公开(公告)号：NL2009284A

公开(公告)日：2013-10-31

申请号：NL2009284

申请日：2012-08-06

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  GRAAF ROELOF ,  ROSET NIEK ,  MARTENS ARJAN ,  ZDRAVKOV ALEXANDER ,  HOEKERD KORNELIS ,  DZIOMKINA NINA

IPC: G03F7/20

公开(公告)号：NL2006244A

公开(公告)日：2011-09-19

申请号：NL2006244

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： ROSET NIEK ,  KATE NICOLAAS ,  SHULEPOV SERGEI ,  LAFARRE RAYMOND

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2006203A

公开(公告)日：2011-09-19

申请号：NL2006203

申请日：2011-02-15

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  ROSET NIEK ,  ZDRAVKOV ALEXANDER ,  STOUWDAM JAN ,  BIJL BERNARDUS

IPC: G03F7/20

Abstract: A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.

公开(公告)号：NL2005666A

公开(公告)日：2011-06-21

申请号：NL2005666

申请日：2010-11-11

Applicant: ASML NETHERLANDS BV

Inventor： ROSET NIEK ,  KATE NICOLAAS ,  LAFARRE RAYMOND ,  ZDRAVKOV ALEXANDER

IPC: G03F7/20

公开(公告)号：SG11202002228UA

公开(公告)日：2020-04-29

申请号：SG11202002228U

申请日：2018-09-19

Applicant: ASML NETHERLANDS BV

Inventor： ROSET NIEK ,  VERMEULEN MARCUS ,  RAVENSBERGEN SIMON ,  BAGGEN MARK ,  KRAMER GIJS ,  TIMMERMANS ROGER ,  VAN DEN BERKMORTEL FRANK

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：NL2008980A

公开(公告)日：2013-01-14

申请号：NL2008980

申请日：2012-06-12

Applicant: ASML NETHERLANDS BV

Inventor： CORTIE ROGIER ,  KATE NICOLAAS ,  ROSET NIEK ,  RIEPEN MICHEL ,  CASTELIJNS HENRICUS ,  ROPS CORNELIUS ,  OVERKAMP JIM

IPC: G03F7/20

公开(公告)号：NL2006536A

公开(公告)日：2011-11-15

申请号：NL2006536

申请日：2011-04-04

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  ROSET NIEK ,  HOUBEN MARTIJN

IPC: G03F9/00 ,  G03F7/20

Abstract: A substrate table to support a substrate is disclosed. The substrate table includes a substrate support to support the substrate and to apply a bending force to an edge of the substrate in a first direction. A substrate edge manipulator is provided that is configured to apply a variable bending force to the edge of the substrate in a second direction, which second direction has at least a component opposite in direction to the first direction.

公开(公告)号：NL2004807A

公开(公告)日：2011-01-04

申请号：NL2004807

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  BENSCHOP JOZEF ,  KATE NICOLAAS ,  ROSET NIEK ,  KUSTERS GERARDUS ,  ZDRAVKOV ALEXANDER ,  PATEL HRISHIKESH ,  OPSTAL SANDER

IPC: G03F7/20