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公开(公告)号：JP2011146727A
公开(公告)日：2011-07-28
申请号：JP2011038507
申请日：2011-02-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： GEERKE JOHAN HENDRIK , HEMPENIUS PETER PAUL , DE VOS YOUSSEF KAREL MARIA , BEIJERS CLEMENTIUS ANDREAS JOHANNES
IPC: H01L21/027
CPC classification number: G03F7/709
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus significantly reduced in airflows in a process zone and imaging errors by pressure waves. SOLUTION: The lithographic apparatus includes: an illumination system configured to adjust a radiation beam; a support 1 structured to support a patterning device 2 capable of imparting a pattern to the cross-section of the radiation beam to form a patterned radiation beam; a substrate table 4 structured to hold a substrate 5; a projection system 3 configured to project the patterned radiation beam onto a target portion of the substrate 5; and a shield device 9 arranged between a source of airflows and/or pressure waves and an element sensitive to the airflows and/or pressure waves. COPYRIGHT: (C)2011,JPO&INPIT
Abstract translation: 要解决的问题：提供显着减少处理区中的气流的光刻设备和通过压力波的成像误差。 光刻设备包括：被配置为调节辐射束的照明系统; 支撑件1，其构造成支撑图案形成装置2，其能够对辐射束的横截面赋予图案以形成图案化的辐射束; 构造成保持基板5的基板台4; 投影系统3，被配置为将图案化的辐射束投影到基板5的目标部分上; 以及布置在气流源和/或压力波之间的屏蔽装置9和对气流和/或压力波敏感的元件。 版权所有（C）2011，JPO＆INPIT
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公开(公告)号：NL1036167A1
公开(公告)日：2009-05-25
申请号：NL1036167
申请日：2008-11-07
Applicant: ASML NETHERLANDS BV
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公开(公告)号：NL1036290A1
公开(公告)日：2009-06-22
申请号：NL1036290
申请日：2008-12-08
Applicant: ASML NETHERLANDS BV
Inventor： BUTLER HANS , WIJST MARC WILHELMUS MARIA VAN , GEERKE JOHAN HENDRIK , HEMPENIUS PETER PAUL , VOS YOUSSEF KAREL MARIA DE , PEE JOOST DE , BEIJERS CLEMENTIUS ANDREAS JOHANNES , ROOZEN NICOLAAS BERNARDUS , BOOGAERT ERWIN ANTONIUS VAN DE , NIJHUIS MARCO HENDRIKUS HERMAN , DEBIESME FRANCOIS XAVIER
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公开(公告)号：NL1036192A1
公开(公告)日：2009-06-09
申请号：NL1036192
申请日：2008-11-13
Applicant: ASML NETHERLANDS BV
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