公开(公告)号：JP2011091398A

公开(公告)日：2011-05-06

申请号：JP2010231036

申请日：2010-10-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DE KERKHOF MARCUS A ,  VENEMA WILLEM JURIANUS ,  MOEST BEARRACH ,  MATTHIAS SERAO VASCO MIGUEL ,  BOMHOF CEDRAN

IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

CPC classification number: G03F7/70775 ,  B21B38/00 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7026 ,  G03F9/7088 ,  G03F9/7092 ,  H01J2235/062

Abstract: PROBLEM TO BE SOLVED: To further reduce overhead of measurement and/or a measurement error and a positioning error in a lithographic apparatus. SOLUTION: A certain lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：进一步降低光刻设备中的测量和/或测量误差和定位误差的开销。 解决方案：某个光刻设备包括至少一个图像对准传感器，用于接收从掩模版上的对准标记投影的辐射。 处理器处理来自传感器的信号以解决投影对准标记中的空间信息，以建立用于测量基板支撑件和图案化位置之间的位置关系的参考。 传感器的示例包括光电检测器的线阵列。 单个阵列可以解析传感器（X，Y方向）和垂直（Z）方向的平面内的空间信息。 在保持基板支撑固定的同时执行建立基准位置的至少最后一步。 避免了现有技术传感器的机械扫描引起的错误和延迟。 或者（未示出），传感器相对于基板支撑件移动以进行机械扫描，而与主定位系统无关。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：NL2005389A

公开(公告)日：2011-04-26

申请号：NL2005389

申请日：2010-09-23

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF MARCUS ,  VENEMA WILLEM ,  MOEST BEARRACH ,  MATIAS VASCO ,  BOMHOF CEDRAN

IPC: G03F7/20 ,  G03F9/00