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    e-빔 장치
    1.
    发明公开
    e-빔 장치 审中-公开

    公开(公告)号：KR20200135878A

    公开(公告)日：2020-12-03

    申请号：KR20207031525

    申请日：2019-04-23

    Applicant: ASML NETHERLANDS BV

    Inventor： HEMPENIUS PETER PAUL ,  HOL SVEN ANTOIN JOHAN ,  KREMERS MAARTEN FRANS JANUS ,  VAN DE GROES HENRICUS MARTINUS JOHANNES ,  BOSCH NIELS JOHANNES MARIA ,  BAGGEN MARCEL KOENRAAD MARIE

    IPC: H01J37/20 ,  H01J37/09 ,  H01J37/317

    Abstract: e-빔장치가개시되고, 상기장치는대상물상으로 e-빔을투영하도록구성되는전자광학기시스템(500), 대상물을유지하는대상물테이블, 및전자광학기시스템에대해대상물테이블(520)을이동시키도록구성되는위치설정디바이스(510)를포함한다. 위치설정디바이스는전자광학기시스템에대해대상물테이블을이동시키도록구성되는단행정스테이지(512) 및전자광학기시스템에대해단행정스테이지를이동시키도록구성되는장행정스테이지(511)를포함한다. e-빔장치는위치설정디바이스에의해발생되는자기교란으로부터전자광학기시스템을차폐하기위한자기차폐부(540)를더 포함한다. 자기차폐부는위치설정디바이스와전자광학기시스템사이에배치될수 있다.

    Lithography system
    2.
    发明专利
    Lithography system 有权
    LITHOGRAPHIC设备

    公开(公告)号：JP2011146727A

    公开(公告)日：2011-07-28

    申请号：JP2011038507

    申请日：2011-02-24

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： GEERKE JOHAN HENDRIK ,  HEMPENIUS PETER PAUL ,  DE VOS YOUSSEF KAREL MARIA ,  BEIJERS CLEMENTIUS ANDREAS JOHANNES

    IPC: H01L21/027

    CPC classification number: G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus significantly reduced in airflows in a process zone and imaging errors by pressure waves. SOLUTION: The lithographic apparatus includes: an illumination system configured to adjust a radiation beam; a support 1 structured to support a patterning device 2 capable of imparting a pattern to the cross-section of the radiation beam to form a patterned radiation beam; a substrate table 4 structured to hold a substrate 5; a projection system 3 configured to project the patterned radiation beam onto a target portion of the substrate 5; and a shield device 9 arranged between a source of airflows and/or pressure waves and an element sensitive to the airflows and/or pressure waves. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供显着减少处理区中的气流的光刻设备和通过压力波的成像误差。 光刻设备包括：被配置为调节辐射束的照明系统; 支撑件1，其构造成支撑图案形成装置2，其能够对辐射束的横截面赋予图案以形成图案化的辐射束; 构造成保持基板5的基板台4; 投影系统3，被配置为将图案化的辐射束投影到基板5的目标部分上; 以及布置在气流源和/或压力波之间的屏蔽装置9和对气流和/或压力波敏感的元件。 版权所有（C）2011，JPO＆INPIT

    Lithographic apparatus having chuck with viscoelastic damping layer
    3.
    发明专利
    Lithographic apparatus having chuck with viscoelastic damping layer 有权
    具有粘弹性阻尼层的卡盘的平面设备

    公开(公告)号：JP2009200488A

    公开(公告)日：2009-09-03

    申请号：JP2009030675

    申请日：2009-02-13

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： HEMPENIUS PETER PAUL ,  BIJVOET DIRK-JAN ,  DE VOS YOUSSEF KAREL MARIA ,  KAMIDI RAMIDIN I

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

    CPC classification number: G03F7/7095 ,  G03F7/707 ,  G03F7/70783

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus having a chuck where a damping layer containing a viscoelastic material is provided between a base and a restriction layer. SOLUTION: The lithographic apparatus includes an illumination system configured to adjust a radiation beam; a support configured to support a patterning device that can provide a pattern to the radiation beam across its cross section so as to form a patterned radiation beam; a substrate table configured to hold a substrate; a projecting system configured to projected the patterned radiation beam onto a target portion of the substrate; and a chuck including a base and a restriction layer, which is configured to hold and position an object, e.g. a patterning device on a support of the substrate on the substrate table. The damping layer containing the viscoelastic material is provided between the base and the restriction layer. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种具有卡盘的光刻设备，其中在基底和限制层之间设置包含粘弹性材料的阻尼层。 解决方案：光刻设备包括被配置为调节辐射束的照明系统; 支撑件，其被配置为支撑图案形成装置，所述图案形成装置可以通过其横截面向所述辐射束提供图案，以便形成图案化的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及包括基座和限制层的卡盘，其构造成保持和定位物体，例如， 在衬底台上的衬底的支撑体上的图案形成装置。 含有粘弹性材料的阻尼层设置在基底与限制层之间。 版权所有（C）2009，JPO＆INPIT

