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    OBJECT HOLDER AND METHOD OF MANUFACTURING AN OBJECT HOLDER
    2.
    发明申请
    OBJECT HOLDER AND METHOD OF MANUFACTURING AN OBJECT HOLDER 审中-公开
    对象持有人和制造对象持有人的方法

    公开(公告)号：WO2014154428A3

    公开(公告)日：2014-12-18

    申请号：PCT/EP2014053700

    申请日：2014-02-26

    Applicant: ASML NETHERLANDS BV

    Inventor： LAFARRE RAYMOND ,  ACHANTA SATISH ,  FILIPPI MATTEO ,  KARADE YOGESH ,  NELLISSEN ANTONIUS ,  VAN DER WILK RONALD ,  VAN DOREMALEN HENDRIKUS CHRISTOFFEL MARIA ,  WELTERS WILHELMUS

    IPC: G03F7/20

    CPC classification number: G03F7/70716 ,  G03F7/70708

    Abstract: A method of manufacturing an object holder (100) for use in a lithographic apparatus, the object holder comprising one or more electrically functional components, the method comprising: using a composite structure comprising a carrier sheet (20) different from a main body (100a) of the object holder and a layered structure comprising one or a plurality of layers (22) and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.

    Abstract translation: 一种制造用于光刻设备的物体保持器（100）的方法，所述物体保持器包括一个或多个电功能部件，所述方法包括：使用复合结构，所述复合结构包括不同于主体（100a）的载体片 ）和包括一个或多个层（22）并形成在所述载体片上的层状结构; 将复合结构连接到主体的表面，使得层状结构位于载体片和主体的表面之间; 并从复合结构中移除载体片，使分层结构连接到主体。

    LITHOGRAPHIC APPARATUS
    3.
    发明申请
    LITHOGRAPHIC APPARATUS 审中-公开
    LITHOGRAPHIC设备

    公开(公告)号：WO2014122151A3

    公开(公告)日：2014-11-20

    申请号：PCT/EP2014052204

    申请日：2014-02-05

    Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

    Inventor： DELPUERTO SANTIAGO E ,  LIPSON MATTHEW ,  HENDERSON KENNETH ,  LAFARRE RAYMOND ,  MARKOYA LOUIS JOHN ,  UITTERDIJK TAMMO ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  VAN DER WILK RONALD

    IPC: G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

    Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

    Abstract translation: 诸如夹具（310）的支撑件构造成可释放地保持诸如掩模版（300）的图案形成装置以将其固定并防止其热引起的变形。 例如，静电夹具包括具有相对的第一（313）和第二（315）表面的第一基底（312），位于第一表面上并被构造成接触光罩的多个毛刺（316），第二基底 ）具有相对的第一（317）和第二（319）表面。 第二衬底的第一表面耦合到第一衬底的第二表面。 多个冷却元件（318）位于第二基板的第一表面和第一基板的第二表面之间。 冷却元件构造成使电子从第一衬底的第二表面移动到第二衬底的第一表面。 每个冷却元件基本上与相应的毛刺对齐。

    SUBSTRATE SUPPORT FOR A LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS
    4.
    发明申请
    SUBSTRATE SUPPORT FOR A LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS 审中-公开
    基板支持用于平面设备和平面设备

    公开(公告)号：WO2014095266A3

    公开(公告)日：2014-09-18

    申请号：PCT/EP2013074742

    申请日：2013-11-26

    Applicant: ASML NETHERLANDS BV

    Inventor： ARLEMARK ERIK ,  KOEVOETS ADRIANUS ,  LAFARRE RAYMOND ,  TEN KATE NICOLAAS ,  LUIJTEN CARLO ,  NIENHUYS HAN-KWANG

    IPC: G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/70908

    Abstract: Disclosed is a substrate support for an apparatus of the type which projects a beam of EUV radiation onto a target portion of a substrate (400). The substrate support comprises a substrate table constructed to hold the substrate, a support block (420) for supporting the substrate table, and a cover plate (450') disposed around the substrate table. The top surface of the cover plate and the top surface of a substrate mounted on the substrate table are all substantially at the same level. At least one sensor unit (430) is located on the substrate support and its top surface is also at the same level as that of the cover plate and substrate. Also disclosed is an EUV lithographic apparatus comprising such a substrate support.

    Abstract translation: 公开了一种用于将EUV辐射束投射到基板（400）的目标部分上的装置的基板支撑件。 衬底支撑件包括构造成保持衬底的衬底台，用于支撑衬底台的支撑块（420）和设置在衬底台周围的盖板（450'）。 盖板的顶表面和安装在基板上的基板的顶表面基本上处于相同的水平。 至少一个传感器单元（430）位于基板支撑件上，其顶表面也处于与盖板和基板相同的高度。 还公开了包括这种基板支撑件的EUV光刻设备。

    LITHOGRAPHIC APPARATUS AND SUBSTRATE HANDLING METHOD.
    10.
    发明专利
    LITHOGRAPHIC APPARATUS AND SUBSTRATE HANDLING METHOD. 未知

    公开(公告)号：NL2009549A

    公开(公告)日：2013-05-07

    申请号：NL2009549

    申请日：2012-10-01

    Applicant: ASML NETHERLANDS BV

    Inventor： LAFARRE RAYMOND ,  SEGERS HUBERT MARIE ,  CADEE THEODORUS PETRUS MARIA ,  HUANG YANG-SHAN ,  VALENTIN CHRISTIAAN LOUIS

    IPC: G03F7/20 ,  H01L21/68

    Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus including a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes a vacuum clamp arranged to clamp the substrate at a top side thereof. The vacuum clamp may be arranged to clamp at least part of a circumferential outer zone of the substrate top surface. There is also provided a substrate handling method including positioning the substrate using a gripper on a substrate table of a lithographic apparatus, the method including clamping the substrate at a top side thereof using a vacuum clamp of the gripper.

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