种操作浸没式光刻设备的液体容纳系统的方法。 液体容纳系统的性能通过几种不同的方法测量。 基于性能测量的结果，例如，产生表示需要进行辅助测量的信号。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008258613A

公开(公告)日：2008-10-23

申请号：JP2008085232

申请日：2008-03-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOOPSTRA ERIK R ,  COX HENRIKUS HERMAN MARIE ,  MERTENS JEROEN JOHANNES SOPHIA ,  SIMONS WILHELMUS FRANCISCUS JO ,  BERKVENS PAUL PETRUS JOANNES

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G05B19/404 ,  G03F7/70725 ,  G03F7/709 ,  G05B2219/45031 ,  G05B2219/49189

Abstract: PROBLEM TO BE SOLVED: To provide a position control system for a lithographic device in which an accuracy of positioning a target portion with respect to a lens column or a projection system may be improved. SOLUTION: The position control system for a substrate support of a lithographic device includes a position measurement system constructed to specify a position of a sensor or a sensor target on the substrate support, a controller constructed to provide a control signal based on a desired position of a target portion of the substrate and the specified position, and one or more actuators constructed to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, which includes a relation between a difference in a change in a position of the target portion and a change in position of the sensor or sensor target, as a result of a force exerted on the substrate support. The position control system is constructed to substantially correct the position of the target portion using the stiffness compensation model at least during projection of a patterned radiation beam on the target portion. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于光刻设备的位置控制系统，其中可以提高目标部分相对于透镜柱或投影系统的定位精度。 解决方案：用于光刻设备的基板支撑件的位置控制系统包括：位置测量系统，其被构造成指定传感器或传感器目标在基板支撑件上的位置;控制器，被构造成提供基于 基板的目标部分和指定位置的期望位置，以及构造成作用在基板支撑件上的一个或多个致动器。 位置控制系统包括基板支撑件的刚度补偿模型，其包括目标部分的位置变化的差异与传感器或传感器目标的位置变化之间的关系，作为施加的力 在基板支撑上。 位置控制系统被构造成至少在图案化的辐射束在目标部分的投影期间使用刚度补偿模型来基本上校正目标部分的位置。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2011097107A

公开(公告)日：2011-05-12

申请号：JP2011026014

申请日：2011-02-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RIEPEN MICHEL ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  BERKVENS PAUL PETRUS JOANNES ,  MONDT EVA ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system for nailing liquid meniscus at a prescribed position in a space between a final element of a projection system and a substrate. SOLUTION: A liquid confinement system used for immersion lithography where a liquid meniscus between a liquid confinement system and a substrate is substantially nailed in a prescribed position by a meniscus nailing form is disclosed. The meniscus nailing form has a plurality of discrete outlets arranged in a polygon. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在投影系统的最终元件和基板之间的空间中的指定位置处用于钉液面弯液面的液体供应系统。 解决方案：公开了一种用于浸没式光刻的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉形式基本上钉在规定的位置。 半月板钉形式具有以多边形排列的多个分立出口。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011014901A

公开(公告)日：2011-01-20

申请号：JP2010142155

申请日：2010-06-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BERKVENS PAUL PETRUS JOANNES ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE ,  BLOKS RUUD HENDRICUS MARTINUS JOHANNES

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling structure that reduces a change in refractive index and a focusing error resulting from a temperature change in a space by reducing a temperature change while in the fluid handling structure of immersion liquid provided to the space by the fluid handling structure.SOLUTION: The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and a contacting surface facing to the fluid handling structure. The fluid handling structure includes a supply passage formed therein for passing fluid through the fluid handling structure from the outside to the space, and a heat insulator positioned at least partly adjacent to the supply passage in order to thermally insulate fluid in the supply passage from a heat load induced in the fluid handling structure.

Abstract translation: 要解决的问题：提供一种流体处理结构，其通过降低温度变化而在空间中的温度变化引起的折射率变化和聚焦误差减小，同时在由 流体处理结构。解决方案：流体处理结构被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的接触表面之间的空间中。 流体处理结构包括形成在其中的供应通道，用于将流体从外部传递到空间;以及绝热体，其至少部分地邻近供应通道定位，以将供应通道中的流体与 在流体处理结构中引起的热负荷。

公开(公告)号：JP2010287889A

公开(公告)日：2010-12-24

申请号：JP2010126422

申请日：2010-06-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DANNY MARIA HUBERTUS PHILIPS ,  DIREKS DANIEL JOSEPH MARIA ,  MAIKEL ADRIANUS CORNELIS SCHEPERS ,  BERKVENS PAUL PETRUS JOANNES

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  Y10T137/8593

Abstract: PROBLEM TO BE SOLVED: To disclose a fluid handling structure configured to supply and confine an immersion liquid in a space demarcated between a projection system and a counter surface countered to the system itself. SOLUTION: In a first portion of a lower surface of the fluid handling structure, a distance from the counter surface when using the first portion is different from that of a second portion of the lower surface. The first portion is demarcated in the structure itself and has a supply opening configured to supply liquid to the counter surface and an extraction opening configured to remove fluid from the space between the fluid handling structure and the counter surface. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：公开一种流体处理结构，其被配置为将浸没液体提供并限制在与系统本身相反的投影系统和反面之间划分的空间中。 解决方案：在流体处理结构的下表面的第一部分中，当使用第一部分时与对置表面的距离不同于下表面的第二部分的距离。 第一部分在结构本身中划定，并且具有供应开口，其构造成将液体供应到相对表面，以及提取开口，构造成从流体处理结构和对置表面之间的空间移除流体。 版权所有（C）2011，JPO＆INPIT