    Stage system and lithography apparatus provided with such stage system
    5.
    发明专利
    Stage system and lithography apparatus provided with such stage system 有权
    具有这种系统的阶段系统和平面设备

    公开(公告)号：JP2008300828A

    公开(公告)日：2008-12-11

    申请号：JP2008134920

    申请日：2008-05-23

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DE VOS YOUSSEF KAREL MARIA ,  KUNST RONALD C ,  PATRICIA VREUGDEWATER ,  HEMPENIUS PETER PAUL

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/70758 ,  G03F7/70725 ,  G03F7/70783

    Abstract: PROBLEM TO BE SOLVED: To improve the performance of an excess operation stage in order to solve the problem that the control of the excess operation stage is made difficult when the deformation of the stage is minimized or evaded. SOLUTION: This stage system for a lithography apparatus includes the stage, an excessively specified number of actuators arranged so as to operate on the stage, and a power source configured to supply currents to the actuators. The currents are supplied to a coil related to the first actuator of the actuators and a coil related to the second actuator of the actuators. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题为了提高过度操作阶段的性能，为了解决当台架的变形被最小化或避免时难以控制过度操作阶段的问题。 解决方案：用于光刻设备的这种舞台系统包括舞台，布置成在舞台上操作的过度指定数量的致动器，以及被配置为向致动器提供电流的电源。 电流被提供给与致动器的第一致动器相关的线圈和与致动器的第二致动器相关的线圈。 版权所有（C）2009，JPO＆INPIT

    Lithography apparatus and method, and device manufacturing method
    6.
    发明专利
    Lithography apparatus and method, and device manufacturing method 有权
    平面设备和方法，以及设备制造方法

    公开(公告)号：JP2009182326A

    公开(公告)日：2009-08-13

    申请号：JP2009012431

    申请日：2009-01-23

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： HEMPENIUS PETER PAUL ,  GEERKE JOHAN HENDRIK ,  DE VOS YOUSSEF KAREL MARIA ,  ROOZEN NICOLAAS BERNARDUS

    IPC: H01L21/027

    CPC classification number: G03F7/709 ,  G03F7/70825 ,  G03F7/70833

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus, to provide a method of reducing gas borne noise of the lithography apparatus, and to provide a method of manufacturing a device. SOLUTION: The lithography apparatus includes: an illumination system configured to condition an emitted beam; a support constructed to support a patterning device, the patterning device being capable of imparting a cross-section of the emitted beam a pattern to form a patterned emitted beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned emitted beam onto a target portion of the substrate; and a passive noise damper configured to dampen the gas borne noise caused by movement of a movable part of the lithographic apparatus. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种光刻设备，以提供降低光刻设备的气体噪声的方法，并提供一种制造器件的方法。 解决方案：光刻设备包括：照明系统，被配置为调节发射光束; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够将发射光束的横截面赋予图案以形成图案化的发射光束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的发射光束投影到所述基板的目标部分上; 以及被配置为抑制由光刻设备的可移动部分的移动引起的气体传播噪声的被动噪声阻尼器。 版权所有（C）2009，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    7.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2008270801A

    公开(公告)日：2008-11-06

    申请号：JP2008103143

    申请日：2008-04-11

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： GEERKE JOHAN HENDRIK ,  HEMPENIUS PETER PAUL ,  DE VOS YOUSSEF KAREL MARIA ,  BEIJERS CLEMENTIUS ANDREAS JOH

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus with significantly reduced image-formation errors due to air flows and pressure waves in a process zone. SOLUTION: The lithographic apparatus includes an illumination system configured soas to adjust a radiation beam, a support constructed to support a patterning device, capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target part of the substrate; and a shield device arranged between a source for air flows and/or pressure waves, and an element sensitive to air flows and/or pressure waves. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供光刻设备，由于处理区中的空气流和压力波而显着减少图像形成误差。 解决方案：光刻设备包括被配置为调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，其能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及设置在用于空气流和/或压力波的源之间的屏蔽装置以及对空气流和/或压力波敏感的元件。 版权所有（C）2009，JPO＆INPIT

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