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公开(公告)号：NL2006203A
公开(公告)日：2011-09-19
申请号：NL2006203
申请日：2011-02-15
Applicant: ASML NETHERLANDS BV
Inventor： LAFARRE RAYMOND , ROSET NIEK , ZDRAVKOV ALEXANDER , STOUWDAM JAN , BIJL BERNARDUS
IPC: G03F7/20
Abstract: A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.
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