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    Imprint lithographic apparatus, and imprint lithographic method
    1.
    发明专利
    Imprint lithographic apparatus, and imprint lithographic method 有权
    IMPRINT LITHOGRAPHIC APPARATUS和IMPRINT LITHOGRAPHIC方法

    公开(公告)号：JP2011135077A

    公开(公告)日：2011-07-07

    申请号：JP2010282942

    申请日：2010-12-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  JOHANNES PETRUS MARTINUS BERNARDUS VERMEULEN ,  VAN DER WIJST MARC WILHELMUS MARIA ,  STARREVELD JEROEN PIETER ,  DE HOON CORNELIUS ADRIANUS LAMBERTUS ,  DEBIESME FRANCOIS XAVIER

    IPC: H01L21/027 ,  H01L21/683

    CPC classification number: G03F7/0002 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  F16F9/535 ,  F16F15/002 ,  F16F15/0275 ,  F16F15/03

    Abstract: PROBLEM TO BE SOLVED: To provide a vibration isolation system for an imprint lithographic apparatus, capable of improving a throughput of an imprint lithographic apparatus.
    SOLUTION: An imprint lithographic apparatus 100 includes an actuator 130 displacing an imprint template holder 110 relative to a substrate holder 120. A support structure 140 of the imprint template holder 110 and/or the substrate holder 120 is attached to a vibration isolation system 150 attached to a base 160. The vibration isolation system 150 isolates vibration of the support structure 140 relative to the base 160. A control unit controlling the actuator 130 in an imprint process controls an adjusting member of the vibration isolation system 150, and adjusts a dynamic characteristic of the vibration isolation system 150 during at least part of the imprint process to reduce a displacement of the support structure 140 relative to the base 160, the displacement being caused by a force acting the support structure 140.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种能够提高压印光刻设备的生产量的压印光刻设备的隔振系统。 压印光刻设备100包括致动器130，其相对于衬底保持器120移动压印模板保持器110.压印模板保持器110和/或衬底保持器120的支撑结构140附接到振动隔离 系统150附接到基座160.隔振系统150隔离支撑结构140相对于基座160的振动。在压印过程中控制致动器130的控制单元控制隔振系统150的调节构件，并调节 在压印过程的至少一部分期间防振系统150的动态特性，以减小支撑结构140相对于基座160的位移，该位移是由作用于支撑结构140的力引起的。版权所有： （C）2011，JPO＆INPIT

    Lithographic apparatus having acoustic resonator
    3.
    发明专利
    Lithographic apparatus having acoustic resonator 有权
    具有声学谐振器的平面设备

    公开(公告)号：JP2009141349A

    公开(公告)日：2009-06-25

    申请号：JP2008303286

    申请日：2008-11-28

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS M ,  GEERKE JOHAN HENDRIK ,  DE PEE JOOST ,  BEIJERS CLEMENTIUS ANDREAS JOH ,  OUDE NIJHUIS MARCO HENDRIKUS H ,  DEBIESME FRANCOIS XAVIER

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To reduce a possible impact of acoustic vibration to a part of a lithographic apparatus, and to thereby enhance the precision of the lithographic apparatus, overlay, or all other parameters. SOLUTION: A lithographic apparatus may be provided with an acoustic resonator to attenuate acoustic vibration in the lithographic apparatus. The acoustic resonator may include a Helmholtz resonator. The Helmholtz resonator may be provided with an active element to provide active damping and/or altering a spring characteristic of the mass spring assembly formed by the resonator. The resonator may be provided at a slit in a shield between the patterning device stage and the projection system to suppress the transfer of acoustical vibration caused by e.g. the movement of the patterning device stage to the projection system. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：减少声波振动对光刻设备的一部分的可能影响，从而提高光刻设备，覆盖层或所有其他参数的精度。 解决方案：光刻设备可以设置有声谐振器以衰减光刻设备中的声振动。 声谐振器可以包括亥姆霍兹共振器。 亥姆霍兹共振器可以设置有有源元件，以提供由谐振器形成的质量弹簧组件的主动阻尼和/或改变弹簧特性。 谐振器可以设置在图案形成装置台和投影系统之间的屏蔽中的狭缝处，以抑制由例如导电层引起的声振动的传递。 图案形成装置台到投影系统的移动。 版权所有（C）2009，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    4.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2009130355A

    公开(公告)日：2009-06-11

    申请号：JP2008290448

    申请日：2008-11-13

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS M ,  GEERKE JOHAN HENDRIK ,  DE PEE JOOST ,  BEIJERS CLEMENTIUS ANDREAS JOH ,  OUDE NIJHUIS MARCO HENDRIKUS H ,  DEBIESME FRANCOIS XAVIER

    IPC: H01L21/027

    CPC classification number: G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide an improved lithographic apparatus, where vibration in a projection system or another module of the equipment caused by displacement is reduced.
    SOLUTION: The lithographic apparatus includes: an illumination system for attaching conditions to radial beams; a support for supporting a patterning device capable of giving a pattern to a section of the radial beams to form the patterning radial beams; a substrate table for holding a substrate; and the projection system for projecting the patterning radial beams onto a target portion of the substrate. The apparatus also includes: a sensor arranged to detect the vibration of the projection system in use; an actuator arranged to exert a force to the projection system in use; and the projection system for converting an output signal of the sensor to an actuator input signal in use so that vibration of the projection system is reduced by controlling the actuator by an input signal arranged to exert the force to the projection system during operation.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种改进的光刻设备，其中减少了由位移引起的设备的投影系统或其他模块中的振动。 解决方案：光刻设备包括：用于将条件附接到径向光束的照明系统; 用于支撑图案形成装置的支撑件，其能够向所述径向梁的一部分提供图案以形成所述图案化径向梁; 用于保持衬底的衬底台; 以及用于将图案化的径向光束投影到基板的目标部分上的投影系统。 该装置还包括：传感器，布置成检测投影系统在使用中的振动; 致动器，布置成在使用中向所述投影系统施加力; 以及用于将传感器的输出信号转换为使用中的致动器输入信号的投影系统，以便通过在操作期间通过布置成向投影系统施加力的输入信号控制致动器来减小投影系统的振动。 版权所有（C）2009，JPO＆INPIT

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