Patent search ap:("ASML NETHERLANDS BV") AND inv:"MATIAS VASCO" Page 1

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发明专利
LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF APPLYING A PATTERN TO A SUBSTRATE. 未知

公开(公告)号：NL2005389A

公开(公告)日：2011-04-26

申请号：NL2005389

申请日：2010-09-23

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF MARCUS , VENEMA WILLEM , MOEST BEARRACH , MATIAS VASCO , BOMHOF CEDRAN

IPC: G03F7/20 , G03F9/00

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